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Scalable, ultra-resistant structural colors based on network metamaterials.
Galinski, Henning; Favraud, Gael; Dong, Hao; Gongora, Juan S Totero; Favaro, Grégory; Döbeli, Max; Spolenak, Ralph; Fratalocchi, Andrea; Capasso, Federico.
Afiliación
  • Galinski H; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge 02138, USA.
  • Favraud G; Laboratory for Nanometallurgy, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich 8093, Switzerland.
  • Dong H; PRIMALIGHT, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia.
  • Gongora JST; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge 02138, USA.
  • Favaro G; Laboratory for Nanometallurgy, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich 8093, Switzerland.
  • Döbeli M; PRIMALIGHT, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia.
  • Spolenak R; Anton Paar TriTec SA, Peseux CH-2034, Switzerland.
  • Fratalocchi A; Ion Beam Physics, ETH Zurich, Otto-Stern-Weg 5, Zurich 8093, Switzerland.
  • Capasso F; Laboratory for Nanometallurgy, ETH Zurich, Vladimir-Prelog-Weg 1-5/10, Zurich 8093, Switzerland.
Light Sci Appl ; 6(5): e16233, 2017 May.
Article en En | MEDLINE | ID: mdl-30167248

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Light Sci Appl Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Light Sci Appl Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos