RESUMO
OBJECTIVE: Failure of dental implants treatment is frequently the result of bacterial colonization of implants followed by diseases like peri-implantitis. Recent studies have been made regarding the surface treatment of implants components, namely abutments that are in the interface of the living tissue with the implant. This work aimed at evaluating the antimicrobial profile of a silane-based coating with TiO2 adapted to an abutment screw, that was also developed as an anti-loosening agent, to prevent adhesion and migration of Gram + and Gram-bacteria, Staphylococcus aureus, and Escherichia coli, respectively. METHODS: Direct contact antimicrobial studies were conducted on coated and uncoated samples by resazurin fluorescent assay and cytotoxicity assessment was done via MTT indirect method on days 1 and 4. Sterilizations studies by FTIR analysis were also performed to understand the ideal balance between sterilization efficacy and coating functionality subjecting the samples to ethylene oxide, gamma irradiation, and autoclave sterilization, before antimicrobial testing. The implant system as a whole was also studied for its ability to block bacterial migration and preventing microleakage as well as an assessment of initial bacterial adhesion evaluated by scanning electron microscopy. RESULTS: Direct contact studies performed on coated samples showed a very high antimicrobial activity, while cytotoxicity assays revealed the coating to be safe and non-leachable. Sterilizations studies showed that the antimicrobial features of the coating were preserved and interchangeable regardless of the sterilization method. The implant system migration studies demonstrated that the implant system works as an efficient barrier for the studied bacteria. SIGNIFICANCE: The acquired results clearly show that it is possible to obtain a highly functional coating with obvious and marked antimicrobial features that together with an abutment that prevents bacterial migration and versatility in sterilization methodology has a very high potential in the dental implant field.
