Investigation of the distribution of laser damage precursors at 1064 nm, 12 ns on niobia-silica and zirconia-silica mixtures.

Simple Nb(2)O(5), ZrO(2), SiO(2) oxide coatings and their mixtures with SiO(2) have been prepared by the Ion Beam Sputtering (IBS) technique. The Laser-Induced Damage of these samples has been studied at 1064 nm, 12 ns. The laser induced damage threshold (LIDT) decreases in both sets of the mixtures with the volumetric fraction of high index material. We find that the nanosecond LIDT of the mixtures is related to the band gap of the material as it has been widely observed in the subpicosecond regime. The laser damage probability curves have been fitted firstly by a statistical approach, i.e. direct calculation of damage precursor density from damage probability and secondly by a thermal model based on absorption of initiator. The distributions of damage precursors versus fluence extracted from these fittings show a good agreement. The thermal model makes it possible to connect damage probability to precursor physical properties. A metallic defect with a maximum radius of 18 nm was proposed to the interpretation. The critical temperature in the laser damage process exhibited a dependence on the band-gap of the material.

Bulk laser-induced damage threshold of titanium-doped sapphire crystals.

The bulk laser-induced damage threshold (LIDT) fluence of Ti:sapphire is determined under single-pulse irradiation from the femtosecond to nanosecond temporal regimes in the visible and near-infrared spectral domains. In the range of explored laser conditions, the LIDT fluence increases with both pulse duration and wavelength. The results are also compared to laser interaction with sapphire samples and show an increased resistance to laser damage when the material is doped with Ti(3+) ions. These conclusions are of interest for robust operation of high-peak-power femtosecond Ti:sapphire laser chains.

A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films.

A laser damage test facility delivering pulses from 100 fs to 3 ps and designed to operate at 1030 nm is presented. The different details of its implementation and performances are given. The originality of this system relies the online damage detection system based on Nomarski microscopy and the use of a non-conventional energy detection method based on the utilization of a cooled CCD that offers the possibility to obtain the laser induced damage threshold (LIDT) with high accuracy. Applications of this instrument to study thin films under laser irradiation are presented. Particularly the deterministic behavior of the sub-picosecond damage is investigated in the case of fused silica and oxide films. It is demonstrated that the transition of 0-1 damage probability is very sharp and the LIDT is perfectly deterministic at few hundreds of femtoseconds. The damage process in dielectric materials being the results of electronic processes, specific information such as the material bandgap is needed for the interpretation of results and applications of scaling laws. A review of the different approaches for the estimation of the absorption gap of optical dielectric coatings is conducted and the results given by the different methods are compared and discussed. The LIDT and gap of several oxide materials are then measured with the presented instrument: Al(2)O(3), Nb(2)O(5), HfO(2), SiO(2), Ta(2)O(5), and ZrO(2). The obtained relation between the LIDT and gap at 1030 nm confirms the linear evolution of the threshold with the bandgap that exists at 800 nm, and our work expands the number of tested materials.

Laser-induced damage investigation at 1064 nm in KTiOPO4 crystals and its analogy with RbTiOPO4.

Bulk laser-induced damage at 1064 nm has been investigated in KTiOPO4 (KTP) and RbTiOPO4 (RTP) crystals with a nanosecond pulsed Nd:YAG laser. Both crystals belong to the same family. Throughout this study, their comparison shows a very similar laser-damage behavior. The evolution of the damage resistance under a high number of shots per site (10,000 shots) reveals a fatigue effect of KTP and RTP crystals. In addition, S-on-1 damage probability curves have been measured in both crystals for all combinations of polarization and propagation direction aligned with the principal axes of the crystals. The results show an influence of the polarization on the laser-induced damage threshold (LIDT), with a significantly higher threshold along the z axis, whereas no effect of the propagation direction has been observed. This LIDT anisotropy is discussed with regard to the crystallographic structure.

Laser damage resistance of RbTiOPO(4): evidence of polarization dependent anisotropy.

Nanosecond-laser induced damage of RbTiOPO(4) crystals (RTP) has been studied at 1064 nm as a function of propagation direction and polarization orientation. A significant difference in the Laser Induced Damage Threshold (LIDT) was observed for x-cut and y-cut crystals in Pockels cell configuration, where the light propagation direction is along the x and y axes of the crystal respectively. In Pockels cell configuration the polarization is oriented at 45? with respect to the z-axis of the crystal. Experiments with the polarization oriented parallel to the principal axes of the crystal pointed out the importance of the polarization direction for the LIDT whereas the propagation direction did not significantly influence the LIDT. Comparison of the experimental data with a simple model reveals the influence of frequency doubling on the LIDT in Pockels cell configuration. In the case of the y-cut Pockels cell, the generation of frequency doubled light causes an LIDT below the LIDT of x and z-polarized light at the fundamental wavelength.

Effect of multiple laser irradiations on silica at 1064 and 355 nm.

We analyze laser damage precursor evolution under multiple irradiations by changing test parameters such as shot number, wavelength, shot frequency, and test location (bulk or surface). The experimental data exhibit different behaviors under repetitive shots regarding the damage precursor densities and thresholds. The results provide new information for understanding the laser damage initiation process in silica. Furthermore, the data permit us to predict the lifetime of optical components under multiple irradiations.

Solarization of glass substrates during thin-film deposition.

We demonstrate that solarization occurs in glass substrates during thin-film deposition and that it induces high absorption near the surface of the substrate. Solarization has been observed especially in ion-plating deposition. We show that the solarization of the substrate is caused by electromagnetic radiation emitted from the material to be evaporated. The radiation is due to the energy losses of the heating beam of electrons (bremsstrahlung radiation). Multicomponent glasses such as BK7 are much more sensitive to solarization than fused-silica substrates. The photoinduced high absorption can be partially reversed by thermal annealing.

Characterization of optical coatings by photothermal deflection.

An overview of photothermal deflection principles and applications is given. The modeling of temperature distribution and the calculation of deflection that is due to both the refractive-index gradient and the thermal deformation of the sample are presented. Three configurations usually employed are compared, and their respective advantages are discussed in relation to their application. The calibration for absolute measurement of absorption is detailed, showing that calibration limits the accuracy of measurement. Some examples of specific information obtained by photothermal mapping of absorption are given.

Substrate effects on absorption of coated surfaces.

Photothermal deflection is used for mapping the absorption of bare and coated surfaces. The same area is mapped before and after coating and also after annealing. The great importance of the substrate with respect to the total losses of the coated component is emphasized. First the influence of surface contamination of the bare substrate on the total absorption of the coated substrate is studied for BK7 and fused-silica substrates. Then the mean value of the coated-substrate absorptance is shown to be strongly dependenton the type of substrate. Experimental results show that this effect is associated with a localization of the absorption at the near surface of the substrate and at the interfaces of the film.

Absorption mapping for characterization of glass surfaces.

The surface quality of bare substrates and preparation procedures take on an important role in optical coating performances. The most commonly used techniques of characterization generally give information about roughness and local defects. A photothermal deflection technique is used for mapping surface absorption of fused-silica and glass substrates. We show that absorption mapping gives specific information on surface contamination of bare substrates. We present experimental results concerning substrates prepared by different cleaning and polishing techniques. We show that highly polished surfaces lead to the lowest values of residual surface absorption. Moreover the cleaning behavior of surfaces of multicomponent glasses and their optical performance in terms of absorption are proved to be different from those of fused silica.

Measurements of absorption losses in TiO(2) films by a collinear photothermal deflection technique.

We review the principle of photothermal deflection for measuring absorption losses in TiO(2)films. A collinear arrangement gives the best sensitivity for the detection of losses in a low absorbing film deposited on a transparent substrate. The nineteen TiO(2) films produced by six different processes (electron beam evaporation, ion assisted deposition, ion beam sputtering, ion plating, ...), discussed at the 1986 Optical Society of America annual meeting, are measured by this technique. The extinction coefficients of the different films do not show obvious correlation with the deposition method. An important fact is that we have detected a variation in absorption as a function of time on some layers. This absorption shift is connected with the illumination conditions of the sample under study (wavelength: 600 nm; incident power: 400 W/cm(2)). Experimental results over time are given. The evolution of the photothermal signal is different from one sample to another. This phenomenon is partially reversible and depends on moisture degree of atmosphere.