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Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant.
Sahoo, Bichitra Nanda; Han, So Young; Kim, Hyun-Tae; Ando, Keita; Kim, Tae-Gon; Kang, Bong-Kyun; Klipp, Andreas; Yerriboina, Nagendra Prasad; Park, Jin-Goo.
Afiliación
  • Sahoo BN; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea.
  • Han SY; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea.
  • Kim HT; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea.
  • Ando K; Department of Mechanical Engineering, Keio University, Yokohama 223-8522, Japan.
  • Kim TG; Department of Smart Convergence Engineering, Hanyang University, Ansan 15588, Republic of Korea.
  • Kang BK; Electronic Material R&D Center Asia, BASF, Suwon 16419, Republic of Korea.
  • Klipp A; BASF SE, Ludwigshafen 67056, Germany.
  • Yerriboina NP; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea. Electronic address: nag@hanyang.ac.kr.
  • Park JG; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea. Electronic address: jgpark@hanyang.ac.kr.
Ultrason Sonochem ; 82: 105859, 2022 Jan.
Article en En | MEDLINE | ID: mdl-34969001

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Ultrason Sonochem Asunto de la revista: DIAGNOSTICO POR IMAGEM Año: 2022 Tipo del documento: Article

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Ultrason Sonochem Asunto de la revista: DIAGNOSTICO POR IMAGEM Año: 2022 Tipo del documento: Article