Evidence Against Carbonization of the Thin-Film Filters of the Extreme Ultraviolet Variability Experiment onboard the Solar Dynamics Observatory.

In spite of strict limits on outgassing from organic materials, some spacecraft instruments making long-term measurements of solar extreme ultraviolet (EUV) radiation still suffer significant degradation. While such measures have reduced the rate of degradation, they have not completely eliminated it in some cases. For example, in five years, the aluminum filters used in the Extreme Ultraviolet Variability Experiment (EVE) instruments onboard the Solar Dynamics Observatory (SDO) suffered losses exceeding 40% at 30.4 nm. Comparing those losses with the negligible losses of nearby zirconium filters on the same instruments indicated that the problem was not due to carbonization on the Sun-facing side of the filter. To investigate whether the loss was due to carbon deposition on the downstream face of the Al filter, we exposed the backsides of Al and Zr filters to EUV in the presence of a volatile organic solvent in the laboratory and concluded that this could not be the cause. Given that the residual gas composition in the SDO spacecraft likely has water vapor as well as organics, these findings suggest that the transmission loss in the Al filter originated with oxidation caused by UV-activated adsorbed water.

Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.