New method for the determination of photoabsorption from transmittance measurements in the extreme ultraviolet.

We have developed a new method for the determination of photoabsorption at extreme ultraviolet wavelengths longer than 20 nm, where reliable refractive index values are sparse or non-existent. Our method overcomes the obstacle of multiple reflections that occur inside thin films in this spectral range, which up until now has prevented the accurate determination of photoabsorption from transmittance measurements. We have derived a mathematical expression that is independent of internal reflection amplitudes, while taking advantage of the transmittance oscillations stemming from such reflections. The method is validated on measurements of aluminum thin films. This advance will enable accurate refractive index values for many important materials for optical instrumentation, thus facilitating high-priority research on topics including coherent light sources, planetary and solar physics, and semiconductor manufacturing.

Depth-graded Mo/Si multilayer coatings for hard x-rays.

This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B 4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B 4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.

Fiber-Coupled Substrate-Integrated Hollow Waveguides: An Innovative Approach to Mid-infrared Remote Gas Sensors.

In this study, an innovative approach based on fiberoptically coupled substrate-integrated hollow waveguide (iHWG) gas cells for the analysis of low sample volumes suitable for remote broad- and narrow-band mid-infrared (MIR; 2.5-20 µm) sensing applications is reported. The feasibility of remotely addressing iHWG gas cells, configured in a double-pass geometry via a reflector, by direct coupling to a 7-around-1 mid-infrared fiber bundle is demonstrated, facilitating low-level hydrocarbon gas analysis. For comparison studies, two iHWGs with substrate dimensions of 50 × 50 × 12 mm (L × W × H) and geometric channel lengths of 138 and 58.5 mm, serving as miniature light-guiding gas cells, were fiber-coupled to a Fourier transform infrared spectrometer enabling broadband MIR sensing. In addition to the fundamental feasibility of this concept, the achievable sensitivity toward several gaseous hydrocarbons and the reproducibility of assembling the fiber-iHWG interface were investigated.

Aperiodic Mo/Si multilayers for hard x-rays.

In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ± 0.05°. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard x-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of ± 0.05°, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard x-ray imaging of highly diverging sources.

Substrate-integrated hollow waveguides: a new level of integration in mid-infrared gas sensing.

A new generation of hollow waveguide (HWG) gas cells of unprecedented compact dimensions facilitating low sample volumes suitable for broad- and narrow-band mid-infrared (MIR; 2.5-20 µm) sensing applications is reported: the substrate-integrated hollow waveguide (iHWG). iHWGs are layered structures providing light guiding channels integrated into a solid-state substrate material, which are competitive if not superior in performance to conventional leaky-mode fiber optic silica HWGs having similar optical pathlengths. In particular, the provided flexibility in device and optical design and the wide variety of manufacturing strategies, substrate materials, access to the optical channel, and optical coating options highlight the advantages of iHWGs in terms of robustness, compactness, and cost-effectiveness. Finally, the unmatched modularity of this novel waveguide approach facilitates tailoring iHWGs to almost any kind of gas sensor technology providing adaptability to the specific demands of a wide range of sensing scenarios. Device fabrication is demonstrated for the example of a yin-yang-shaped gold-coated iHWG fabricated within an aluminum substrate with a footprint of only 75 mm × 50 mm × 12 mm (L × W × H), yet providing a nominal optical absorption path length of more than 22 cm. The analytical utility of this device for advanced MIR gas sensing applications is demonstrated for the gaseous constituents butane, carbon dioxide, cyclopropane, isobutylene, and methane.

Physics of reflective optics for the soft gamma-ray photon energy range.

Traditional multilayer reflective optics that have been used in the past for imaging at x-ray photon energies as high as 200 keV are governed by classical wave phenomena. However, their behavior at higher energies is unknown, because of the increasing effect of incoherent scattering and the disagreement between experimental and theoretical optical properties of materials in the hard x-ray and gamma-ray regimes. Here, we demonstrate that multilayer reflective optics can operate efficiently and according to classical wave physics up to photon energies of at least 384 keV. We also use particle transport simulations to quantitatively determine that incoherent scattering takes place in the mirrors but it does not affect the performance at the Bragg angles of operation. Our results open up new possibilities of reflective optical designs in a spectral range where only diffractive optics (crystals and lenses) and crystal monochromators have been available until now.

Camera for coherent diffractive imaging and holography with a soft-x-ray free-electron laser.

We describe a camera to record coherent scattering patterns with a soft-x-ray free-electron laser (FEL). The camera consists of a laterally graded multilayer mirror, which reflects the diffraction pattern onto a CCD detector. The mirror acts as a bandpass filter for both the wavelength and the angle, which isolates the desired scattering pattern from nonsample scattering or incoherent emission from the sample. The mirror also solves the particular problem of the extreme intensity of the FEL pulses, which are focused to greater than 10(14) W/cm2. The strong undiffracted pulse passes through a hole in the mirror and propagates onto a beam dump at a distance behind the instrument rather than interacting with a beam stop placed near the CCD. The camera concept is extendable for the full range of the fundamental wavelength of the free electron laser in Hamburg (FLASH) FEL (i.e., between 6 and 60 nm) and into the water window. We have fabricated and tested various multilayer mirrors for wavelengths of 32, 16, 13.5, and 4.5 nm. At the shorter wavelengths mirror roughness must be minimized to reduce scattering from the mirror. We have recorded over 30,000 diffraction patterns at the FLASH FEL with no observable mirror damage or degradation of performance.

Design and performance of capping layers for extreme-ultraviolet multilayer mirrors.

Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (EUV) light in a water-vapor environment. Based on accelerated exposure results, we calculated multilayer lifetimes for all reflective mirrors in a typical commercial EUVL tool and concluded that Ru-capped multilayers have approximately 40x longer lifetimes than Si-capped multilayers, which translates to 3 months to many years, depending on the mirror dose.