Demonstration of multilayer reflective optics at photon energies above 0.6 MeV.

Focusing optics operating in the soft gamma-ray photon energy range can advance a range of scientific and technological applications that benefit from the large improvements in sensitivity and resolution that true imaging provides. An enabling technology to this end is multilayer coatings. We show that very short period multilayer coatings deposited on super-polished substrates operate efficiently above 0.6 MeV. These experiments demonstrate that Bragg scattering theory established for multilayer applications as low as 1 eV continues to work well into the gamma-ray band.

Physics of reflective optics for the soft gamma-ray photon energy range.

Traditional multilayer reflective optics that have been used in the past for imaging at x-ray photon energies as high as 200 keV are governed by classical wave phenomena. However, their behavior at higher energies is unknown, because of the increasing effect of incoherent scattering and the disagreement between experimental and theoretical optical properties of materials in the hard x-ray and gamma-ray regimes. Here, we demonstrate that multilayer reflective optics can operate efficiently and according to classical wave physics up to photon energies of at least 384 keV. We also use particle transport simulations to quantitatively determine that incoherent scattering takes place in the mirrors but it does not affect the performance at the Bragg angles of operation. Our results open up new possibilities of reflective optical designs in a spectral range where only diffractive optics (crystals and lenses) and crystal monochromators have been available until now.

Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region.

We have developed new, Mg/SiC multilayer coatings with corrosion barriers which can be used to efficiently and simultaneously reflect extreme ultraviolet (EUV) radiation in single or multiple narrow bands centered at wavelengths in the spectral region from 25 to 80 nm. Corrosion mitigation was attempted through the use of Al-Mg or Al thin layers. Three different multilayer design concepts were developed and deposited by magnetron sputtering and the reflectance was measured at near-normal incidence in a broad spectral range. Standard Mg/SiC multilayers were also deposited and measured for comparison. They were shown to efficiently reflect radiation at a wavelength of 76.9 nm with a peak reflectance of 40.6% at near-normal incidence, the highest experimental reflectance reported at this wavelength for a narrowband coating. The demonstration of multilayer coatings with corrosion resistance and multiple-wavelength EUV performance is of great interest in the development of mirrors for space-borne solar physics telescopes and other applications requiring long-lasting coatings with narrowband response in multiple emission lines across the EUV range.

Development and calibration of mirrors and gratings for the soft x-ray materials science beamline at the Linac Coherent Light Source free-electron laser.

This work discusses the development and calibration of the x-ray reflective and diffractive elements for the Soft X-ray Materials Science (SXR) beamline of the Linac Coherent Light Source (LCLS) free-electron laser (FEL), designed for operation in the 500 to 2000 eV region. The surface topography of three Si mirror substrates and two Si diffraction grating substrates was examined by atomic force microscopy (AFM) and optical profilometry. The figure of the mirror substrates was also verified via surface slope measurements with a long trace profiler. A boron carbide (B4C) coating especially optimized for the LCLS FEL conditions was deposited on all SXR mirrors and gratings. Coating thickness uniformity of 0.14 nm root mean square (rms) across clear apertures extending to 205 mm length was demonstrated for all elements, as required to preserve the coherent wavefront of the LCLS source. The reflective performance of the mirrors and the diffraction efficiency of the gratings were calibrated at beamline 6.3.2 at the Advanced Light Source synchrotron. To verify the integrity of the nanometer-scale grating structure, the grating topography was examined by AFM before and after coating. This is to our knowledge the first time B4C-coated diffraction gratings are demonstrated for operation in the soft x-ray region.

Transmittance and optical constants of erbium films in the 3.25-1580 eV spectral range.

The optical constants of erbium (Er) films were obtained in the 3.25-1580 eV range from transmittance measurements performed at room temperature. Thin films of Er were deposited by evaporation in ultra high vacuum conditions and their transmittance was measured in situ. Substrates consisted of a thin C film supported on a grid. Transmittance measurements were used to obtain the extinction coefficient k of the Er films. The refractive index n of Er was calculated using the Kramers-Krönig analysis. k data were extrapolated both on the high- and low-energy parts of the spectrum by using experimental data and calculated k values available in the literature. Er, similar to other lanthanides, has a low-absorption band below the O(2,3) edge onset; the smallest absorption was measured at ~22.5 eV. Therefore, Er is a promising material for filters and multilayer coatings in the energy range below the O(2,3) edge, in which materials typically have an absorption stronger than at other energies. Good consistency of the data resulted from the application of f and inertial sum rules.

Narrowband multilayer coatings for the extreme ultraviolet range of 50-92 nm.

A new type of multilayer coatings with narrowband reflection properties and peaked in the approximately 50- 92 nm spectral range has been developed. Multilayers are based on Yb, Al, and SiO films and they have been prepared by thermal evaporation. Efficient multilayers based on Yb and Al, with an SiO protective layer were prepared, but they developed a dendrite structure, which was attributed to the reactivity between Al and Yb. Multilayers based on Yb and Al, with both SiO protective and barrier layers, resulted in efficient reflective filters, with no observable dendrite growth. The peak reflectance of aged multilayers was of the order of approximately 0.20, with bandwidths in the range of 12 to 22 nm FWHM.

In situ reflectance and optical constants of ion-beam-sputtered SiC films in the 58.4 to 149.2 nm region.

The reflectance of freshly deposited SiC thin films is measured in situ for what we believe is the first time. SiC was deposited by means of ion-beam sputtering. Reflectance was measured as a function of the incidence angle in the far and extreme ultraviolet wavelengths from 58.4 to 149.2 nm. In situ measurements allowed obtaining the intrinsic reflectance of SiC films, which is somewhat larger than what had been measured for samples exposed to the atmosphere. Reflectance measurements were used to determine the optical constants of the material in the same spectral range. We compare our data to those of the literature corresponding to SiC films deposited by different techniques and exposed to the atmosphere. In situ determined optical constants will allow a more accurate design of multilayers containing ion-beam-sputtered SiC layers.

Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV.

This work discusses the experimental determination of the optical constants (refractive index) of DC-magnetron-sputtered boron carbide films in the 30-770 eV photon energy range. Transmittance measurements of three boron carbide films with thicknesses of 54.2, 79.0, and 112.5 nm were performed for this purpose. These are believed to be the first published experimental data for the refractive index of boron carbide films in the photon energy range above 160 eV and for the near-edge x-ray absorption fine structure regions around the boron K (188 eV), carbon K (284.2 eV), and oxygen K (543.1 eV) absorption edges. The density, composition, surface chemistry, and morphology of the films were also investigated using Rutherford backscattering, x-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, and extreme ultraviolet reflectance measurements.

Electron-beam deposited boron coatings for the extreme ultraviolet.

Boron films deposited by evaporation with an electron-beam were found to have a relatively high reflectance in the extreme ultraviolet with values similar to those of ion-beam-sputtered (IBS) SiC and IBS B(4)C. The largest reflectance was measured for an 11 nm thick boron film. Some reflectance degradation was observed for boron films stored in a desiccator. Reflectance degradation varied from sample to sample and was found to be either similar to that of IBS SiC and IBS B(4)C or larger.

Vacuum ultraviolet coatings of Al protected with MgF(2) prepared both by ion-beam sputtering and by evaporation.

Ion-beam sputtering (IBS) and evaporation are the two deposition techniques that have been used to deposit coatings of Al protected with MgF(2) with high reflectance in the vacuum ultraviolet down to 115 nm. Evaporation deposited (ED) Al protected with IBS MgF(2) resulted in a larger (smaller) reflectance below (above) 125 nm than the well-known all-evaporated coatings. A similar comparison is obtained when the Al film is deposited by IBS instead of evaporation. The lower reflectance of the coatings protected with IBS versus ED MgF(2) above 125 nm is because of larger absorption of the former. Both nonprotected IBS Al, as well as IBS Al protected with ED MgF(2), resulted in a band of reflectance loss that was peaked at 127 and 157 nm, respectively. This result was attributed to the excitation of surface plasmons due to the enhancement of surface roughness with large spatial wave vectors in the sputter deposition. This reflectance loss for IBS Al protected with MgF(2) is small at the short (lambda~120 nm) and long (lambda<350 nm) wavelengths investigated. IBS Al protected with ED MgF(2) is thus a promising coating for these two spectral regions. Coatings protected with IBS MgF(2) resulted in a reflectance as high as coatings protected with ED MgF(2) at wavelengths longer than 550 nm, whereas the former had a lower reflectance below this wavelength.

Optical constants of Yb films in the 23-1700 eV range.

The optical constants of Yb films have been determined in the 23-1700 eV spectral range from transmittance measurements performed in situ on Yb films deposited by evaporation in ultrahigh vacuum conditions. Yb films were deposited over grids coated with a thin carbon film. Transmittance measurements were used to obtain the extinction coefficient of Yb films at each individual photon energy investigated. The energy range investigated encompasses Yb edges from M(4,5) to O(2,3). The current results, along with data in the literature, show that Yb has an interesting low-absorption band in the approximately 12-24 eV range, which may be useful for the development of transmittance filters and multilayer coatings. The current data along with literature data and extrapolations were used to obtain n, the real part of the complex refractive index, using a Kramers-Krönig analysis. The application of the sum rules showed a good consistency of the results.

Optical constants of electron-beam evaporated boron films in the 6.8-900 eV photon energy range.

The optical constants of electron-beam evaporated boron from 6.8 to 900 eV were calculated through transmittance measurements of boron thin films deposited onto carbon-coated microgrids or LiF substrates in ultrahigh-vacuum conditions. In the low-energy part of the spectrum the measurements were performed in situ on freshly deposited samples, whereas in the high-energy range the samples were exposed to the atmosphere before the measurements. The extinction coefficient was calculated directly from the transmittance data, and a Kramers-Kronig analysis that combined the current data with data from the literature was performed to determine the dispersive part of the index of refraction. Finally, two different sum-rule tests were performed that indicated the good consistency of the data.

Determination of optical constants of scandium films in the 20-1000 eV range.

The transmittance of thin films of Sc deposited by evaporation in ultrahigh vacuum conditions has been investigated in the 20-1000 eV spectral range. Transmittance measurements were performed in situ on Sc layers that were deposited over grids coated with a C support film. Transmittance measurements were used to obtain the extinction coefficient of Sc films at each individual photon energy investigated. These data, along with the data available in the literature for the rest of the spectrum, were used to obtain the refractive index of Sc by means of the Kramers-Krönig analysis. Sum-rule tests indicated an acceptable consistency of the data.