Your browser doesn't support javascript.
loading
Sub-20 nm short channel carbon nanotube transistors.
Seidel, R V; Graham, A P; Kretz, J; Rajasekharan, B; Duesberg, G S; Liebau, M; Unger, E; Kreupl, F; Hoenlein, W.
Afiliación
  • Seidel RV; Infineon Technologies AG, Corporate Research, 81730 Munich, Germany. robert.seidel@infineon.com
Nano Lett ; 5(1): 147-50, 2005 Jan.
Article en En | MEDLINE | ID: mdl-15792429
ABSTRACT
Carbon nanotube field-effect transistors with sub-20 nm long channels and on/off current ratios of >10(6) are demonstrated. Individual single-walled carbon nanotubes with diameters ranging from 0.7 to 1.1 nm grown from structured catalytic islands using chemical vapor deposition at 700 degrees C form the channels. Electron beam lithography and a combination of HSQ, calix[6]arene, and PMMA e-beam resists were used to structure the short channels and source and drain regions. The nanotube transistors display on-currents in excess of 15 microA for drain-source biases of only 0.4 V.
Buscar en Google
Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2005 Tipo del documento: Article País de afiliación: Alemania
Buscar en Google
Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2005 Tipo del documento: Article País de afiliación: Alemania