Strain-Controlled Superconductivity in Few-Layer NbSe2.

The controlled tunability of superconductivity in low-dimensional materials may enable new quantum devices. Particularly in triplet or topological superconductors, tunneling devices such as Josephson junctions, etc., can demonstrate exotic functionalities. The tunnel barrier, an insulating or normal material layer separating two superconductors, is a key component for the junctions. Thin layers of NbSe2 have been shown as a superconductor with strong spin orbit coupling, which can give rise to topological superconductivity if driven by a large magnetic exchange field. Here we demonstrate the superconductor-insulator transitions in epitaxially grown few-layer NbSe2 with wafer-scale uniformity on insulating substrates. We provide the electrical transport, Raman spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction characterizations of the insulating phase. We show that the superconductor-insulator transition is driven by strain, which also causes characteristic energy shifts of the Raman modes. Our observation paves the way for high-quality heterojunction tunnel barriers to be seamlessly built into epitaxial NbSe2 itself, thereby enabling highly scalable tunneling devices for superconductor-based quantum electronics.

Growth of High-Quality Hexagonal Boron Nitride Single-Layer Films on Carburized Ni Substrates for Metal-Insulator-Metal Tunneling Devices.

Two-dimensional (2D) hexagonal boron nitride (h-BN) plays a significant role in nanoscale electrical and optical devices because of its superior properties. However, the difficulties in the controllable growth of high-quality films hinder its applications. One of the crucial factors that influence the quality of the films obtained via epitaxy is the substrate property. Here, we report a study of 2D h-BN growth on carburized Ni substrates using molecular beam epitaxy. It was found that the carburization of Ni substrates with different surface orientations leads to different kinetics of h-BN growth. While the carburization of Ni(100) enhances the h-BN growth, the speed of the h-BN growth on carburized Ni(111) reduces. As-grown continuous single-layer h-BN films are used to fabricate Ni/h-BN/Ni metal-insulator-metal (MIM) devices, which demonstrate a high breakdown electric field of 12.9 MV/cm.

Role of Carbon Interstitials in Transition Metal Substrates on Controllable Synthesis of High-Quality Large-Area Two-Dimensional Hexagonal Boron Nitride Layers.

Reliable and controllable synthesis of two-dimensional (2D) hexagonal boron nitride (h-BN) layers is highly desirable for their applications as 2D dielectric and wide bandgap semiconductors. In this work, we demonstrate that the dissolution of carbon into cobalt (Co) and nickel (Ni) substrates can facilitate the growth of h-BN and attain large-area 2D homogeneity. The morphology of the h-BN film can be controlled from 2D layer-plus-3D islands to homogeneous 2D few-layers by tuning the carbon interstitial concentration in the Co substrate through a carburization process prior to the h-BN growth step. Comprehensive characterizations were performed to evaluate structural, electrical, optical, and dielectric properties of these samples. Single-crystal h-BN flakes with an edge length of ∼600 µm were demonstrated on carburized Ni. An average breakdown electric field of 9 MV/cm was achieved for an as-grown continuous 3-layer h-BN on carburized Co. Density functional theory calculations reveal that the interstitial carbon atoms can increase the adsorption energy of B and N atoms on the Co(111) surface and decrease the diffusion activation energy and, in turn, promote the nucleation and growth of 2D h-BN.

Graphene contacts to a HfSe2/SnS2 heterostructure.

Two-dimensional (2D) heterostructures and all-2D contacts are of high interest for electronic device applications, and the SnS2/HfSe2 bilayer heterostructure with graphene contacts has some unique, advantageous properties. The SnS2/HfSe2 heterostructure is interesting because of the strong intermixing of the two conduction bands and the large work function of the SnS2. The band lineup of the well separated materials indicates a type II heterostructure, but the conduction band minimum of the SnS2/HfSe2 bilayer is a coherent superposition of the orbitals from the two layers with a spectral weight of 60% on the SnS2 and 40% on the HfSe2 for AA stacking. These relative weights can be either increased or reversed by an applied vertical field. A 3×3 supercell of graphene and a 2×2 supercell of SnS2/HfSe2 have a lattice mismatch of 0.1% and both the SnS2/HfSe2 conduction band at M and the graphene Dirac point at K are zone-folded to Γ. Placing graphene on the SnS2/HfSe2 bilayer results in large n-type charge transfer doping of the SnS2/HfSe2 bilayer, on the order of 1013/cm2, and the charge transfer is accompanied by a negative Schottky barrier contact for electron injection from the graphene into the SnS2/HfSe2 bilayer conduction band. Binding energies and the anti-crossing gaps of the graphene and the SnS2/HfSe2 electronic bands both show that the coupling of graphene to the HfSe2 layer is significantly larger than its coupling to the SnS2 layer. A tunneling Hamiltonian estimate of the contact resistance of the graphene to the SnS2/HfSe2 heterostructure predicts an excellent low-resistance contact.