Spatially varying aberration calibration using a pair of matched periodic pinhole array masks.

For advanced imaging systems, e.g., projection systems for optical lithography, spatially varying aberration calibration is of utmost importance to achieve uniform imaging performance over the entire field-of-view (FOV). Here we present an efficient, accurate, and robust spatially varying aberration calibration method using a pair of 2-dimensional periodic pinhole array masks: the first mask in the object plane and the second mask in the image plane. Our method divides the entire FOV of the imaging system into partially overlapping subregions by using a measurement system consisting of an additional imaging system and a camera sensor. Each subregion, which covers several mask periods, is imaged onto a distinct camera pixel by the measurement system. Our method measures "Airy disc"-like patterns simultaneously in all subregions by scanning the second mask relative to the first mask over one mask period. The number of subregions is equal to the number of camera pixels, and the sampling number of the measured patterns is equal to the scanning step number. The aberrations can be retrieved from the patterns measured in through-focus planes using an iterative optimization algorithm. In this paper, we performed experimental validation on a realistic lithography machine and demonstrate that our method is capable of retrieving the coefficients of 37 aberration terms, expressed as Zernike polynomials, with a sensitivity at nanometer scale.

Ray-based method for simulating cascaded diffraction in high-numerical-aperture systems.

The electric field at the output of an optical system is in general affected by both aberrations and diffraction. Many simulation techniques treat the two phenomena separately, using a geometrical propagator to calculate the effects of aberrations and a wave-optical propagator to simulate the effects of diffraction. We present a ray-based simulation method that accounts for the effects of both aberrations and diffraction within a single framework. The method is based on the Huygens-Fresnel principle, is entirely performed using Monte Carlo ray tracing, and, in contrast to our previously published work, is able to calculate the full electromagnetic field. The method can simulate the effects of multiple diffraction in systems with a high numerical aperture.

SMS2D designs as starting points for lens optimization.

Traditional imaging design methods can often be ineffective when designing aspheric systems because of the large number of optimization parameters and lack of a good starting point. They are often trapped in a poor local minimum and it can be highly time-consuming to find a good solution in a bumpy design landscape. The simultaneous multiple surface (SMS) method can significantly shorten the time and effort needed to find a desired solution by providing a starting point to optimize close to a good local minimum. We investigate here two design examples and compare them with similar designs obtained via traditional design approaches, as well as global optimization. In the examples considered here, the SMS method combined with a shorter optimization leads to an optimal design.

Simulating multiple diffraction in imaging systems using a path integration method.

We present a method for simulating multiple diffraction in imaging systems based on the Huygens-Fresnel principle. The method accounts for the effects of both aberrations and diffraction and is entirely performed using Monte Carlo ray tracing. We compare the results of this method to those of reference simulations for field propagation through optical systems and for the calculation of point spread functions. The method can accurately model a wide variety of optical systems beyond the exit pupil approximation.

One-dimensional searches for finding new lens design solutions efficiently.

A special structure is present in the lens design landscape that makes it different from a general global optimization problem: many local minimums are closely related to minimums of simpler problems and can therefore be found by decomposing the search for them in simple steps. We show here that in the design landscape of a wide-angle pinhole lens and in closely related optimization landscapes, all good local minimums found by other methods can be obtained easily with a succession of one-dimensional searches starting from simpler systems. By replacing high-dimensional searches with a succession of one-dimensional searches, the design efficiency can be increased significantly. By combining this method with conventional design methods, the wide-angle pinhole lens can be designed starting from a single lens.

Obtaining new local minima in lens design by constructing saddle points.

We show that in the lens design landscape saddle points exist that are closely related to local minima of simpler problems. On the basis of this new theoretical insight we develop a systematic and efficient saddle-point method that uses a-priori knowledge for obtaining new local minima. In contrast with earlier saddle-point methods, the present method can create both positive and negative lenses. As an example, by successively using the method a good-quality local minimum is obtained from a poor-quality one. The method could also be applicable in other global optimization problems that satisfy the requirements discussed in this paper.

Chaotic behavior in an algorithm to escape from poor local minima in lens design.

In lens design, damped least-squares methods are typically used to find the nearest local minimum to a starting configuration in the merit function landscape. In this paper, we explore the use of such a method for a purpose that goes beyond local optimization. The merit function barrier, which separates an unsatisfactory solution from a neighboring one that is better, can be overcome by using low damping and by allowing the merit function to temporarily increase. However, such an algorithm displays chaos, chaotic transients and other types of complex behavior. A successful escape of the iteration trajectory from a poor local minimum to a better one is associated with a crisis phenomenon that transforms a chaotic attractor into a chaotic saddle. The present analysis also enables a better understanding of peculiarities encountered with damped least-squares algorithms in conventional local optimization tasks.

High-order optical aberration coefficients: extension to finite objects and to telecentricity in object space.

We extend the method for the automatic computation of high-order optical aberration coefficients to include (1) a finite object distance and (2) an infinite entrance pupil position (telecentricity in object space). We present coefficients of the power series expansion of the transverse aberration vector with respect to the normalized aperture and field coordinates. Aberration coefficients of very high order (e.g., 21) can be computed easily and--as shown by comparisons with trigonometric ray tracing--reliably.

Network search method in the design of extreme ultraviolet lithographic objectives.

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when control parameters, such as aperture and field, are varied, and constraints are used to limit the variation domain of the variables. A good solution in a network, obtained with a limited number of variables, has been locally optimized with all variables to meet practical requirements.

Networks of local minima in optical system optimization.

We discuss a surprising new feature of the merit function landscape in optical system design. When certain conditions are satisfied, the local minima form a network in which all nodes are connected. Each link between two neighboring minima contains a saddle point with a Morse index of 1. For a simple global optimization search (the symmetric Cooke triplet), the network of the corresponding set of local minima is presented.

Analysis, search, and classification for reflective ring-field projection systems.

Extreme ultraviolet (EUV) lithography uses reflective ring-field projection systems. Geometrical obstruction limits the possible system configurations to small domains of the parameter space. We present an analysis, a search method, and a classification of these unobstructed domains. The exhaustive search method based on paraxial analysis provides an effective means for determining all possible design forms and for finding useful starting configurations for optimization. The approach is validated through comparison with finite ray tracing.