Cold and intense OH radical beam sources.

Ploenes, Ludger; Haas, Dominik; Zhang, Dongdong; van de Meerakker, Sebastiaan Y T; Willitsch, Stefan

Ploenes, Ludger; Haas, Dominik; Zhang, Dongdong; van de Meerakker, Sebastiaan Y T; Willitsch, Stefan.

Afiliación

Ploenes L; Institute for Molecules and Materials, Radboud University, Heijendaalseweg 135, 6525 AJ Nijmegen, The Netherlands.
Haas D; Department of Chemistry, University of Basel, Klingelbergstrasse 80, 4056 Basel, Switzerland.
Zhang D; Department of Chemistry, University of Basel, Klingelbergstrasse 80, 4056 Basel, Switzerland.
van de Meerakker SY; Institute for Molecules and Materials, Radboud University, Heijendaalseweg 135, 6525 AJ Nijmegen, The Netherlands.
Willitsch S; Department of Chemistry, University of Basel, Klingelbergstrasse 80, 4056 Basel, Switzerland.

Rev Sci Instrum ; 87(5): 053305, 2016 05.

Article en En | MEDLINE | ID: mdl-27250412

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Rev Sci Instrum Año: 2016 Tipo del documento: Article País de afiliación: Países Bajos

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