Desublimation Frosting on Nanoengineered Surfaces.
ACS Nano
; 12(8): 8288-8296, 2018 Aug 28.
Article
en En
| MEDLINE
| ID: mdl-30001108
Ice nucleation from vapor presents a variety of challenges across a wide range of industries and applications including refrigeration, transportation, and energy generation. However, a rational comprehensive approach to fabricating intrinsically icephobic surfaces for frost formation-both from water condensation (followed by freezing) and in particular from desublimation (direct growth of ice crystals from vapor)-remains elusive. Here, guided by nucleation physics, we investigate the effect of material composition and surface texturing (atomically smooth to nanorough) on the nucleation and growth mechanism of frost for a range of conditions within the sublimation domain (0 °C to -55 °C; partial water vapor pressures 6 to 0.02 mbar). Surprisingly, we observe that on silicon at very cold temperatures-below the homogeneous ice solidification nucleation limit (<-46 °C)-desublimation does not become the favorable pathway to frosting. Furthermore, we show that surface nanoroughness makes frost formation on silicon more probable. We experimentally demonstrate at temperatures between -48 °C and -55 °C that nanotexture with radii of curvature within 1 order of magnitude of the critical radius of nucleation favors frost growth, facilitated by capillary condensation, consistent with Kelvin's equation. Our findings show that such nanoscale surface morphology imposed by design to impart desired functionalities-such as superhydrophobicity-or from defects can be highly detrimental for frost icephobicity at low temperatures and water vapor partial pressures (<0.05 mbar). Our work contributes to the fundamental understanding of phase transitions well within the equilibrium sublimation domain and has implications for applications such as travel, power generation, and refrigeration.
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1
Colección:
01-internacional
Banco de datos:
MEDLINE
Idioma:
En
Revista:
ACS Nano
Año:
2018
Tipo del documento:
Article
País de afiliación:
Suiza