Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography.

Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the continued miniaturization of semiconductor devices. The required EUV light, at 13.5 nm wavelength, is produced in a hot and dense laser-driven tin plasma. The atomic origins of this light are demonstrably poorly understood. Here we calculate detailed tin opacity spectra using the Los Alamos atomic physics suite ATOMIC and validate these calculations with experimental comparisons. Our key finding is that EUV light largely originates from transitions between multiply-excited states, and not from the singly-excited states decaying to the ground state as is the current paradigm. Moreover, we find that transitions between these multiply-excited states also contribute in the same narrow window around 13.5 nm as those originating from singly-excited states, and this striking property holds over a wide range of charge states. We thus reveal the doubly magic behavior of tin and the origins of the EUV light.

Resolving multi-exciton generation by attosecond spectroscopy.

We propose an experimentally viable attosecond transient absorption spectroscopy scheme to resolve controversies regarding multiexciton (ME) generation in nanoscale systems. Absence of oscillations indicates that light excites single excitons, and MEs are created by incoherent impact ionization. An oscillation indicates the coherent mechanism, involving excitation of superpositions of single and MEs. The oscillation decay, ranging from 5 fs at ambient temperature to 20 fs at 100 K, gives the elastic exciton-phonon scattering time. The signal is best observed with multiple-cycle pump pulses.