Absolute reflectivity measurements at 44.79 A of sputter deposited multilayer x-ray mirrors.

Multilayer x-ray mirrors have been deposited using a dc triode sputtering system, which incorporates an accurate method of thickness monitoring based on the dependence of the deposition rate on the target current. Thickness can be controlled with an accuracy of better than 0.1 A. High efficiency W-C and Ni-C multilayer mirrors have been synthesized and tested at 1.54-A (CuKoalpha) and 44.79-A (CKalpha). Absolute reflectivity measurements at lambda = 44.79-A (CKalpha) have been carried out. In this case the incident beam is previously polarized by a premonochromator equipped with a pair of parallel-plane multilayer mirrors fixed at an angle close to the Brewster (theta ? 45 degrees ). Thus the measured reflectivities are not affected by a progressive variation of the P-component.

Extreme UV and x-ray scattering measurements from a rough LiF crystal surface characterized by electron micrography.

XUV and x-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side peaks or asymmetry. The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the short spatial wavelengths of the surface roughness. This analysis shows that the surface has a large microroughness with an autocovariance function which is Gaussian in its initial portion. The first-order perturbation vector theory of the roughness-induced scattering leads to an interpretation of the ADSR features in terms of the modulation of the surface power spectral density function associated with the microroughness by an optical factor. The possibility of obtaining short scale roughness characterization from XUV or x-ray measurements is discussed.