Scanning Deposition Method for Large-Area Diamond Film Synthesis Using Multiple Microwave Plasma Sources.

The demand for synthetic diamonds and research on their use in next-generation semiconductor devices have recently increased. Microwave plasma chemical vapor deposition (MPCVD) is considered one of the most promising techniques for the mass production of large-sized and high-quality single-, micro- and nanocrystalline diamond films. Although the low-pressure resonant cavity MPCVD method can synthesize high-quality diamonds, improvements are needed in terms of the resulting area. In this study, a large-area diamond synthesis method was developed by arranging several point plasma sources capable of processing a small area and scanning a wafer. A unit combination of three plasma sources afforded a diamond film thickness uniformity of ±6.25% at a wafer width of 70 mm with a power of 700 W for each plasma source. Even distribution of the diamond grains in a size range of 0.1-1 µm on the thin-film surface was verified using field-emission scanning electron microscopy. Therefore, the proposed novel diamond synthesis method can be theoretically expanded to achieve large-area films.

Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition.

To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe with pressure variation. Simulation with the turbulent model was introduced to deduce calibration factor of the Mach probe and to compare experimental measurements for analyses of collisional plasma conditions. The results show calibration factor does not seem to be a constant parameter and highly dependent on the collision parameter. The measured plasma flow velocity, which witnessed fluctuations produced by a shock flow, was between 400 and 700 m/s. The optimized conditions for microwave plasma assisted aerosol deposition were derived by the results obtained from analyses of the parameters of microwave plasma jet. Under the optimized conditions, Y2O3 coatings deposited on an aluminum substrate were investigated using scanning electron microscope. The results presented in this study show the microwave plasma assisted aerosol deposition with the developed microwave plasma source is highly feasible for thick films with >50 µm.