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1.
RSC Adv ; 13(8): 5437-5443, 2023 Feb 06.
Artigo em Inglês | MEDLINE | ID: mdl-36793296

RESUMO

The growth conditions of the AlGaN barrier in AlGaN/AlGaN deep ultra-violet (DUV) multiple quantum wells (MQWs) have crucial influences on the light output power of DUV light-emitting diodes (LEDs). The reduction of the AlGaN barrier growth rate improved the qualities of AlGaN/AlGaN MQWs, such as surface roughness and defects. The light output power enhancement could reach 83% when the AlGaN barrier growth rate was reduced from 900 nm h-1 to 200 nm h-1. In addition to the light output power enhancement, lowering the AlGaN barrier growth rate altered the far-field emission patterns of the DUV LEDs and increased the degree of polarization in the DUV LEDs. The enhanced transverse electric polarized emission indicates that the strain in AlGaN/AlGaN MQWs was modified by lowering the AlGaN barrier growth rate.

2.
ACS Omega ; 7(17): 15027-15036, 2022 May 03.
Artigo em Inglês | MEDLINE | ID: mdl-35557702

RESUMO

AlGaN and GaN sidewalls were turned into Al x Ga2-x O3 and Ga2O3, respectively, by thermal oxidation to improve the optoelectrical characteristics of deep ultraviolet (DUV) light-emitting diodes (LEDs). The thermally oxidized Ga2O3 is a single crystal with nanosized voids homogenously distributed inside the layer. Two oxidized Al x Ga2-x O3 layers were observed on the sidewall of the AlGaN layer in transmission electron microscopy images. The first oxidized Al x Ga2-x O3 layer is a single crystal, while the second oxidized Al x Ga2-xO3 layer is a single crystal with numerous nanosized voids inside. The composition of Al in the first oxidized Al x Ga2-x O3 layer is higher than that in the second one. The thermal oxidation at high temperature degrades the quality of the p-GaN layer and increases the forward voltage from 8.18 to 11.36 V. The thermally oxidized Al x Ga2-x O3 sidewall greatly enhances the light extraction efficiency of the lateral light of the DUV LEDs by combined mechanisms of holey structure, graded refractive index, high transparency, and tensile stress. Consequently, the light output power of the DUV LEDs increases from 0.69 to 0.88 mW by introducing a 420 nm thick Al x Ga2-x O3 sidewall oxidized at 900 °C, in which the enhancement of light output power can reach 27.5%.

3.
Opt Express ; 18(25): 25608-14, 2010 Dec 06.
Artigo em Inglês | MEDLINE | ID: mdl-21164906

RESUMO

In this paper, the polarization dependent optical properties of InGaN/GaN multi-quantum wells (MQWs) LED with cascading plasmonic gratings are investigated using an angle-resolved photoluminescence (ARPL) spectrometer. The plasmonic gratings consist of two Ag gratings with a half-pitch displacement. The ARPL spectra of the TE-TM state present a broadband emission with resonance dips occasioned by the SP resonance while the TM-TE state presents resonance peaks with low sideband emission. The resonance properties can be tuned by modifying the geometric parameters of the plasmonic grating. The ARPL spectrum of the LED sample with pure GaN 1D grating is also measured and discussed. The investigated plasmonics LED represents resonance optical properties different from the conventional surface relief LED, which can be used in special applications.


Assuntos
Iluminação/instrumentação , Refratometria/instrumentação , Semicondutores , Ressonância de Plasmônio de Superfície/instrumentação , Desenho de Equipamento , Análise de Falha de Equipamento/instrumentação
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