Sub-micrometre focusing of intense 100â
keV X-rays with multilayer reflective optics.
J Synchrotron Radiat
; 31(Pt 2): 276-281, 2024 Mar 01.
Article
en En
| MEDLINE
| ID: mdl-38385278
ABSTRACT
A high-flux sub-micrometre focusing system was constructed using multilayer focusing mirrors in Kirkpatrick-Baez geometry for 100â
keV X-rays. The focusing mirror system had a wide bandwidth of 5% and a high peak reflectivity of 74%. Performance was evaluated at the undulator beamline BL05XU of SPring-8, which produced an intense 100â
keV X-ray beam with a bandwidth of 1%. When the light source was focused directly in both vertical and horizontal directions, the beam size was measured to be 0.32â
µm (V) × 5.3â
µm (H) with a flux of 1 × 1012â
photonsâ
s-1. However, when a limited horizontal slit was used to form a secondary source, the focusing beam size decreased to 0.25â
µm (V) × 0.26â
µm (H) with a flux of 6 × 1010â
photonsâ
s-1. The 200â
nm line and space patterns of a Siemens star chart made of tantalum were clearly resolved by the absorption contrast of the focused beam. This 100â
keV focusing system is applicable to various fields of nondestructive analyses with sub-micrometre resolutions.
Texto completo:
1
Colección:
01-internacional
Banco de datos:
MEDLINE
Idioma:
En
Revista:
J Synchrotron Radiat
Asunto de la revista:
RADIOLOGIA
Año:
2024
Tipo del documento:
Article
País de afiliación:
Japón