RESUMEN
Extreme ultraviolet (EUV) photon beam characterization techniques, Hartmann wavefront sensing and single shot ablation imprinting, were compared along the caustic of a tightly focused free-electron laser (FEL) beam at beamline FL24 of FLASH2, the Free-electron LASer in Hamburg at DESY. The transverse coherence of the EUV FEL was determined by a Young's double pinhole experiment and used in a back-propagation algorithm which includes partial coherence to calculate the beam intensity profiles along the caustic from the wavefront measurements. A very good agreement of the profile structure and size is observed for different wavelengths between the back-propagated profiles, an indirect technique, and ablation imprints. As a result, the Hartmann wavefront sensor including its software MrBeam is a very useful, single shot pulse resolved and fast tool for non-invasive determination of focal spot size and shape and also for beam profiles along the caustic.
RESUMEN
In this work, single-shot ptychography was adapted to the XUV range and, as a proof of concept, performed at the free-electron laser FLASH at DESY to obtain a high-resolution reconstruction of a test sample. Ptychography is a coherent diffraction imaging technique capable of imaging extended samples with diffraction-limited resolution. However, its scanning nature makes ptychography time-consuming and also prevents its application for mapping of dynamical processes. Single-shot ptychography can be realized by collecting the diffraction patterns of multiple overlapping beams in one shot and, in recent years, several concepts based on two con-focal lenses were employed in the visible regime. Unfortunately, this approach cannot be extended straightforwardly to X-ray wavelengths due to the use of refractive optics. Here, a novel single-shot ptychography setup utilizes a combination of X-ray focusing optics with a two-dimensional beam-splitting diffraction grating. It facilitates single-shot imaging of extended samples at X-ray wavelengths.
RESUMEN
Polyethylene terephthalate (PET) is a thermoplastic polyester with numerous applications in industry. However, it requires surface modification on an industrial scale for printing and coating processes and plasma treatment is one of the most commonly used techniques to increase the hydrophilicity of the PET films. Systematic improvement of the surface modification by adaption of the plasma process can be aided by a comprehensive understanding of the surface morphology and chemistry. However, imaging large surface areas (tens of microns) with a resolution that allows understanding the surface quality and modification is challenging. As a proof-of-principle, plasma-treated PET films were used to demonstrate the capabilities of X-ray ptychography, currently under development at the soft X-ray free-electron laser FLASH at DESY, for imaging macroscopic samples. In combination with scanning electron microscopy (SEM), this new technique was used to study the effects of different plasma treatment processes on PET plastic films. The studies on the surface morphology were complemented by investigations of the surface chemistry using X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). While both imaging techniques consistently showed an increase in roughness and change in morphology of the PET films after plasma treatment, X-ray ptychography can provide additional information on the three-dimensional morphology of the surface. At the same time, the chemical analysis shows an increase in the oxygen content and polarity of the surface without significant damage to the polymer, which is important for printing and coating processes.
RESUMEN
Ptychography, a scanning coherent diffraction imaging method, can produce a high-resolution reconstruction of a sample and, at the same time, of the illuminating beam. The emergence of vacuum ultraviolet and X-ray free electron lasers (FELs) has brought sources with unprecedented characteristics that enable X-ray ptychography with highly intense and ultra-fast short-wavelength pulses. However, the shot-to-shot pulse fluctuations typical for FEL pulses and particularly the partial spatial coherence of self-amplified spontaneous emission (SASE) FELs lead to numerical complexities in the ptychographic algorithms and ultimately restrict the application of ptychography at FELs. We present a general adaptive forward model for ptychography based on automatic differentiation, which is able to perform reconstructions even under these conditions. We applied this model to the first ptychography experiment at FLASH, the Free electron LASer in Hamburg, and obtained a high-resolution reconstruction of the sample as well as the complex wavefronts of individual FLASH pulses together with their coherence properties. This is not possible with more common ptychography algorithms.
RESUMEN
Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.
RESUMEN
We present a novel, to the best of our knowledge, Hartmann wave front sensor for extreme ultraviolet (EUV) spectral range with a numerical aperture (NA) of 0.15. The sensor has been calibrated using an EUV radiation source based on gas high harmonic generation. The calibration, together with simulation results, shows an accuracy beyond λ/39 root mean square (rms) at λ=32nm. The sensor is suitable for wave front measurement in the 10 nm to 45 nm spectral regime. This compact wave front sensor is high-vacuum compatible and designed for in situ operations, allowing wide applications for up-to-date EUV sources or high-NA EUV optics.
RESUMEN
Wavefront-propagation simulations have been performed to complete the design of a monochromator beamline for FLASH2, the variable-gap undulator line at the soft X-ray free-electron laser in Hamburg (FLASH). Prior to propagation through the beamline optical elements, the parameters of the photon source were generated using the GENESIS code which includes the free-electron laser experimental data. Threshold tolerances for the misalignment of mirror angles are calculated and, since diffraction effects were included in the simulations, the minimum quality with respect to the slope errors required for the optics is determined.
RESUMEN
Short-wavelength imaging, spectroscopy, and lithography scale down the characteristic length-scale to nanometers. This poses tight constraints on the optics finishing tolerances, which is often difficult to characterize. Indeed, even a tiny surface defect degrades the reflectivity and spatial projection of such optics. In this study, we demonstrate experimentally that a Hartmann wavefront sensor for extreme ultraviolet (XUV) wavelengths is an effective non-contact analytical method for inspecting the surface of multilayer optics. The experiment was carried out in a tabletop laboratory using a high-order harmonic generation as an XUV source. The wavefront sensor was used to measure the wavefront errors after the reflection of the XUV beam on a spherical Ru/B4C multilayer mirror, scanning a large surface of approximately 40 mm in diameter. The results showed that the technique detects the aberrations in the nanometer range.
RESUMEN
A Y/Mo multilayer coating, optimized for top reflectivity at λ=12 nm, has been nano-inspected after long-term operation at the in-house soft x-ray laser. The surface and optical inspections were complemented by electron microscopy on cross sections, prepared with focused ion beam technology. A factor of 2.5 loss of reflectivity in the exposed area (ca. 30% relative loss every 100 shots), with concomitant nanoscale photodamage and particle fallout, was found. The x-ray-laser-induced damage extended as deep as 250 nm beneath the surface and as wide as the millimeter spot size.
