RESUMO
Supercapacitors have been extensively studied due to their advantages of fast-charging and discharging, high-power density, long-cycling life, low cost, etc. Exploring novel nanomaterial schemes for high-performance electrode materials is of great significance. Herein, a strategy to combine vertical graphene (VG) with MoO3 nanosheets to form a composite VG/MoO3 nanostructure is proposed. VGs as transition layers supply rich active sites for the growth of MoO3 nanosheets with increasing specific surface areas. The VG transition layer further improves the electric contact and adhesion of the MoO3 electrode, simultaneously stabilizing its volume and crystal structure during repeated redox reactions. Thus, the prepared VG/MoO3 nanosheets have been demonstrated to exhibit excellent electrochemical properties, such as high reversible capacitance, better cycling performance, and high-rate capability.
RESUMO
Janus transition-metal dichalcogenides (TMDCs) are emerging as special 2D materials with different chalcogen atoms covalently bonded on each side of the unit cell, resulting in interesting properties. To date, several synthetic strategies have been developed to realize Janus TMDCs, which first involves stripping the top-layer S of MoS2 with H atoms. However, there has been little discussion on the intermediate Janus MoSH. It is critical to find the appropriate plasma treatment time to avoid sample damage. A thorough understanding of the formation and properties of MoSH is highly desirable. In this work, a controlled H2-plasma treatment has been developed to gradually synthesize a Janus MoSH monolayer, which was confirmed by the TOF-SIMS analysis as well as the subsequent fabrication of MoSSe. The electronic properties of MoSH, including the high intrinsic carrier concentration (â¼2 × 1013 cm-2) and the Fermi level (â¼ - 4.11 eV), have been systematically investigated by the combination of FET device study, KPFM, and DFT calculations. The results demonstrate a method for the creation of Janus MoSH and present the essential electronic parameters which have great significance for device applications. Furthermore, owing to the metallicity, 2D Janus MoSH might be a potential platform to observe the SPR behavior in the mid-infrared region.
RESUMO
Chemical vapor deposition (CVD) is a promising method to obtain monolayer transition metal dichalcogenides (TMDCs) with high quality and enough size to meet the requirements of practical photoelectric devices. However, the as-grown monolayers often exhibit a lower PL performance due to the stress between the as-grown TMDCs flakes and the substrate. Therefore, finding a facile method to effectively promote the photoluminescence quantum yield (PL QY) of CVD monolayer TMDCs with a clean surface is highly desirable for practical applications. In this work, based on the CVD monolayers MoS2 and MoSe2, the effect of various stress relaxation methods on the TMDCs PL enhancement is systemically studied. By comparing the different kinds of volatile solution treatment processes, as well as the traditional transfer process, it can be found that the volatile solution with a moderate volatilization rate such as ethanol or IPA is a preferred option to improve the PL performance of the CVD monolayer TMDCs, which also surpasses the traditional transfer method by avoiding wrinkles, defects, and contamination to the samples. PL QY of ethanol-treated CVD samples could increase by 6 times on average. Significantly, PL QY of CVD MoSe2 treated by ethanol can reach â¼16%, which is at the forefront of the previous reports of 2D MoSe2. Our study demonstrated an optimized method to enhance the PL QY of CVD monolayer TMDCs, which would facilitate TMDCs optoelectronics.