Enhanced Photostability of Lead Halide Perovskite Nanocrystals with Mn3+ Incorporation.

Recently, lead halide perovskite nanocrystals (NCs) have shown great potential and have been widely studied in lighting and optoelectronic fields. However, the long-term stability of perovskite NCs under irradiation is an important challenge for their application in practice. Mn2+ dopants are mostly proposed as substitutes for the Pb site in perovskite NCs synthesized through the hot-injection method, with the aim of improving both photo- and thermal stability. In this work, we employed a facile ligand-assisted reprecipitate strategy to introduce Mn ions into perovskite lattice, and the results showed that Mn3+ instead of Mn2+, even with a very low level of incorporation of 0.18 mol % as interstitial dopant, can enhance the photostability of perovskite binder film under the ambient conditions without emission change, and the photoluminescent efficiency can retain 70% and be stable under intensive irradiation for 12 h. Besides, Mn3+ incorporation could prolong the photoluminescent decay time by passivating trap defects and modifying the distortion of the lattice, which underscores the significant potential for application as light emitters.

Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor.

Area-selective atomic layer deposition (AS-ALD) is a bottom-up nanofabrication method delivering single atoms from a molecular precursor. AS-ALD enables self-aligned fabrication and outperforms lithography in terms of cost, resistance, and equipment prerequisites, but it requires pre-patterned substrates and is limited by insufficient selectivity and finite choice of substrates. These challenges are circumvented by direct patterning with atomic-layer additive manufacturing (ALAM) - a transfer of 3D-printing principles to atomic-layer manufacturing where a precursor supply nozzle enables direct patterning instead of blanket coating. The reduced precursor vapor consumption in ALAM as compared with ALD calls for the use of less volatile precursors by replacing diethylzinc used traditionally in ALD with bis(dimethylaminopropyl)zinc, Zn(DMP)2 . The behavior of this novel ZnO ALAM process follows that of the corresponding ALD in terms of deposit quality and growth characteristics. The temperature window for self-limiting growth of stoichiometric, crystalline material is 200-250 °C. The growth rates are 0.9 Å per cycle in ALD (determined by spectroscopic ellipsometry) and 1.1 Å per pass in ALAM (imaging ellipsometry). The preferential crystal orientation increases with temperature, while energy-dispersive X-ray spectroscopic and XPS show that only intermediate temperatures deliver stoichiometric ZnO. A functional thin-film transistor is created from an ALAM-deposited ZnO line and characterized.

Mechanistic Insight into Solution-Based Atomic Layer Deposition of CuSCN Provided by In Situ and Ex Situ Methods.

Solution-based atomic layer deposition (sALD) processes enable the preparation of thin films on nanostructured surfaces while controlling the film thickness down to a monolayer and preserving the homogeneity of the film. In sALD, a similar operation principle as in gas-phase ALD is used, however, with a broader range of accessible materials and without requiring expensive vacuum equipment. In this work, a sALD process was developed to prepare CuSCN on a Si substrate using the precursors CuOAc and LiSCN. The film growth was studied by ex situ atomic force microscopy (AFM), analyzed by a neural network (NN) approach, ellipsometry, and a newly developed in situ infrared (IR) spectroscopy experiment in combination with density functional theory (DFT). In the self-limiting sALD process, CuSCN grows on top of an initially formed two-dimensional (2D) layer as three-dimensional spherical nanoparticles with an average size of ∼25 nm and a narrow particle size distribution. With increasing cycle number, the particle density increases and larger particles form via Ostwald ripening and coalescence. The film grows preferentially in the ß-CuSCN phase. Additionally, a small fraction of the α-CuSCN phase and defect sites form.

Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films.

For the first time, a procedure has been established for the growth of surface-anchored metal-organic framework (SURMOF) copper(II) benzene-1,4-dicarboxylate (Cu-BDC) thin films of thickness control with single molecule accuracy. For this, we exploit the novel method solution atomic layer deposition (sALD). The sALD growth rate has been determined at 4.5 Å per cycle. The compact and dense SURMOF films grown at room temperature by sALD possess a vastly superior film thickness uniformity than those deposited by conventional solution-based techniques, such as dipping and spraying while featuring clear crystallinity from 100 nm thickness. The highly controlled layer-by-layer growth mechanism of sALD proves crucial to prevent unwanted side reactions such as Ostwald ripening or detrimental island growth, ensuring continuous Cu-BDC film coverage. This successful demonstration of sALD-grown compact continuous Cu-BDC SURMOF films is a paradigm change and provides a key advancement enabling a multitude of applications that require continuous and ultrathin coatings while maintaining tight film thickness specifications, which were previously unattainable with conventional solution-based growth methods.

Additive Manufacturing in Atomic Layer Processing Mode.

Additive manufacturing (3D printing) has not been applicable to micro- and nanoscale engineering due to the limited resolution. Atomic layer deposition (ALD) is a technique for coating large areas with atomic thickness resolution based on tailored surface chemical reactions. Thus, combining the principles of additive manufacturing with ALD could open up a completely new field of manufacturing. Indeed, it is shown that a spatially localized delivery of ALD precursors can generate materials patterns. In this "atomic-layer additive manufacturing" (ALAM), the vertical resolution of the solid structure deposited is about 0.1 nm, whereas the lateral resolution is defined by the microfluidic gas delivery. The ALAM principle is demonstrated by generating lines and patterns of pure, crystalline TiO2 and Pt on planar substrates and conformal coatings of 3D nanostructures. The functional quality of ALAM patterns is exemplified with temperature sensors, which achieve a performance similar to the industry standard. This general method of multimaterial direct patterning is much simpler than standard multistep lithographic microfabrication. It offers process flexibility, saves processing time, investment, materials, waste, and energy. It is envisioned that together with etching, doping, and cleaning performed in a similar local manner, ALAM will create the "atomic-layer advanced manufacturing" family of techniques.

Spray-Drying and Atomic Layer Deposition: Complementary Tools toward Fully Orthogonal Control of Bulk Composition and Surface Identity of Multifunctional Supraparticles.

Spray-drying is a scalable process enabling one to assemble freely chosen nanoparticles into supraparticles. Atomic layer deposition (ALD) allows for controlled thin film deposition of a vast variety of materials including exotic ones that can hardly be synthesized by wet chemical methods. The properties of coated supraparticles are defined not only by the nanoparticle material chosen and the nanostructure adjusted during spray-drying but also by surface functionalities modified by ALD, if ALD is capable of modifying not only the outer surfaces but also surfaces buried inside the porous supraparticle. Simultaneously, surface accessibility in the porous supraparticles must be ensured to make use of all functionalized surfaces. In this work, iron oxide supraparticles are utilized as a model substrate as their magnetic properties enable the use of advanced magnetic characterization methods. Detailed information about the structural evolution upon individual ALD cycles of aluminium oxide, zinc oxide and titanium dioxide are thereby revealed and confirmed by gas sorption analyses. This demonstrates a powerful and versatile approach to freely designing the functionality of future materials by combination of spray-drying and ALD.

Stabilizing an ultrathin MoS2 layer during electrocatalytic hydrogen evolution with a crystalline SnO2 underlayer.

Amorphous MoS2 has been investigated abundantly as a catalyst for hydrogen evolution. Not only its performance but also its chemical stability in acidic conditions have been reported widely. However, its adhesion has not been studied systematically in the electrochemical context. The use of MoS2 as a lubricant is not auspicious for this purpose. In this work, we start with a macroporous anodic alumina template as a model support, add an underlayer of SnO2 to provide electrical conduction and adhesion, then provide the catalytically active, amorphous MoS2 material by atomic layer deposition (ALD). The composition, morphology, and crystalline or amorphous character of all layers are confirmed by spectroscopic ellipsometry, X-ray photoelectron spectroscopy, grazing incidence X-ray diffractometry, scanning electron microscopy and energy dispersive X-ray spectroscopy. The electrocatalytic water reduction performance of the macroporous AAO/SnO2/MoS2 electrodes, quantified by voltammetry, steady-state chronoamperometry and electrochemical impedance spectroscopy, is improved by annealing the SnO2 layer prior to MoS2 deposition. Varying the geometric parameters of the electrode composite yields an optimized performance of 10 mA cm-2 at 0.22 V overpotential, with a catalyst loading of 0.16 mg cm-2. The electrode's stability is contingent on SnO2 crystallinity. Amorphous SnO2 allows for a gradual dewetting of the originally continuous MoS2 layer over wide areas. In stark contrast to this, crystalline SnO2 maintains the continuity of MoS2 until at least 0.3 V overpotential.

Ordered SnO2 nanotube arrays of tuneable geometry as a lithium ion battery material with high longevity.

Ordered arrays of straight, parallel SnO2 nanotubes are prepared by atomic layer deposition (ALD) on inert 'anodic' aluminum oxide porous membranes serving as templates. Various thicknesses of the SnO2 tube walls and various tube lengths are characterized in terms of morphology by scanning electron microscopy (SEM), chemical identity by X-ray photoelectron spectroscopy (XPS) and phase composition by X-ray diffraction (XRD). Their performance as negative electrode ('anode') materials for lithium-ion batteries (LIBs) is quantified at different charge and discharge rates in the absence of additives. We find distinct trends and optima for the dependence of initial capacity and long-term stability on the geometric parameters of the nanotube materials. A sample featuring SnO2 tubes of 30 µm length and 10 nm wall thickness achieves after 780 cycles a coulombic efficiency of >99% and a specific capacity of 671 mA h g-1. This value represents 92% of the first-cycle capacity and 86% of the theoretical value.

Nanoporous water oxidation electrodes with a low loading of laser-deposited Ru/C exhibit enhanced corrosion stability.

For the oxidation of water to dioxygen, oxide-covered ruthenium metal is known as the most efficient catalyst, however, with limited stability. Herein, we present a strategy for incorporating a Ru/C composite onto a novel nanoporous electrode surface with low noble metal loading and improved stability. The Ru/C is coated on the pore walls of anodic alumina templates in a one-step laser-induced deposition method from Ru3(CO)12 solutions. Scanning electron microscopy proves the presence of a continuous Ru/C layer along the inner pore walls. The amorphous material consists of metallic Ru incorporated in a carbonaceous C matrix as shown by X-ray diffraction combined with Raman and X-ray photoelectron spectroscopies. These porous electrodes reveal enhanced stability during water oxidation as compared to planar samples at pH 4. Finally, their electrocatalytic performance depends on the geometric parameters and is optimized with 13 µm pore length, which yields 2.6 mA cm-2, or 49 A g-1, at η = 0.20 V.

Adjusting Interfacial Chemistry and Electronic Properties of Photovoltaics Based on a Highly Pure Sb2S3 Absorber by Atomic Layer Deposition.

The combination of oxide and heavier chalcogenide layers in thin film photovoltaics suffers limitations associated with oxygen incorporation and sulfur deficiency in the chalcogenide layer or with a chemical incompatibility which results in dewetting issues and defect states at the interface. Here, we establish atomic layer deposition (ALD) as a tool to overcome these limitations. ALD allows one to obtain highly pure Sb2S3 light absorber layers, and we exploit this technique to generate an additional interfacial layer consisting of 1.5 nm ZnS. This ultrathin layer simultaneously resolves dewetting and passivates defect states at the interface. We demonstrate via transient absorption spectroscopy that interfacial electron recombination is one order of magnitude slower at the ZnS-engineered interface than hole recombination at the Sb2S3/P3HT interface. The comparison of solar cells with and without oxide incorporation in Sb2S3, with and without the ultrathin ZnS interlayer, and with systematically varied Sb2S3 thickness provides a complete picture of the physical processes at work in the devices.

Time-Resolved Analysis of Dielectric Mirrors for Vapor Sensing.

Dielectric mirrors based on bilayers of polystyrene- block-poly(ethylene- ran-butylene)- block-polystyrene (SEBS) and poly(vinyl alcohol) (PVA)-zirconium dioxide (ZrO2) nanocomposites are fabricated for vapor sensing. When exposed to specific solvent vapor, the layers of dielectric mirrors can gradually swell and cause a red-shift of the reflection band. Because PVA solely responds to water and SEBS is sensitive to several different types of organic solvents, the mirrors can respond to a large variety of solvents. The dual-functional hydrophilic ZrO2 nanoparticles are introduced to not only enlarge the refractive index contrast but also increase the permeability. Time-resolved measurements show that mirrors with nanoparticles have a significantly faster response than those without nanoparticles. Moreover, the dependence on relative humidity is studied for representative solvents, and several types of solvents are selected to show the dependence on the solvent-polymer interaction parameters at typical relative humidity, which allows one to predict the responsivity and selectivity of the sensors.

The transformation behaviour of "alucones", deposited by molecular layer deposition, in nanoporous Al2O3 layers.

Nanoporous alumina films can be synthesized from hybrid organic-inorganic "alucone" films deposited by molecular layer deposition (MLD) by wet etching in deionized water or calcination in air at 500 °C. This transformation process was systematically investigated for two alucone chemistries based on ethylene glycol (EG) and glycerol (GL). Ellipsometric porosimetry (EP) was used for the characterization of the porous alumina structures that are formed as a result of the treatments. Etching in deionized water transforms both EG- and GL-alucones into porous alumina with a porosity of about 40%, albeit with a different pore structure: cylindrical pores for EG-alucones and ink-bottle structures for GL-alucones. Calcination in air up to 500 °C only successfully transformed EG-alucones into porous alumina if the chosen heating and cooling rate was lower than 200 °C h-1. Below this ramp rate, a relationship between the resulting porosity and the ramp rate was found. At the lowest investigated ramp rate of 20 °C h-1, the highest porosity of 36% was achieved. For this treatment type, the pore shape was of the ink-bottle type for all investigated ramp rates with narrow 1 nm-sized pores. Infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy revealed that the final chemistry of the porous structures was slightly different for both treatments due to trace amounts of carbon left behind by water etching. This suggests that the internal surface of the porous structure has a different termination depending on the chosen treatment. The precise thickness control and conformal nature inherent to MLD combined with the wet and heat treatments enables the coating of complex 3D structures with a porous alumina film with a well-defined thickness and pore structure.

Minimization of Catalyst Loading on Regenerative Fuel Cell Positive Electrodes Based on Titanium Felts using Atomic Layer Deposition.

We present the preparation and electrochemical analysis of a novel type of positive regenerative fuel cell electrode based on commercially available Ti felts with a Pt/Ir catalyst. Anodic oxidation of the Ti felts leads to the formation of a TiO2 nanotube layer. The high specific surface area allows for a particularly efficient utilization of the noble metal catalyst. Its loading in the nanoporous system is controlled accurately and minimized systematically by atomic layer deposition. The electrochemical activity towards water splitting of both metals is investigated in acidic media by cyclic voltammetry and steady-state electrolysis for various catalyst loadings. An optimal oxygen evolution reaction is found for a catalyst loading of 76 µg cm-2 resulting in a mass activity of 345 A g-1 at η=0.47 V, whereas the simultaneous presence of Pt at the surface is demonstrated by X-ray photoelectron spectroscopy and by the high activity observed for the hydrogen evolution reaction.

Protected Light-Trapping Silicon by a Simple Structuring Process for Sunlight-Assisted Water Splitting.

Macroporous layers are grown onto n-type silicon by successive photoelectrochemical etching in HF-containing solution and chemical etching in KOH. This specific latter treatment gives highly antireflective properties of the Si surface. The duration of the chemical etching is optimized to render the surface as absorbent as possible, and the morphology of the as-grown layer is characterized by scanning electron microscopy. Further functionalization of such structured Si surface is carried out by atomic layer deposition of a thin conformal and homogeneous TiO2 layer that is crystallized by an annealing at 450 °C. This process allows using such surfaces as photoanodes for water oxidation. The 40 nm thick TiO2 film acts indeed as an efficient protective layer against the photocorrosion of the porous Si in KOH, enhances its wettability, and improves the light absorption of the photoelectrode. The macroporous dual-absorber TiO2/Si has a beneficial effect on water oxidation in 1 M KOH and leads to a considerable negative shift of the onset potential of ∼400 mV as well as a 50% increase in photocurrent at 1 V vs SCE.

Atomic Layer Deposition of Pd Nanoparticles on TiO2 Nanotubes for Ethanol Electrooxidation: Synthesis and Electrochemical Properties.

Palladium nanoparticles are grown on TiO2 nanotubes by atomic layer deposition (ALD), and the resulting three-dimensional nanostructured catalysts are studied for ethanol electrooxidation in alkaline media. The morphology, the crystal structure, and the chemical composition of the Pd particles are fully characterized using scanning and transmission electron microscopies, X-ray diffraction, and X-ray photoelectron spectroscopy. The characterization revealed that the deposition proceeds onto the entire surface of the TiO2 nanotubes leading to the formation of well-defined and highly dispersed Pd nanoparticles. The electrooxidation of ethanol on Pd clusters deposited on TiO2 nanotubes shows not only a direct correlation between the catalytic activity and the particle size but also a steep increase of the response due to the enhancement of the metal-support interaction when the crystal structure of the TiO2 nanotubes is modified by annealing at 450 °C in air.

Atomic Layer Deposition from Dissolved Precursors.

We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. "Solution ALD" (sALD) can coat deep pores in a conformal manner. sALD offers novel opportunities by overcoming the need for volatile and thermally robust precursors. We establish a MgO sALD procedure based on the hydrolysis of a Grignard reagent.