RESUMO
Atomic layer deposition is a chemical deposition technology that provides ultimate control over the conformality of films and their thickness, even down to Ångström-scale precision. Based on the marked superficial character and gas phase process of the technique, metal sources and their ligands shall ideally be highly volatile. However, in numerous cases those ligands corrode the substrate or compete for adsorption sites, well-known as side reactions of these processes. Therefore, the ability to control such side reactions might be of great interest, since it could achieve synchronous coating and alteration of a substrate in one process, saving time and energy otherwise needed for a post-treatment of the sample. Consequently, advances in this way must require understanding and control of the chemical processes that occur during the coating. In this work, we show how choosing an appropriate ligand of the metal source can unveil a novel approach to concertedly coat and reduce γ-Fe2O3 nanoparticles to form a final product composed of Fe3O4/TiO2 core/shell nanoparticles. To this aim, we envisage that appropriate design of precursors and selection of substrates will pave the way for numerous new compositions, while the ALD process itself allows for easy upscaling to large amounts of coated and reduced particles for industrial use.
