RESUMO
This work reports the epitaxial growth of 8.5 µm-thick GaN layers on 200 mm engineered substrates with a polycrystalline AlN core (QST by QROMIS) for CMOS compatible processing of vertical GaN power devices. The epitaxial stack contains a 5 [Formula: see text]m thick drift layers with a Si doping density of 2 × 1016 cm-3 and total threading dislocation density of 4 × 108 cm-2. The thick drift layer requires fine-tuning of the epitaxial growth conditions to keep wafer bow under control and to avoid the formation of surface defects. Diode test structures processed with this epitaxial stack achieved hard breakdown voltages > 750 V, which is shown to be limited by impurity or metal diffusion from the contact metal stack into threading dislocations. Conductive Atomic Force Microscopy (cAFM) reveals some leakage contribution from mixed type dislocations, which have their core structure identified as the double 5/6 atom configuration by scanning transmission electron microscopy images. Modelling of the leakage conduction mechanism with one-dimensional hopping conduction shows good agreement with the experimental data, and the resulting fitting parameters are compared to similar findings on silicon substrates. The outcome of this work is important to understand the possibilities and limitations of vertical GaN devices fabricated on large diameter wafers.
RESUMO
This article describes novel composite thin films consisting of GaN, C, and Ga (termed "GaCN", as an analogue to BCN and other carbonitrides) as a prospective material for future optical applications. This is due to their tunable refractive index that depends on the carbon content. The composites are prepared by introducing alternating pulses of trimethylgallium (TMG) and ammonia (NH3) on silicon substrates to mimic an atomic layer deposition process. Because the GaCN material is hardly reported to the best of our knowledge, a comprehensive characterization is performed to investigate into its chemical nature, primarily to determine whether or not it exists as a single-phase material. It is revealed that GaCN is a composite, consisting of phase-segregated, nanoscale clusters of wurtzitic GaN polycrystals, in addition to inclusions of carbon, nitrogen, and gallium, which are chemically bonded into several forms, but not belonging to the GaN crystals itself. By varying the deposition temperature between 400 and 600 °C and the NH3 partial pressure between 0.7 × 10-3 and 7.25 mbar, layers with a wide compositional range of Ga, C, and N are prepared. The role of carbon on the GaCN optical properties is significant: an increase of the refractive index from 2.19 at 1500 nm (for carbon-free polycrystalline GaN) to 2.46 (for GaCN) is achieved by merely 10 at. % of carbon addition. The presence of sp2-hybridized C=N clusters and carbon at the interface of the GaN polycrystals are proposed to determine their optical properties. Furthermore, the formation of the GaN polycrystals in the composite occurs through a TMG:NH3 surface-adduct assisted pathway, whereas the inclusions of carbon, nitrogen, and gallium are formed by the thermal decomposition of the chemisorbed TMG species.
RESUMO
Rapid and fine control over the phase of light is demonstrated by transferring digitally generated phase jumps from radio-frequency electrical signals onto light by means of acousto-optic interaction, and the underlying mechanism elucidated. This technique was used to engineer optical phase noise by tailoring the statistics of phase jumps in the electrical signal, which was then quantified using visibility measurements of the interference fringes. Such controlled dephasing finds applications in modern experiments involving the spread or diffusion of light in optical networks. In addition, the zero-delay intensity-intensity correlation [G2(0)] values of light emerging from different ports of a well-stabilized Mach-Zehnder interferometer in the presence of engineered partial phase noise are calculated, and it is shown analytically how the dark port of the interferometer nontrivially becomes a weak source of highly correlated or bunched photons.