Plasma-Etched Black GaAs Nanoarrays with Gradient Refractive Index Profile for Broadband, Omnidirectional, and Polarization-Independent Antireflection.

Black GaAs nanotip arrays (NTs) with 3300 nm lengths were fabricated via self-masked plasma etching. We show, both experimentally and numerically, that these NTs, with three gradient refractive index layers, effectively suppress Fresnel reflections at the air-GaAs interface over a broad range of wavelengths. These NTs exhibit exceptional UV-Vis light absorption (up to 99%) and maintain high NIR absorption (33-60%) compared to bare GaAs. Moreover, possessing a graded layer with a low refractive index (n = 1.01 to 1.12), they achieve angular and polarization-independent antireflection properties exceeding 80° at 632.8 nm, aligning with perfect antireflective coating theory predictions. This approach is anticipated to enhance the performance of optoelectronic devices across a wide range of applications.

Experimental Research on the Anti-Reflection Crack Performance of Basalt Fiber Modified Rubber Asphalt Stress-Absorbing Layer.

Reflection cracks are one of the most common problems in semi-rigid base pavement. Setting a stress absorption layer can effectively delay the occurrence of reflection cracks, but further improvement is still needed in its interlayer bonding performance and anti-reflection crack performance. Considering the excellent crack resistance of basalt fibers and the good elastic recovery ability of rubber asphalt, it is considered worthwhile to incorporate them into traditional stress absorption layers to improve performance. To simulate the actual pavement layer effect, composite specimens consisting of a cement-stabilized macadam base + basalt fiber rubber asphalt stress-absorbing layer + AC-20 asphalt mixture surface layer were prepared to evaluate their performance through interlayer direct shear tests, interlayer tensile tests, three-point bending tests, and overlay tests (OTs). To determine the optimal fiber blending combination, four fiber lengths (3 cm, 6 cm, 9 cm, 12 cm) and four fiber proportions (120 g/m2, 140 g/m2, 160 g/m2, 180 g/m2) were selected respectively. The specific effects of basalt fibers with different lengths and dosages were analyzed. The results show that compared with the absence of fibers, the improvement of interlayer bonding performance of rubber asphalt with basalt fibers is not significant, and it has certain limitations; however, the improvement of anti-reflective crack performance is significant, with an increase of up to 305.5%. This indicates that the network structure formed by basalt fibers and rubber asphalt stress absorption layer can effectively absorb and disperse external loads, causing an excellent crack resistance effect. Meanwhile, the results indicate that the main factor affecting its interlayer bonding strength and anti-reflective crack performance is the fiber content. Based on the comprehensive analysis of the performance and economy of the stress absorption layer of basalt fiber rubber asphalt, the optimal fiber parameter combination recommended is as fiber length 9 cm and fiber content 160 g/m2. These results can provide a reference for the design and performance evaluation of basalt fiber rubber asphalt stress absorption layer, and have certain application value.

Mechanically-Durable Antireflective Subwavelength Nanoholes on Glass Surfaces Using Lithography-Free Fabrication.

Traditional multilayer antireflection (AR) surfaces are of significant importance for numerous applications, such as laser optics, camera lenses, and eyeglasses. Recently, technological advances in the fabrication of biomimetic AR surfaces capable of delivering broadband omnidirectional high transparency combined with self-cleaning properties have opened an alternative route toward realization of multifunctional surfaces which would be beneficial for touchscreen displays or solar harvesting devices. However, achieving the desired surface properties often requires sophisticated lithography fabrication methods consisting of multiple steps. In the present work, we show the design and implementation of mechanically robust AR surfaces fabricated by a lithography-free process using thermally dewetted silver as an etching mask. Both-sided nanohole (NH) surfaces exhibit transmittance above 99% in the visible or the near-infrared ranges combined with improved angular response at an angle of incidence of up to θi = 60°. Additionally, the NHs demonstrate excellent mechanical resilience against repeated abrasion with cheesecloth due to favorable redistribution of the shearing mechanical forces, making them a viable option for touchscreen display applications.

Geometric design of antireflective leafhopper brochosomes.

In nature, leafhoppers cover their body surfaces with brochosomes as a protective coating. These leafhopper-produced brochosomes are hollow, buckyball-shaped, nanoscopic spheroids with through-holes distributed across their surfaces, representing a class of deployable optical materials that are rare in nature. Despite their discovery in the 1950s, it remains unknown why the sizes of brochosomes and their through-holes consistently fall within the range of hundreds of nanometers across different leafhopper species. Here, we demonstrate that the hierarchical geometries of brochosomes are engineered within a narrow size range with through-hole architecture to significantly reduce light reflection. By utilizing two-photon polymerization three-dimensional printing to fabricate high-fidelity synthetic brochosomes, we investigated the optical form-to-function relationship of brochosomes. Our results show that the diameters of brochosomes are engineered within a specific size range to maximize broadband light scattering, while the secondary through-holes are designed to function as short-wavelength, low-pass filters, further reducing light reflection. These synergistic effects enable brochosomes to achieve a substantial reduction in specular reflection, by up to approximately 80 to 94%, across a broadband wavelength range. Importantly, brochosomes represent a biological example demonstrating short-wavelength, low-pass filter functionality. Furthermore, our results indicate that the geometries of natural brochosomes may have evolved to effectively reduce reflection from ultraviolet to visible light, thereby enabling leafhoppers to evade predators whose vision spectrum encompasses both ultraviolet and visible light. Our findings offer key design insights into a class of deployable bioinspired optical materials with potential applications in omnidirectional antireflection coatings, optical encryption, and multispectral camouflage.

Innovative Strategies for Photons Management on Ultrathin Silicon Solar Cells.

Silicon (Si), the eighth most common element in the known universe by mass and widely applied in the industry of electronics chips and solar cells, rarely emerges as a pure element in the Earth's crust. Optimizing its manufacturing can be crucial in the global challenge of reducing the cost of renewable energy modules and implementing sustainable development goals in the future. In the industry of solar cells, this challenge is stimulating studies of ultrathin Si-based architectures, which are rapidly attracting broad attention. Ultrathin solar cells require up to two orders of magnitude less Si than conventional solar cells, and owning to a flexible nature, they are opening applications in different industries that conventional cells do not yet serve. Despite these attractive factors, a difficulty in ultrathin Si solar cells is overcoming the weak light absorption at near-infrared wavelengths. The primary goal in addressing this problem is scaling up cost-effective and innovative textures for anti-reflection and light-trapping with shallower depth junctions, which can offer similar performances to traditional thick modules. This review provides an overview of this area of research, discussing this field both as science and engineering and highlighting present progress and future outlooks.

Bridging the gap between surface physics and photonics.

Use and performance criteria of photonic devices increase in various application areas such as information and communication, lighting, and photovoltaics. In many current and future photonic devices, surfaces of a semiconductor crystal are a weak part causing significant photo-electric losses and malfunctions in applications. These surface challenges, many of which arise from material defects at semiconductor surfaces, include signal attenuation in waveguides, light absorption in light emitting diodes, non-radiative recombination of carriers in solar cells, leakage (dark) current of photodiodes, and light reflection at solar cell interfaces for instance. To reduce harmful surface effects, the optical and electrical passivation of devices has been developed for several decades, especially with the methods of semiconductor technology. Because atomic scale control and knowledge of surface-related phenomena have become relevant to increase the performance of different devices, it might be useful to enhance the bridging of surface physics to photonics. Toward that target, we review some evolving research subjects with open questions and possible solutions, which hopefully provide example connecting points between photonic device passivation and surface physics. One question is related to the properties of the wet chemically cleaned semiconductor surfaces which are typically utilized in device manufacturing processes, but which appear to be different from crystalline surfaces studied in ultrahigh vacuum by physicists. In devices, a defective semiconductor surface often lies at an embedded interface formed by a thin metal or insulator film grown on the semiconductor crystal, which makes the measurements of its atomic and electronic structures difficult. To understand these interface properties, it is essential to combine quantum mechanical simulation methods. This review also covers metal-semiconductor interfaces which are included in most photonic devices to transmit electric carriers to the semiconductor structure. Low-resistive and passivated contacts with an ultrathin tunneling barrier are an emergent solution to control electrical losses in photonic devices.

Physiochemical Coupled Dynamic Nanosphere Lithography Enabling Multiple Metastructures from Single Mask.

Metastructures are widely used in photonic devices, energy conversion, and biomedical applications. However, to fabricate multiple patterns continuously in single etching protocol with highly tunable photonic properties is challenging. Here, a simple and robust dynamic nanosphere lithography is proposed by inserting a spacer between the nanosphere assembly and the wafer. The nanosphere diameter decrease and uneven penetration of the spacer during etching lead to a dynamic masking process. Coupled anisotropic physical ion sputtering and ricocheting with isotropic chemical radical etching achieve highly tunable structures with various 3D patterns continuously forming through a single etching process. Specifically, the nanosphere diameters define the periodicity, the etched spacer forms the upper parts, and the wafer forms the lower parts. Each part of the structure is highly tunable through changing nanosphere diameter, spacer thickness, and etch conditions. Using this protocol, numerous structures of varying sizes including nanomushrooms, nanocones, nanopencils, and nanoneedles with diverse shapes are realized as proof of concepts. The broadband antireflection ability of the nanostructures and their use in surface-enhanced Raman spectroscopy are also demonstrated for practical application. This method substantially simplifies the fabrication procedure of various metastructures, paving the way for its application in multiple disciplines especially in photonic devices.

Enhancing Performance of Ultraviolet C Photodetectors Through Single-Domain Epitaxy of Monoclinic ß-Ga2 O3 Films and Tailored Anti-Reflection Coating.

Implementing high-performance ultraviolet C photodetectors (UVC PDs) based on ß-Ga2 O3 films is challenging owing to the anisotropic crystal symmetry between the epitaxial films and substrates. In this study, highly enhanced state-of-the-art photoelectrical performance is achieved using single-domain epitaxy of monoclinic ß-Ga2 O3 films on a hexagonal sapphire substrate. Unlike 3D ß-Ga2 O3 films with twin domains, 2D ß-Ga2 O3 films exhibit a single domain with a smooth surface and low concentration of point defects, which enable efficient charge separation by suppressing boundary-induced recombination. Furthermore, a tailored anti-reflection coating (ARC) is adopted as a light-absorbing medium to improve charge generation. The tailored nanostructure, which features a gradient refractive index, not only substantially reduces the reflection, but also suppresses the surface leakage current as a passivation layer. This study provides fundamental insights into the single-domain epitaxy of ß-Ga2 O3 films and the application of ARC for the development of high-performance UVC PDs.

Effects of MgF2anti-reflection coating on optical losses in metal halide perovskite solar cells.

The importance of light management for perovskite solar cells (PSCs) has recently been emphasized because their power conversion efficiency approaches their theoretical thermodynamic limits. Among optical strategies, anti-reflection (AR) coating is the most widely used method to reduce reflectance loss and thus increase light-harvesting efficiency. Monolayer MgF2is a well-known AR material because of its optimal refractive index, simple fabrication process, and physical and chemical durabilities. Nevertheless, quantitative estimates of the improvement achieved by the MgF2AR layer are lacking. In this study, we conducted theoretical and experimental evaluations to assess the AR effect of MgF2on the performance of formamidinium lead-triiodide PSCs. A sinusoidal tendency to enhance the short-circuit current density (JSC) was observed depending on the thickness, which was attributed to the interference of the incident light. A transfer matrix method-based simulation was conducted to calculate the optical losses, demonstrating the critical impact of reflectance loss on theJSCimprovement. The predictedJSCs values, depending on the perovskite thickness and the incident angle, are also presented. The combined use of experimental and theoretical approaches offers notable advantages, including accurate interpretation of photocurrent generation, detailed optical analysis of the experimental results, and device performance predictions under unexplored conditions.

Numerical Study on Overcoming the Light-Harvesting Limitation of Lead-Free Cs2AgBiBr6 Double Perovskite Solar Cell Using Moth-Eye Broadband Antireflection Layer.

Lead-free Cs2AgBiBr6 double perovskite has emerged as a promising new-generation photovoltaic, due to its non-toxicity, long carrier lifetime, and low exciton binding energies. However, the low power conversion efficiency, due to the high indirect bandgap (≈2 eV), is a challenge that must be overcome and acts as an obstacle to commercialization. Herein, to overcome the limitations through the light trapping strategy, we analyzed the performance evaluation via FDTD simulation when applying the moth-eye broadband antireflection (AR) layer on top of a Cs2AgBiBr6 double perovskite cell. A parabola cone structure was used as a moth-eye AR layer, and an Al2O3 (n: 1.77), MgF2 (n: 1.38), SiO2 (n: 1.46), and ZnO (n: 1.9) were selected as investigation targets. The simulation was performed assuming that the IQE was 100% and when the heights of Al2O3, MgF2, SiO2, and ZnO were 500, 350, 250, and 450 nm, which are the optimal conditions, respectively, the maximum short-circuit current density improved 41, 46, 11.7, and 15%, respectively, compared to the reference cell. This study is meaningful and innovative in analyzing how the refractive index of a moth-eye antireflection layer affects the light trapping within the cell under broadband illumination until the NIR region.

Preparation of NaYF4:Tm, Yb, and Gd Luminescent Nanorods/SiO2 Nanospheres Composite Thin Film and Its Application in Perovskite Solar Cells.

In this study, we aim to minimize light loss and achieve high power conversion efficiencies (PCE) in perovskite solar cells (PSCs) by employing a spectral conversion film component with antireflection properties. In our scheme, NaYF4:Tm, Yb, and Gd luminescent nanorod/silica nanosphere-based thin films are applied on CH3NH3PbI3 PSCs to improve the device efficiency. The film was fabricated by spin coating an aged silica sol containing NaYF4:Tm, Yb, and Gd luminescent nanorods. The size and the spectral conversion properties of the NaYF4:Tm, Yb, and Gd luminescent nanorods were controlled by tuning the Gd3+ ion concentration. The microstructure and the transmittance properties of the thin film were controlled by changing the concentration of NaYF4:Tm, Yb, and Gd luminescent nanorod in silica sol. The thin films have excellent spectral conversion properties while exhibiting a maximum transmittance. The photovoltaic performance of PSCs with NaYF4:Tm, Yb, and Gd luminescent nanorod/silica nanosphere-based thin films was systematically investigated. The light transmittance was optimized to 95.1% on a cleaned glass substrate, which resulted in an average increase of about 3.0% across the broadband range of 400-800 nm. The optimized films widen the spectrum of light absorbed by conventional PSC cells and reduce reflections across a broad range, enhancing the photovoltaic performance of PSCs. As a result, the PCE of the PSC increased from 14.51% for the reference device without a thin film to 15.67% for the PSC device with an optimized thin film. This study presents a comprehensive solution to the problem of Fresnel reflection and spectral response mismatch of the PSCs, which provides new ideas for the light management of PSCs.

Discretely-supported transfer nanoimprint anti-reflection nanostructures on complex uneven surface of Fresnel lenses.

Nanopatterning complex uneven surface of numerous functional devices to improve their performance is significantly appealing; however, it is extremely challenging. This study proposes a discretely-supported transfer nanoimprint technique to fabricate nanostructures on complex device surfaces containing multi-spatial frequencies. First, a discretely-supported nanoimprint template was designed based on the built energy criterion. A contact fidelity of over 99% was achieved between the designed template and the targeted complex uneven substrate surface. Next, the prefilled nanostructures on the template were transferred to the target surface after contact. By precisely controlling the amount of micro-droplet jetting on the template on-demand, the accumulation of the polymer in the micro-valley sites on the complex substrate was avoided, thus maintaining the morphology and generating function of the devices. Finally, high-quality Fresnel lenses with broadband wide-directional antireflection and excellent imaging performance were developed by imprinting subwavelength-tapered nanostructures on the relief surface.

Anti-reflection effect of high refractive index polyurethane with different light trapping structures on solar cells.

The textured surfaces to reduce light reflectivity by using acid-alkali chemical etching and SiNx films are generally necessary for commercial crystalline silicon solar cells. However, this etching process requires a large amount of environmentally harmful acid-alkali solution and has limited options for texture and size. To overcome these disadvantages, a new anti-reflection strategy is proposed in this study, which is using soft nanoimprint lithography to prepare the textured structures on the outside of the SiNx films. The polyurethane with a high refractive index of 1.64 is selected as the texture material, and different templates are selected to prepare it into different light trapping structures, including positive-inverted pyramids, inverted lace cones, and positive-inverted moth-eye nanostructures allowing for easy customization of the textured structures. The finite element simulation and experiments demonstrate that these light trapping structures have a wide spectrum anti-reflection performance in visible and near-infrared bands. With the back surface of the commercial passivated emitter rear contact (PERC) bi-facial solar cells as the imprint substrates, some light trapping structures can reduce the surface weighted average light reflectivity (Rw) at the band of 300-1200 nm from 18.31% to less than 10% and the optimal structures can reduce Rw to 8.71%. This anti-reflection strategy can also be applied to thin-film solar cells and crystalline silicon solar cells of other structures, such as HIT, Topcon, Perovskite/c-Si tandem, and so forth, which shows great development potential.

Resonant Anti-Reflection Metasurfaces for Infrared Transmission Optics.

A fundamental capability needed for any transmissive optical component is anti-reflection, yet this capability can be challenging to achieve in a cost-effective manner over longer infrared wavelengths. We demonstrate that Mie-resonant photonic structures can enable high transmission through a high-index optical component, allowing it to function effectively over long-wavelength infrared wavelengths. Using silicon as a model system, we demonstrate a resonant metasurface that enables a window optic with transmission up to 40% greater than that of unpatterned Si. Imaging comparisons with unpatterned Si and off-the-shelf germanium optics are shown as well as modulation transfer function measurements, showing excellent performance and suitability for imaging applications. Our results show how resonant photonic structures can be used to improve optical transmission through high-index optical components and highlight their possible use in infrared imaging applications.

Asymmetric Plasmonic Moth-Eye Nanoarrays with Side Opening for Broadband Incident-Angle-Insensitive Antireflection and Absorption.

Plasmonic absorbers with broadband angle-insensitive antireflection have attracted intense interests because of its wide applications in optical devices. Hybrid surfaces with multiple different sub-wavelength array units can provide broadened antireflection, while many of these antireflective surfaces only work for specific angles and require high complexity of nanofabrication. Here, a plasmonic asymmetric nanostructure composed of the moth-eye dielectric nanoarray partially modified with the top Ag nanoshell providing a side opening for broadband incident-angle-insensitive antireflection and absorption, is rationally designed by nanoimprinting lithography and oblique angle deposition. This study illustrates that the plasmonic asymmetric nanostructure not only excites strong plasmonic resonance, but also induces more light entry into the dielectric nanocavity and then enhances the internal scattering, leading to optimized light localization. Hence, the asymmetric nanostructure can effectively enhance light confinement at different incident angles and exhibit better antireflection and the corresponding absorption performance than that of symmetric nanostructure over the visible wavelengths, especially suppressing at least 16.4% lower reflectance in the range of 645-800 nm at normal incidence.Moreover, the reflectance variance of asymmetric nanostructure with the incident angle changing from 5° to 60° is much smaller than that of symmetric nanostructure, making our approach relevant for various applications in photocatalysis, photothermal conversion, and so on.

Self-Oxidation Resistance of the Curved Surface of Achromatic Copper.

Copper surfaces that exhibit a wide range of achromatic colors while still metallic have not been studied, despite advancements in antireflection coatings. A series of achromatic copper films grown with [111] preferred orientation by depositing 3D porous nanostructures is introduced via coherent/incoherent atomic sputtering epitaxy. The porous copper nanostructures self-regulate the giant oxidation resistance by constructing a curved surface that generates a series of monoatomic steps, followed by shrinkage of the lattice spacing of one or two surface layers. First-principles calculations confirm that these structural components cooperatively increase the energy barrier against oxygen penetration. The achromaticity of the single-crystalline porous copper films is systematically tuned by geometrical parameters such as pore size distribution and 3D linkage. The optimized achromatic copper films with high oxidation resistance show an unusual switching effect between superhydrophilicity and superhydrophobicity. The tailored 3D porous nanostructures can be a candidate material for numerous applications, such as antireflection coatings, microfluidic devices, droplet tweezers, and reversible wettability switches.

Dual Porosity-Enhanced Antireflection Coatings with Continuous Gradient.

The incorporation of porous structures into films and coatings can transform their properties for applications in optics, separation, electronics, and energy generation and storage. Packing nanoparticles (NPs) is a versatile approach for fabricating nanoporous films with a tunable structure and properties. The mechanical fragility of NP packing-based films and coatings, however, significantly impedes their widespread utilization. Although infiltrating a polymer into the interstices of these NP packings has been shown to enhance their mechanical durability, this method completely eliminates the porosity of the structures, compromising their properties and functionality. This study presents a new approach to fabricate highly loaded porous nanocomposite films with a gradient in the refractive index by infiltrating subsaturating amounts of poly(methyl methacrylate) (PMMA) into disordered packings of hollow silica NPs. We demonstrate that dual porosity is a critical feature that enhances their antireflection (AR) and mechanical properties. The hollow cores of NPs prevent a substantial increase in the refractive index of the resulting films. Moreover, the interparticle voids allow for mechanical reinforcement to occur when the NP packings are infiltrated with PMMA, making them even more suitable for AR coatings. The refractive index and gradient across the nanocomposites can be tailored by adjusting the amount of PMMA infiltrated into the NP packing, the shape of hollow NPs, and the annealing time. The nanocomposite coatings with a continuous gradient in refractive index exhibit excellent AR properties and enhanced mechanical durability. Combined with the unique structural tunability afforded by the dual porosity, this approach provides a scalable and effective way to create robust and graded nanoporous structures for various applications.

Design and Fabrication of Broadband InGaAs Detectors Integrated with Nanostructures.

A visible-extended shortwave infrared indium gallium arsenide (InGaAs) focal plane array (FPA) detector is the ideal choice for reducing the size, weight and power (SWaP) of infrared imaging systems, especially in low-light night vision and other fields that require simultaneous visible and near-infrared light detection. However, the lower quantum efficiency in the visible band has limited the extensive application of the visible-extended InGaAs FPA. Recently, a novel optical metasurface has been considered a solution for a high-performance semiconductor photoelectric device due to its highly controllable property of electromagnetic wave manipulation. Broadband Mie resonator arrays, such as nanocones and nanopillars designed with FDTD methods, were integrated on a back-illuminated InGaAs FPA as an AR metasurface. The visible-extended InGaAs detector was fabricated using substrate removal technology. The nanostructures integrated into the Vis-SWIR InGaAs detectors could realize a 10-20% enhanced quantum efficiency and an 18.8% higher FPA response throughout the wavelength range of 500-1700 nm. Compared with the traditional AR coating, nanostructure integration has advantages, such as broadband high responsivity and omnidirection antireflection, as a promising route for future Vis-SWIR InGaAs detectors with higher image quality.

CMOS Image Sensor for Broad Spectral Range with >90% Quantum Efficiency.

Even though the recent progress made in complementary metal-oxide-semiconductor (CMOS) image sensors (CIS) has enabled numerous applications affecting our daily lives, the technology still relies on conventional methods such as antireflective coatings and ion-implanted back-surface field to reduce optical and electrical losses resulting in limited device performance. In this work, these methods are replaced with nanostructured surfaces and atomic layer deposited surface passivation. The results show that such surface nanoengineering applied to a commercial backside illuminated CIS significantly extends its spectral range and enhances its photosensitivity as demonstrated by >90% quantum efficiency in the 300-700 nm wavelength range. The surface nanoengineering also reduces the dark current by a factor of three. While the photoresponse uniformity of the sensor is seen to be slightly better, possible scattering from the nanostructures can lead to increased optical crosstalk between the pixels. The results demonstrate the vast potential of surface nanoengineering in improving the performance of CIS for a wide range of applications.

Antireflection Structures for VIS and NIR on Arbitrarily Shaped Fused Silica Substrates with Colloidal Polystyrene Nanosphere Lithography.

Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR structures on arbitrarily shaped fused silica substrates is presented and evaluated. Special emphasis is placed on the involved manufacturing steps in order to be able to produce tailored and effective structures. An improved Langmuir-Blodgett self-assembly lithography technique enabled the deposition of 200 nm PS spheres on curved surfaces, independent of shape or material-specific characteristics such as hydrophobicity. The AR structures were fabricated on planar fused silica wafers and aspherical planoconvex lenses. Broadband AR structures with losses (reflection + transmissive scattering) of <1% per surface in the spectral range of 750-2000 nm were produced. At the best performance level, losses were less than 0.5%, which corresponds to an improvement factor of 6.7 compared to unstructured reference substrates.