An ab initio investigation of the temperature-dependent energetic barriers towards CrAlB and (Mo,Cr)AlB formation in a metastable synthesis scenario.

The orthorhombic CrAlB MAB phase has not been synthesized so far and was shown to be energetically unstable vs. the competing Cr2AlB2 phase in previous theoretical reports, which, however, did not explicitly investigate the magnitude of the energetic barrier towards CrAlB formation as a function of temperature. Temperature-dependent Gibbs energies of formation, obtained from density-functional-theory-based lattice dynamics simulations performed in this study, reveal that this barrier is very small (around 10 kJ mol-1 ≈ 0.008 eV per atom, on average) and may readily be overcome during high-energy synthesis scenarios, likely resulting in metastable phase formation. Furthermore, the electronic structures of MoAlB, a phase synthesized experimentally both in bulk and thin film form, and CrAlB are shown to be similar in direct comparison, with MoAlB exhibiting a higher electronic stability due to a local DOS minimum in proximity to the Fermi level, and quaternary compositions lying between the ternaries. Likewise, bonding characteristics are qualitatively very similar between both phases, with the transition metal-boron bonds being the dominant interaction in the entire unit cell, even though individual B-B bonds are stronger; quantitatively, all interactions are again stronger in MoAlB compared to CrAlB. It is reasonable to assume that, considering the successful synthesis of phase-pure MoAlB and known formation of metastable phases during physical vapor deposition, direct synthesis of metastable CrAlB thin films is possible due to the aforementioned small energy barrier. Furthermore, stability is enhanced upon alloying with Mo as this lowers the energy of formation, with a Mo/Cr ratio of approx. 0.33 sufficient to stabilize the Cr-rich (Mo,Cr)AlB solid solution vs. the primary competing phases, allowing for deposition of Mo-concentration-dependent stable and metastable (Mo,Cr)AlB solid solution phases.

Ag Surface and Bulk Segregations in Sputtered ZrCuAlNi Metallic Glass Thin Films.

We report on the formation of Ag-containing ZrCuAlNi thin film metallic glass (nano)composites by a hybrid direct-current magnetron sputtering and high-power pulsed magnetron sputtering process. The effects of Ag content, substrate temperature and substrate bias potential on the phase formation and morphology of the nanocomposites were investigated. While applying a substrate bias potential did not strongly affect the morphological evolution of the films, the Ag content dictated the size and distribution of Ag surface segregations. The films deposited at low temperatures were characterized by strong surface segregations, formed by coalescence and Ostwald ripening, while the volume of the films remained featureless. At higher deposition temperature, elongated Ag segregations were observed in the bulk and a continuous Ag layer was formed at the surface as a result of thermally enhanced surface diffusion. While microstructural observations have allowed identifying both surface and bulk segregations, an indirect method for detecting the presence of Ag segregations is proposed, by measuring the electrical resistivity of the films.

On atomic mechanisms governing the oxidation of Bi2Te3.

Oxidation of Bi2Te3 (space group R [Formula: see text] m) has been investigated using experimental and theoretical means. Based on calorimetry, x-ray photoelectron spectroscopy and thermodynamic modelling, Bi2Te3 is at equilibrium with Bi2O3 and TeO2, whereby the most stable compound is Bi2Te3, followed by Bi2O3. The reactivity of Bi towards oxygen is expected to be higher than that of Te. This notion is supported by density functional theory. The strongest bond is formed between Bi and Te, followed by Bi-O. This gives rise to unanticipated atomic processes. Dissociatively adsorbed oxygen diffuses through Bi and Te basal planes of Bi2Te3(0 0 0 1) and preferably interacts with Bi. The Te termination considerably retards this process. These findings may clarify conflicting literature data. Any basal plane off-cut or Bi terminations trigger oxidation, but a perfect basal cleavage, where only Te terminations are exposed to air, may be stable for a longer period of time. These results are of relevance for applications in which surfaces are of key importance, such as nanostructured Bi2Te3 thermoelectric devices.