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Universal scaling law for chiral antiferromagnetism.
Xu, Shijie; Dai, Bingqian; Jiang, Yuhao; Xiong, Danrong; Cheng, Houyi; Tai, Lixuan; Tang, Meng; Sun, Yadong; He, Yu; Yang, Baolin; Peng, Yong; Wang, Kang L; Zhao, Weisheng.
Afiliación
  • Xu S; National Key Laboratory of Spintronics, Hangzhou International Innovation Institute, Beihang University, 311115, Hangzhou, China.
  • Dai B; Department of Electrical and Computer Engineering, University of California, Los Angeles, CA, 90095, USA.
  • Jiang Y; Shanghai Key Laboratory of Special Artificial Microstructure, Pohl Institute of Solid State Physics and School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China.
  • Xiong D; Fert Beijing Institute, School of Integrated Circuit Science and Engineering, Beihang University, Beijing, 100191, China.
  • Cheng H; Hefei Innovation Research Institute, Beihang University, Hefei, China.
  • Tai L; Department of Electrical and Computer Engineering, University of California, Los Angeles, CA, 90095, USA.
  • Tang M; National Key Laboratory of Spintronics, Hangzhou International Innovation Institute, Beihang University, 311115, Hangzhou, China.
  • Sun Y; Shanghai Key Laboratory of Special Artificial Microstructure, Pohl Institute of Solid State Physics and School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China.
  • He Y; National Key Laboratory of Spintronics, Hangzhou International Innovation Institute, Beihang University, 311115, Hangzhou, China.
  • Yang B; Fert Beijing Institute, School of Integrated Circuit Science and Engineering, Beihang University, Beijing, 100191, China.
  • Peng Y; National Key Laboratory of Spintronics, Hangzhou International Innovation Institute, Beihang University, 311115, Hangzhou, China.
  • Wang KL; Fert Beijing Institute, School of Integrated Circuit Science and Engineering, Beihang University, Beijing, 100191, China.
  • Zhao W; Hefei Innovation Research Institute, Beihang University, Hefei, China.
Nat Commun ; 15(1): 3717, 2024 May 02.
Article en En | MEDLINE | ID: mdl-38697983
ABSTRACT
The chiral antiferromagnetic (AFM) materials, which have been widely investigated due to their rich physics, such as non-zero Berry phase and topology, provide a platform for the development of antiferromagnetic spintronics. Here, we find two distinctive anomalous Hall effect (AHE) contributions in the chiral AFM Mn3Pt, originating from a time-reversal symmetry breaking induced intrinsic mechanism and a skew scattering induced topological AHE due to an out-of-plane spin canting with respect to the Kagome plane. We propose a universal AHE scaling law to explain the AHE resistivity ( ρ A H ) in this chiral magnet, with both a scalar spin chirality (SSC)-induced skew scattering topological AHE term, a s k and non-collinear spin-texture induced intrinsic anomalous Hall term, b i n . We found that a s k and b i n can be effectively modulated by the interfacial electron scattering, exhibiting a linear relation with the inverse film thickness. Moreover, the scaling law can explain the anomalous Hall effect in various chiral magnets and has far-reaching implications for chiral-based spintronics devices.

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nat Commun Asunto de la revista: BIOLOGIA / CIENCIA Año: 2024 Tipo del documento: Article País de afiliación: China

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nat Commun Asunto de la revista: BIOLOGIA / CIENCIA Año: 2024 Tipo del documento: Article País de afiliación: China