Simulation methods for solvent vapor annealing of block copolymer thin films.

Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined in the context of a self-consistent field theory framework. Key control variables in determining the final microdomain morphologies include swelling ratio or swollen film solvent volume fraction, swollen film thickness, substrate and vapor atmosphere surface energies, effective volume fraction, and effective Flory-Huggins interaction parameter. The regime of solvent vapor annealing studied is where the block copolymer has a high enough Flory-Huggins parameter that ordered structures form during swelling and are then trapped in the system through quenching. Both implicit and explicit consideration of the solvent vapor is considered to distinguish the cases in which solvent vapor leads to a non-bulk morphology. Block-selective solvents are considered based on the experimental systems of polystyrene-b-polydimethylsiloxane annealed with toluene and heptane. The results of these simulations are compared with these experiments.

Templating three-dimensional self-assembled structures in bilayer block copolymer films.

The registration and alignment of a monolayer of microdomains in a self-assembled block copolymer thin film can be controlled by chemical or physical templating methods. Although planar patterns are useful for nanoscale device fabrication, three-dimensional multilevel structures are required for some applications. We found that a bilayer film of a cylindrical-morphology block copolymer, templated by an array of posts functionalized with a brush attractive to the majority block, can form a rich variety of three-dimensional structures consisting of cylinder arrays with controllable angles, bends, and junctions whose geometry is controlled by the template periodicity and arrangement. This technique allows control of microdomain patterns and the ability to route and connect microdomains in specific directions.