An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine.

Tris(dimethylsilyl)amine (TDMSA) is used in the presence of O2 and NH3 for the atmospheric pressure chemical vapor deposition (CVD) of conformal, corrosion barrier silicon oxynitride (SiOxNy) films at moderate temperature. Plausible decomposition pathways taking place during the process, as well as resulting gas-phase by-products, are investigated by an innovative methodology, coupling solid-state films characteristics with gas phase analysis. Liquid NMR, gas chromatography coupled with mass spectrometry (GC-MS) and electron spin resonance (ESR) allow probing stable compounds and radical intermediate species in the gas phase. At least fifteen by-products are identified, including silanols, siloxanes, disilazanes, silanamines, and mixed siloxane-silanamine molecules, in addition to more usual compounds such as water. The radical dimethylsilane, Me2HSi˙, is noted across all experiments, hinting at the decomposition of the TDMSA precursor. Deposition of SiOxNy films occurs even in the absence of NH3, demonstrating the judicious choice of the silanamine TDMSA as a dual source of nitrogen and silicon. Additionally, the presence of Si-H bonds in the precursor structure allows formation of SiOxNy films at temperatures lower than those required by other conventional silazane/silanamine precursors. Addition of NH3 in the inlet gas supply results in lower carbon impurities in the films. The identified by-products and formulated decomposition and gas-phase reactions provide stimulating insight and understanding of the deposition mechanism of SiOxNy films by CVD, offering possibilities for the investigation of representative chemical models and process simulation.

Alumina coating on dense tungsten powder by fluidized bed metal organic chemical vapour deposition.

In order to study the feasibility of coating very dense powders by alumina using Fluidized Bed Metal Organic Chemical Vapour Deposition (FB-MOCVD), experiments were performed on a commercial tungsten powder, 75 microm in median volume diameter and 19,300 kg/m3 in grain density. The first part of the work was dedicated to the experimental study of the tungsten powder fluidization using argon as carrier gas at room temperature and at 400 degrees C. Due to the very high density of the tungsten powder, leading to low initial fixed bed heights and low bed expansions, different weights of powder were tested in order to reach satisfactory temperature profiles along the fluidized bed. Then, using argon as a fluidized bed former and aluminium acetylacetonate Al(C5O2H7)3 as a single source precursor, alumina thin films were deposited on tungsten particles at a low temperature range (e.g., 370-420 degrees C) by FB-MOCVD. The influence of the weight of powder, bed temperature and run duration was studied. Characterizations of the obtained samples were performed by various techniques including scanning electron microscopy (SEM) coupled with Energy Dispersive X-ray Spectroscopy (EDS) analyses, Field Emission Gun SEM (FEG-SEM) and Fourier Transform InfraRed (FT-IR) spectroscopy. The different analyses indicated that tungsten particles were uniformly coated by a continuous alumina thin film. The thickness of the film ranged between 25 and 80 nm, depending on the coating conditions. The alumina thin films were amorphous and contained carbon contamination. This latter may correspond to the adsorption of species resulting from incomplete decomposition of the precursor at so low deposition temperature.

SUBLIBOX: a proprietary solvent free method for intense vaporization of solid compounds.

Chemical vapour deposition and atomic layer deposition using precursors that are solids at ambient temperature and pressure present challenges due to the often low saturating vapour pressure of these compounds. Additional concerns arise from the difficulty to maintain a reproducible and stable precursor flow rate to the deposition chamber and from the possible particle contamination if suitable safeguards are not built into the precursor delivery line. In the present contribution, SUBLIBOX, a pilot industrial scale sublimator is presented. SUBLIBOX is based on a new sublimation process involving gas-solid fluidization technology. Aluminum acetyl-acetonate [Al(acac)3], a promising precursor for the processing of alumina films despite its low saturated vapour pressure, is used as a model, though technologically interesting system. Mass balance measurements, involving trapping of the sublimed precursor at the exit of the sublimation chamber, reveal that SUBLIBOX ensures (a) stable, (b) efficient, (c) reproducible and (d) long term precursor vapour flow rates. The process is particularly well adapted for delivering vapours to CVD reactors for coatings on glass and stainless steel or for producing optical fibbers preforms by various techniques.

Amorphous alumina coatings: processing, structure and remarkable barrier properties.

Amorphous aluminium oxide coatings were processed by metalorganic chemical vapour deposition (MOCVD); their structural characteristics were determined as a function of the processing conditions, the process was modelled considering appropriate chemical kinetic schemes, and the properties of the obtained material were investigated and were correlated with the nanostructure of the coatings. With increasing processing temperature in the range 350 degrees C-700 degrees C, subatmospheric MOCVD of alumina from aluminium tri-isopropoxide (ATI) sequentially yields partially hydroxylated amorphous aluminium oxides, amorphous Al2O3 (415 degrees C-650 degrees C) and nanostructured gamma-Al2O3 films. A numerical model for the process allowed reproducing the non uniformity of deposition rate along the substrate zone due to the depletion of ATI. The hardness of the coatings prepared at 350 degrees C, 480 degrees C and 700 degrees C is 6 GPa, 11 GPa and 1 GPa, respectively. Scratch tests on films grown on TA6V titanium alloy reveal adhesive and cohesive failures for the amorphous and nanocrystalline ones, respectively. Alumina coating processed at 480 degrees C on TA6V yielded zero weight gain after oxidation at 600 degrees C in lab air. The surface of such low temperature processed amorphous films is hydrophobic (water contact angle 106 degrees), while the high temperature processed nanocrystalline films are hydrophilic (48 degrees at a deposition temperature of 700 degrees C). It is concluded that amorphous Al2O3 coatings can be used as oxidation and corrosion barriers at ambient or moderate temperature. Nanostructured with Pt or Ag nanoparticles, they can also provide anti-fouling or catalytic surfaces.

Fluidized bed chemical vapor deposition of silicon on carbon nanotubes for Li-ion batteries.

Silicon was deposited on balls of entangled multi-walled carbon nanotubes (CNT) with a mean diameter of several hundreds of microns, by Fluidized Bed Chemical Vapor Deposition from silane (SiH4). The weight total percentage of deposited silicon was between 30 and 70%, to test their efficacy in Li-ion battery anodes. TEM and SEM imaging revealed that silicon deposits were of the form of nanoparticles uniformly dispersed on the whole CNT surface. The diameter of these nanoparticles increases with the deposited silicon percentage from 18 to 36 nm whereas their density remains constant at 5 10(22) nanoparticles/g of CNT. This indicates a low affinity of chemical species born from silane pyrolysis with the CNT surface for nucleation. The increase of the silicon nanoparticles diameter leads to the decrease of the specific surface area and the porous volume of the balls, probably due to the filling of the pores of the CNT network by silicon. A slight increase of the mean diameter of the balls was observed for the two highest silicon percentages, certainly due to the ability of the CNT network to be deformed under the mechanical stress induced by the silicon nanoparticles growth.