1.
Appl Opt
; 50(9): C19-26, 2011 Mar 20.
Artigo
em Inglês
| MEDLINE
| ID: mdl-21460937
RESUMO
Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1m in aperture.