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Atomic and electronic origins of a type- C defect on Si(001)
Miyazaki T; Uda T; Terakura K.
Afiliación
  • Miyazaki T; Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305-8568, Japan.
Phys Rev Lett ; 84(18): 4128-31, 2000 May 01.
Article en En | MEDLINE | ID: mdl-10990627
ABSTRACT
We present an extensive set of ab initio calculations for a type- C defect on Si(001). Various models belonging to subsurface defects are studied. A substitutional B in the second surface layer is predicted as a possible atomic origin of this defect. However, H and O coupled with second-layer vacancies and a substitutional C are not responsible for a type- C defect. We also discuss how the electronic structure of a type- C defect contributes to its specific scanning tunneling microscopy images.
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Colección: 01-internacional Banco de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Phys Rev Lett Año: 2000 Tipo del documento: Article País de afiliación: Japón
Buscar en Google
Colección: 01-internacional Banco de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Phys Rev Lett Año: 2000 Tipo del documento: Article País de afiliación: Japón