Lithography-free and high-efficiency preparation of black phosphorous devices by direct evaporation through shadow mask.

Two-dimensional (2D) materials including black phosphorus (BP) have been extensively investigated because of their exotic physical properties and potential applications in nanoelectronics and optoelectronics. Fabricating BP based devices is challenging because BP is extremely sensitive to the external environment, especially to the chemical contamination during the lithography process. The direct evaporation through shadow mask technique is a clean method for lithography-free electrode patterning of 2D materials. Herein, we employ the lithography-free evaporation method for the construction of BP based field-effect transistors and photodetectors and systematically compare their performances with those of BP counterparts fabricated by conventional lithography and transfer electrode methods. The results show that BP devices fabricated by direct evaporation method possess higher mobility, faster response time, and smaller hysteresis than those prepared by the latter two methods. This can be attributed to the clean interface between BP and evaporated-electrodes as well as the lower Schottky barrier height of 20.2 meV, which is given by the temperature-dependent electrical results. Furthermore, the BP photodetectors exhibit a broad-spectrum response and polarization sensitivity. Our work elucidates a universal, low-cost and high-efficiency method to fabricate BP devices for optoelectronic applications.

Status and prospects of Ohmic contacts on two-dimensional semiconductors.

In recent years, two-dimensional materials have received more and more attention in the development of semiconductor devices, and their practical applications in optoelectronic devices have also developed rapidly. However, there are still some factors that limit the performance of two-dimensional semiconductor material devices, and one of the most important is Ohmic contact. Here, we elaborate on a variety of approaches to achieve Ohmic contacts on two-dimensional materials and reveal their physical mechanisms. For the work function mismatch problem, we summarize the comparison of barrier heights between different metals and 2D semiconductors. We also examine different methods to solve the problem of Fermi level pinning. For the novel 2D metal-semiconductor contact methods, we analyse their effects on reducing contact resistance from two different perspectives: homojunction and heterojunction. Finally, the challenges of 2D semiconductors in achieving Ohmic contacts are outlined.

Design method of wide field-of-view imaging systems using Gaussian radial basis functions freeform surfaces.

High optical performance systems with wide field-of-view (FOV) have important applications in remote sensing. The radial basis functions, which have a prominent local characteristic in surface description, have attracted much attention in recent years. In this paper, an effective design method for the wide FOV imaging system using Gaussian radial basis function freeform surfaces is proposed. The FOV of the optical system is extended from a relatively small value to a larger one, and the Gaussian radial basis function surfaces are extended stepwise based on certain criteria. A high image quality and small distortion off-axis freeform three-mirror system with a wide FOV (${{60}}^\circ \times {0.6}^\circ$) is designed as an example. Tolerance analysis considering both surface figure error and assembly error is performed. The design results demonstrate the effectiveness of the proposed method.

Design and fabrication of an off-axis four-mirror system for head-up displays.

Head-up displays (HUDs), as one kind of the augmented reality (AR) applications, enable users to enhance the situational awareness. In this paper, we propose a design of a HUD employing the freeform off-axis four-mirror construction, in which the eyebox and eye relief as large as 120mm×80mm and 400 mm, respectively, are derived. In the part of system design, the biocular parallax is evaluated and corrected. An optimization strategy in forward ray-tracing mode is presented to directly govern the biocular parallax, and the convergence, divergence, and dipvergence are finally constrained within 3.5 mrad, 1.5 mrad, and 2.0 mrad, respectively. An overall design procedure of a HUD, including initial configuration, structure constraints, optimization method, and parallax correction, is illustrated in detail. After analyzing the tolerance, a proof-of-concept prototype with the field of 24∘×15∘ is developed to demonstrate the image quality.

Description and tolerance analysis of freeform surface figure error using specific-probability-distributed Gaussian radial basis functions: erratum.

In this erratum the funding section of Opt. Express 27, 31820-31839 (2019) has been updated.

Description and tolerance analysis of freeform surface figure error using specific-probability-distributed Gaussian radial basis functions.

Freeform surfaces have important applications in optical design. However, the complex surface figure error of freeform imaging systems affects the performance of as-built systems. In this paper, a method for the representation and tolerance analysis of the freeform surface figure error using a sum of specific-probability-distributed Gaussian radial basis functions is presented. This method is easy-used and practical. In addition, the actual manufacturing difficulty of different areas of the freeform surface is considered. Tolerance analysis of a nonsymmetric freeform off-axis three-mirror system was performed, including considering only the surface figure error, as well as an overall tolerance analysis considering both figure error and assembly error. The results demonstrated the effectiveness and feasibility of the proposed method.