Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography.

Wang, Yingzhi; Han, Tailin; Jiang, Xu; Yan, Yuhan; Liu, Hong

Wang, Yingzhi; Han, Tailin; Jiang, Xu; Yan, Yuhan; Liu, Hong.

Afiliación

Wang Y; School of Electronics and Information Engineering, Changchun University of Science and Technology, Changchun 130022, China.
Han T; School of Electronics and Information Engineering, Changchun University of Science and Technology, Changchun 130022, China.
Jiang X; School of Electronics and Information Engineering, Changchun University of Science and Technology, Changchun 130022, China.
Yan Y; School of Electronics and Information Engineering, Changchun University of Science and Technology, Changchun 130022, China.
Liu H; School of Opto-electronic Engineering, Changchun University of Science and Technology, Changchun 130022, China.

Entropy (Basel) ; 22(3)2020 Mar 03.

Article en En | MEDLINE | ID: mdl-33286069

Palabras clave

DMD; adaptive algorithm; dual-operator and dual-population ant colony algorithm; path planning; pattern transfer

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Entropy (Basel) Año: 2020 Tipo del documento: Article País de afiliación: China

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