Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers.

Transition metal phosphates are promising catalysts for the oxygen evolution reaction (OER) in alkaline medium. Herein, Fe-doped Ni phosphates are deposited using plasma-enhanced atomic layer deposition (PE-ALD) at 300 °C. A sequence offFe phosphate PE-ALD cycles andnNi phosphate PE-ALD cycles is repeatedxtimes. The Fe to Ni ratio can be controlled by the cycle ratio (f/n), while the film thickness can be controlled by the number of cycles (xtimes (n+f)). 30 nm films with an Fe/Ni ratio of ∼10% and ∼37%, respectively, are evaluated in 1.0 M KOH solution. Remarkably, a significant difference in OER activity is found when the order of the Ni and Fe phosphate PE-ALD cycles in the deposition sequence is reversed. A 20%-45% larger current density is obtained for catalysts grown with an Fe phosphate PE-ALD cycle at the end compared to the Ni phosphate-terminated flavour. We attribute this to a higher concentration of Fe centers on the surface, as a consequence of the specific PE-ALD approach. Secondly, increasing the thickness of the catalyst films up to 160 nm results in an increase of the OER current density and active surface area, suggesting that the as-deposited smooth and continuous films are converted into electrolyte-permeable structures during catalyst activation and operation. This work demonstrates the ability of PE-ALD to control both the surface and bulk composition of thin film electrocatalysts, offering valuable opportunities to understand their impact on performance.

Controlling Pt nanoparticle sintering by sub-monolayer MgO ALD thin films.

Metal nanoparticle (NP) sintering is a major cause of catalyst deactivation, as NP growth reduces the surface area available for reaction. A promising route to halt sintering is to deposit a protective overcoat on the catalyst surface, followed by annealing to generate overlayer porosity for gas transport to the NPs. Yet, such a combined deposition-annealing approach lacks structural control over the cracked protection layer and the number of NP surface atoms available for reaction. Herein, we exploit the tailoring capabilities of atomic layer deposition (ALD) to deposit MgO overcoats on archetypal Pt NP catalysts with thicknesses ranging from sub-monolayers to nm-range thin films. Two different ALD processes are studied for the growth of MgO overcoats on Pt NPs anchored on a SiO2 support, using Mg(EtCp)2 and H2O, and Mg(TMHD)2 and O3, respectively. Spectroscopic ellipsometry and X-ray photoelectron spectroscopy measurements reveal significant growth on both SiO2 and Pt for the former process, while the latter exhibits a drastically lower growth per cycle with an initial chemical selectivity towards Pt. These differences in MgO growth characteristics have implications for the availability of uncoated Pt surface atoms at different stages of the ALD process, as probed by low energy ion scattering, and for the sintering behavior during O2 annealing, as monitored in situ with grazing incidence small angle X-ray scattering (in situ GISAXS). The Mg(TMHD)2-O3 ALD process enables exquisite coverage control allowing a balance between physically blocking the Pt surface to prevent sintering and keeping Pt surface atoms free for reaction. This approach avoids the need for post-annealing, hence also safeguarding the structural integrity of the as-deposited overcoat.

Depositing ALD-oxides on MLD-metalcones: enhancing initial growth through O2 plasma densification.

Flexible devices are experiencing a steady increase in popularity, which brings the need of suitable protective/functional coatings for these applications. On the one hand, Atomic Layer Deposition (ALD) produces thin films with great purity, few pinholes and good conformality, but flexibility is rather limited. On the other hand, Molecular Layer Deposition (MLD) can produce partially/fully organic coatings with good flexibility, but stability concerns limit their applications. Therefore, combining ALD and MLD to obtain materials with good flexibility and improved characteristics holds great potential. In this article, we utilised O2 plasma treatments on various metalcone films to improve the compatibility of sequential ALD/MLD depositions. During plasma modification, in situ spectroscopic ellipsometry measurements (in situ SE) suggested that mainly the near-surface region of the metalcone layer was affected by the plasma treatment, locally converting the metalcone into a metal-oxide structure. This structure shielded the underlying metalcone layer from the plasma, thus resulting in a saturative-type behaviour even during extended plasma exposures. X-Ray reflectivity measurements (XRR) could only be fitted with bilayer models, while Fourier-Transform InfraRed spectroscopy (FTIR) showed an absorption decrease in the C-O band and an increase in the CO region. Additionally, film air stability seemed improved by this treatment. ALD-oxides were grown on these plasma-treated metalcones (PT-metalcones), and results were compared to pristine ones. While ALD growth on pristine metalcones always suffered from a delay, after which linear growth was achieved, oxides on PT-metalcones exhibited linear growth immediately, from cycle one. We therefore conclude that, upon O2 plasma exposure, metalcones are densified into a metalcone/oxide bilayer, where the oxide shields the underlying film from further oxidation. And, if an ALD oxide coating is to be deposited on top of these structures, this plasma treatment will make the structure more suitable for post-processing. In applications that require the combination of ALD/MLD multistacks, the use of an intermittent plasma treatment can prove useful.

Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes.

Metallic lithium (Li) is considered as one of the highly interesting anode materials for advanced batteries due to its large theoretical capacity, small material density and the high cell voltages that can be obtained in batteries using Li anodes. However, Li dendrite growth and unstable solid electrolyte interphase (SEI) formation emerged during the plating-stripping process, leading to low coulombic efficiency, rapid battery degradation and serious safety issues. These disadvantages form the major challenges towards commercialization. In this work, an ultra-thin and uniform Y2O3 layer is coated on Li metal anodes by atomic layer deposition (ALD) for improving the stability of Li metal batteries. Elucidation by in vacuo X-ray photoelectron spectroscopy (XPS) revealed different growth of a Y2O3 layer on metallic Li compared to that on a silicon wafer, which is traditionally used for ALD processes. The Y-precursor, i.e., Y(EtCp)2(iPr-amd), firstly reacts with metallic Li and forms a "decomposition" layer, leading to nonlinear growth at the preliminary stage (up to around 20 ALD cycles). Only after the bare Li surface has been fully covered does standard ALD growth start. The ALD Y2O3 layer on metallic Li is able to effectively prevent the growth of Li dendrites, giving rise to an even plating-stripping process in symmetric Li metal cells with more stable performance and prolonged lifespan. Improved electrochemical performance through the Y2O3 protective layer has also been investigated in Y2O3-coated Li||LiMn2O4 asymmetrical full cells. This work indicates that ALD Y2O3 coating is an attractive method to stabilize Li metal anodes for battery devices.

Metal Nanocatalyst Sintering Interrogated at Complementary Length Scales.

Metal nanoparticle (NP) sintering is a prime cause of catalyst degradation, limiting its economic lifetime and viability. To date, sintering phenomena are interrogated either at the bulk scale to probe averaged NP properties or at the level of individual NPs to visualize atomic motion. Yet, "mesoscale" strategies which bridge these worlds can chart NP populations at intermediate length scales but remain elusive due to characterization challenges. Here, a multi-pronged approach is developed to provide complementary information on Pt NP sintering covering multiple length scales. High-resolution scanning electron microscopy (HRSEM) and Monte Carlo simulation show that the size evolution of individual NPs depends on the number of coalescence events they undergo during their lifetime. In its turn, the probability of coalescence is strongly dependent on the NP's mesoscale environment, where local population heterogeneities generate NP-rich "hotspots" and NP-free zones during sintering. Surprisingly, advanced in situ synchrotron X-ray diffraction shows that not all NPs within the small NP sub-population are equally prone to sintering, depending on their crystallographic orientation on the support surface. The demonstrated approach shows that mesoscale heterogeneities in the NP population drive sintering and mitigation strategies demand their maximal elimination via advanced catalyst synthesis strategies.

UV photonic integrated circuits for far-field structured illumination autofluorescence microscopy.

Ultra-violet (UV) light has still a limited scope in optical microscopy despite its potential advantages over visible light in terms of optical resolution and of interaction with a wide variety of biological molecules. The main challenge is to control in a robust, compact and cost-effective way UV light beams at the level of a single optical spatial mode and concomitantly to minimize the light propagation loss. To tackle this challenge, we present here photonic integrated circuits made of aluminum oxide thin layers that are compatible with both UV light and high-volume manufacturing. These photonic circuits designed at a wavelength of 360 nm enable super-resolved structured illumination microscopy with conventional wide-field microscopes and without modifying the usual protocol for handling the object to be imaged. As a biological application, we show that our UV photonic chips enable to image the autofluorescence of yeast cells and reveal features unresolved with standard wide-field microscopy.

Titanium Carboxylate Molecular Layer Deposited Hybrid Films as Protective Coatings for Lithium-Ion Batteries.

The lifetime of lithium-ion batteries can be extended by applying protective coatings to the cathode's surface. Many studies explore atomic layer deposition (ALD) for this purpose. However, the complementary molecular layer deposition (MLD) technique might offer the benefit of depositing hybrid coatings that are flexible and can accommodate potential volume changes of the electrode during charging and discharging of the battery. This study reports the deposition of titanium carboxylate thin films via MLD. The structure and stability of the hybrid films are studied by using Fourier transform IR spectroscopy. The electrochemical properties of two titanium carboxylate films and a "titanicone" MLD film, deposited by using TDMAT and glycerol, are evaluated on top of a TiO2, TiN, and LiMn2O4 electrode. The coatings are found to present good lithium-ion kinetics and to reduce electrolyte decomposition. Overall, the titanium carboxylate films deposited in this work seem promising as protective and elastic coatings for future high-energy lithium-ion battery cathodes.

Aligning time-resolved kinetics (TAP) and surface spectroscopy (AP-XPS) for a more comprehensive understanding of ALD-derived 2D and 3D model catalysts.

The spectro-kinetic characterization of complex catalytic materials, i.e. relating the observed reaction kinetics to spectroscopic descriptors of the catalyst state, presents a fundamental challenge with a potentially significant impact on various chemical technologies. We propose to reconcile the kinetic characteristics available from temporal analysis of products (TAP) pulse-response kinetic experiments with the spectroscopic data available from ambient pressure X-ray photoelectron spectroscopy (AP-XPS), using atomic layer deposition (ALD) to synthesize multicomponent model surfaces on 2D and 3D supports. The accumulated surface exposure to a key reactant (total number of collisions) is used as a common scale within which the results from the two techniques can be rigorously compared for microscopically-equivalent surfaces. This approach is illustrated by proof-of-principle TAP and AP-XPS experiments with PtIn/MgO/SiO2 catalysts for alkane dehydrogenation at 800 K. Similarly to industrially-relevant Pt-based bimetallic catalysts on high-surface area supports, the initial period of coke accumulation on the surface resulted in gradually decreased conversion and increased selectivity towards propylene. We were able to monitor the process of coke deposition with both AP-XPS and TAP. The evolution of the C 1s photoelectron spectra is aligned on the common exposure scale with the evolution of the coke amounts deposited per Pt site during a multi-pulse TAP experiment. Moreover, TAP provided quantitative kinetic descriptors of propane consumption and product mean residence time within this common exposure scale. The challenges and opportunities presented by this novel tandem methodology are discussed in the context of catalysis research.

Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries.

A plasma-enhanced ALD process has been developed to deposit nickel phosphate. The process combines trimethylphosphate (TMP) plasma with oxygen plasma and nickelocene at a substrate temperature of 300 °C. Saturation at a growth per cycle of approximately 0.2 nm per cycle is observed for both the TMP plasma and nickelocene, while a continuous decrease in the growth per cycle is found for the oxygen plasma. From ERD, a stoichiometry of Ni3(P0.8O3.1)2 is measured, but by adding additional oxygen plasma after nickelocene, the composition of Ni3(P0.9O3.7)2 becomes even closer to stoichiometric Ni3(PO4)2. The as-deposited layer resulting from the process without the additional oxygen plasma is amorphous but can be crystallized into Ni2P or crystalline Ni3(PO4)2 by annealing under a hydrogen or helium atmosphere, respectively. The layer deposited with the additional oxygen plasma shows two X-ray diffraction peaks indicating the formation of crystalline Ni3(PO4)2 already during the deposition. The resulting PE-ALD deposited nickel phosphate layers were then electrochemically studied and compared to PE-ALD cobalt and iron phosphate. All phosphates need electrochemical activation at low potential first, after which reversible redox reactions are observed at a potential of approximately 2.5 V vs. Li+/Li. A relatively high capacity and good rate behavior are observed for both nickel and cobalt phosphate, which are thought to originate from either a conversion type reaction or an alloying reaction.

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant.

In this work, the use of ruthenium tetroxide (RuO4) as a co-reactant for atomic layer deposition (ALD) is reported. The role of RuO4 as a co-reactant is twofold: it acts both as an oxidizing agent and as a Ru source. It is demonstrated that ALD of a ternary Ru-containing metal oxide (i.e. a metal ruthenate) can be achieved by combining a metalorganic precursor with RuO4 in a two-step process. RuO4 is proposed to combust the organic ligands of the adsorbed precursor molecules while also binding RuO2 to the surface. As a proof of concept two metal ruthenate processes are developed: one for aluminum ruthenate, by combining trimethylaluminum (TMA) with RuO4; and one for platinum ruthenate, by combining MeCpPtMe3 with RuO4. Both processes exhibit self-limiting surface reactions and linear growth as a function of the number of ALD cycles. The observed saturated growth rates are relatively high compared to what is usually the case for ALD. At 100 °C sample temperature, growth rates of 0.86 nm per cycle and 0.52 nm per cycle are observed for the aluminum and platinum ruthenate processes, respectively. The TMA/RuO4 process results in a 1 : 1 Al to Ru ratio, while the MeCpPtMe3/RuO4 process yields a highly Ru-rich composition with respect to Pt. Carbon, hydrogen and fluorine impurities are present in the thin films with different relative amounts for the two investigated processes. For both processes, the as-deposited films are amorphous.

An IR Spectroscopy Study of the Degradation of Surface Bound Azido-Groups in High Vacuum.

Controlled surface functionalization with azides to perform on surface "click chemistry" is desired for a large range of fields such as material engineering and biosensors. In this work, the stability of an azido-containing self-assembled monolayer in high vacuum is investigated using in situ Fourier transform infrared spectroscopy. The intensity of the antisymmetric azide stretching vibration is found to decrease over time, suggesting the degradation of the azido-group in high vacuum. The degradation is further investigated at three different temperatures and at seven different nitrogen pressures ranging from 1 × 10-6 mbar to 5 × 10-3 mbar. The degradation is found to increase at higher temperatures and at lower nitrogen pressures. The latter supporting the theory that the degradation reaction involves the decomposition into molecular nitrogen. For the condition with the highest degradation detected, only 63% of azides is found to remain at the surface after 8 h in vacuum. The findings show a significant loss in control of the surface functionalization. The instability of azides in high vacuum should therefore always be considered when depositing or postprocessing azido-containing layers.

Influence of Alumina Addition on the Optical Properties and the Thermal Stability of Titania Thin Films and Inverse Opals Produced by Atomic Layer Deposition.

TiO2 thin films deposited by atomic layer deposition (ALD) at low temperatures (<100 °C) are, in general, amorphous and exhibit a smaller refractive index in comparison to their crystalline counterparts. Nonetheless, low-temperature ALD is needed when the substrates or templates are based on polymeric materials, as the deposition has to be performed below their glass transition or melting temperatures. This is the case for photonic crystals generated via ALD infiltration of self-assembled polystyrene templates. When heated up, crystal phase transformations take place in the thin films or photonic structures, and the accompanying volume reduction as well as the burn-out of residual impurities can lead to mechanical instability. The introduction of cation doping (e.g., Al or Nb) in bulk TiO2 parts is known to alter phase transitions and to stabilize crystalline phases. In this work, we have developed low-temperature ALD super-cycles to introduce Al2O3 into TiO2 thin films and photonic crystals. The aluminum oxide content was adjusted by varying the TiO2:Al2O3 internal loop ratio within the ALD super-cycle. Both thin films and inverse opal photonic crystal structures were subjected to thermal treatments ranging from 200 to 1200 °C and were characterized by in- and ex-situ X-ray diffraction, spectroscopic ellipsometry, and spectroscopic reflectance measurements. The results show that the introduction of alumina affects the crystallization and phase transition temperatures of titania as well as the optical properties of the inverse opal photonic crystals (iPhC). The thermal stability of the titania iPhCs was increased by the alumina introduction, maintaining their photonic bandgap even after heat treatment at 900 °C and outperforming the pure titania, with the best results being achieved with the super-cycles corresponding to an estimated alumina content of 26 wt.%.

Gold-induced photothermal background in on-chip surface enhanced stimulated Raman spectroscopy.

Surface enhanced Raman spectroscopy (SERS) and stimulated Raman spectroscopy (SRS) are well established techniques capable of boosting the strength of Raman scattering. The combination of both techniques (surface enhanced stimulated Raman spectroscopy, or SE-SRS) has been reported using plasmonic nanoparticles. In parallel, waveguide enhanced Raman spectroscopy has been developed using nanophotonic and nanoplasmonic waveguides. Here, we explore SE-SRS in nanoplasmonic waveguides. We demonstrate that a combined photothermal and thermo-optic effect in the gold material induces a strong background signal that limits the detection limit for the analyte. The experimental results are in line with theoretical estimates. We propose several methods to reduce or counteract this background.

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification.

Alucones are one of the best-known films in the Molecular Layer Deposition (MLD) field. In this work, we prove that alucone/Al2O3 nanolaminate synthesis can be successfully performed by alternating alucone MLD growth with static O2 plasma exposures. Upon plasma treatment, only the top part of the alucone is densified into Al2O3, while the rest of the film remains relatively unaltered. X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) depth profiling show that the process yields a bilayer structure, which remains stable in air. Fourier-transform infrared spectroscopy (FTIR) measurements show that Al2O3 features are generated after plasma treatment, while the original alucone features remain, confirming that plasma treatment results in a bilayer structure. Also, an intermediate carboxylate is created in the interface. Calculations of Al atom density during plasma exposure point towards a partial loss of Al atoms during plasma treatment, in addition to the removal of the glycerol backbone. The effect of different process parameters has been studied. Densification at the highest temperature possible (200 °C) has the best alucone preservation without hindering its thermal stability. In addition, operating at the lowest plasma power is found the most beneficial for the film, but there is a threshold that must be surpassed to achieve successful densification. About 70% of the original alucone film thickness can be expected to remain after densification, but thicker films may result in more diffuse interfaces. Additionally, this process has also been successfully performed in multilayers, showing real potential for encapsulation applications.

Controlled synthesis of Fe-Pt nanoalloys using atomic layer deposition.

We report the phase and size-controlled synthesis of Fe-Pt nanoalloys, prepared via a two-step synthesis procedure. The first step is the deposition of bilayers consisting of iron oxide and Pt films of desired thicknesses using atomic layer deposition, followed by a temperature-programmed reduction treatment of the film under H2/N2 atmosphere. This method enables the phase pure synthesis of all three Fe-Pt alloy phases, namely Fe3Pt, FePt, and FePt3, as revealed by in situ x-ray diffraction and x-ray fluorescence measurements. It is also demonstrated that by changing the total thickness of the bilayers while keeping the Pt/(Pt + Fe) atomic ratio constant, the size of the resulting bimetallic nanoparticles can be tuned, as confirmed by scanning electron microscopic measurements.

Surface mobility and impact of precursor dosing during atomic layer deposition of platinum: in situ monitoring of nucleation and island growth.

The increasing interest in atomic layer deposition (ALD) of Pt for the controlled synthesis of supported nanoparticles for catalysis demands an in-depth understanding of the nucleation controlled growth behaviour. We present an in situ investigation of Pt ALD on planar Si substrates, with native SiO2, by means of X-ray fluorescence (XRF) and grazing incidence small-angle X-ray scattering (GISAXS), using a custom-built synchrotron-compatible high-vacuum ALD setup and focusing on the thermal Pt ALD process, comprising (methylcyclopentadienyl)trimethylplatinum (MeCpPtMe3) and O2 gas at 300 °C. The evolution in key scattering features provides insights into the growth kinetics of Pt deposits from small nuclei to isolated islands and coalesced worm-like structures. An analysis approach is introduced to extract dynamic information on the average real space parameters, such as Pt cluster shape, size, and spacing. The results indicate a nucleation stage, followed by a diffusion-mediated particle growth regime that is marked by a decrease in average areal density and the formation of laterally elongated Pt clusters. Growth of the Pt nanoparticles is thus not only governed by the adsorption of Pt precursor molecules from the gas-phase and subsequent combustion of the ligands, but is largely determined by adsorption of migrating Pt species on the surface and diffusion-driven particle coalescence. Moreover, the influence of the Pt precursor dose on the particle nucleation and growth is investigated. It is found that the precursor dose influences the deposition rate (number of Pt atoms per cycle), while the particle morphology for a specific Pt loading is independent of the precursor dose used in the ALD process. Our results prove that combining in situ GISAXS and XRF provides an excellent experimental strategy to obtain new fundamental insights about the role of deposition parameters on the morphology of Pt ALD depositions. This knowledge is vital to improve control over the Pt nucleation stage and enable efficient synthesis of supported nanocatalysts.

Designing Nanoparticles and Nanoalloys for Gas-Phase Catalysis with Controlled Surface Reactivity Using Colloidal Synthesis and Atomic Layer Deposition.

Supported nanoparticles are commonly applied in heterogeneous catalysis. The catalytic performance of these solid catalysts is, for a given support, dependent on the nanoparticle size, shape, and composition, thus necessitating synthesis techniques that allow for preparing these materials with fine control over those properties. Such control can be exploited to deconvolute their effects on the catalyst's performance, which is the basis for knowledge-driven catalyst design. In this regard, bottom-up synthesis procedures based on colloidal chemistry or atomic layer deposition (ALD) have proven successful in achieving the desired level of control for a variety of fundamental studies. This review aims to give an account of recent progress made in the two aforementioned synthesis techniques for the application of controlled catalytic materials in gas-phase catalysis. For each technique, the focus goes to mono- and bimetallic materials, as well as to recent efforts in enhancing their performance by embedding colloidal templates in porous oxide phases or by the deposition of oxide overlayers via ALD. As a recent extension to the latter, the concept of area-selective ALD for advanced atomic-scale catalyst design is discussed.

In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating.

Downscaling of supported Pt structures to the nanoscale is motivated by the augmentation of the catalytic activity and selectivity, which depend on the particle size, shape and coverage. Harsh thermal and chemical conditions generally required for catalytic applications entail an undesirable particle coarsening, and consequently limit the catalyst lifetime. Herein we report an in situ synchrotron study on the stability of supported Pt nanoparticles and their stabilization using atomic layer deposition (ALD) as the stabilizing methodology against particle coarsening. Pt nanoparticles were thermally annealed up to 850 °C in an oxidizing environment while recording in situ synchrotron grazing incidence small angle X-ray scattering (GISAXS) 2D patterns, thereby obtaining continuous information about the particle radius evolution. Al2O3 overcoat as a protective capping layer against coarsening via ALD was investigated. In situ data proved that only 1 cycle of Al2O3 ALD caused an augmentation of the onset temperature for particle coarsening. Moreover, the results showed a dependence of the required overcoat thickness on the initial particle size and distribution, being more efficient (i.e. requiring lower thicknesses) when isolated particles are present on the sample surface. The Pt surface accessibility, which is decisive in catalytic applications, was analyzed using the low energy ion scattering (LEIS) technique, revealing a larger Pt surface accessibility for a sample with Al2O3 overcoat than for a sample without a protective layer after a long-term isothermal annealing.

Atomic Layer Deposition of Nitrogen-Doped Al Phosphate Coatings for Li-Ion Battery Applications.

In situ nitrogen doping of aluminum phosphate has been investigated in two different plasma-enhanced atomic layer deposition (PE-ALD) processes. The first method consisted of the combination of trimethyl phosphate plasma (TMP*) with a nitrogen plasma and trimethyl aluminum (TMA), that is, TMP*-N2*-TMA. The second method replaces TMP* with a diethylphosphoramidate plasma (i.e., DEPA*-N2*-TMA) of which the amine group could further aid nitrogen doping and/or eliminate the need for a nitrogen plasma step. At a substrate temperature of 320 °C, the TMP*-based process showed saturated growth (0.8 nm/cycle) of a nitrogen-doped (approximately 8 atom %) Al phosphate, while the process using DEPA* showed a similar amount of nitrogen but a significantly higher growth rate (1.4 nm/cycle). In the latter case, nitrogen doping could also be achieved without the nitrogen plasma, but this leads to a high level of carbon contamination. Both films were amorphous as-deposited, while X-ray diffraction peaks related to AlPO4 appeared after annealing in a He atmosphere. For high coating thickness (>2 nm), a significant increase in the Li-ion transmittance was found after nitrogen doping, although the coating has to be electrochemically activated. At lower thickness scales, such activation was not needed and nitrogen doping was found to double the effective transversal electronic conductivity. For the effective transversal ionic conductivity, no conclusive difference was found. When a lithium nickel manganese cobalt oxide (NMC) powder is coated with one ALD cycle of N-doped Al phosphate, the rate capability and the energy efficiency of the electrode improves.

Reaction mechanism of the Me3AuPMe3-H2 plasma-enhanced ALD process.

The reaction mechanism of the recently reported Me3AuPMe3-H2 plasma gold ALD process was investigated using in situ characterization techniques in a pump-type ALD system. In situ RAIRS and in vacuo XPS measurements confirm that the CH3 and PMe3 ligands remain on the gold surface after chemisorption of the precursor, causing self-limiting adsorption. Remaining surface groups are removed by the H2 plasma in the form of CH4 and likely as PHxMey groups, allowing chemisorption of new precursor molecules during the next exposure. The decomposition behaviour of the Me3AuPMe3 precursor on a Au surface is also presented and linked to the stability of the precursor ligands that govern the self-limiting growth during ALD. Desorption of the CH3 ligands occurs at all substrate temperatures during evacuation to high vacuum, occurring faster at higher temperatures. The PMe3 ligand is found to be less stable on a gold surface at higher substrate temperatures and is accompanied by an increase in precusor decomposition on a gold surface, indicating that the temperature dependent stability of the precursor ligands is an important factor to ensure self-limiting precursor adsorption during ALD. Remarkably, precursor decomposition does not occur on a SiO2 surface, in situ transmission absorption infrared experiments indicate that nucleation on a SiO2 surface occurs on Si-OH groups. Finally, we comment on the use of different co-reactants during PE-ALD of Au and we report on different PE-ALD growth with the reported O2 plasma and H2O process in pump-type versus flow-type ALD systems.