Synthesis of a large area ReS2 thin film by CVD for in-depth investigation of resistive switching: effects of metal electrodes, channel width and noise behaviour.

The anisotropic crystal structure and layer independent electrical and optical properties of ReS2 make it unique among other two-dimensional materials (2DMs), emphasizing a special need for its synthesis. This work discusses the synthesis and in-depth characterization of a 1 × 1 cm2 large and few layered ReS2 film. Vibrational modes and excitonic peaks observed from the Raman and photoluminescence (PL) spectra corroborated the formation of a ReS2 film with a 1.26 eV bandgap. High resolution transmission electron microscopy (HRTEM) images and selected area electron diffraction (SAED) patterns inferred the polycrystalline nature of the film, while cross-sectional field emission scanning electron microscopy (FESEM) indicated planar growth with ∼10 nm thickness. The chemical composition of the film analysed through X-ray photoelectron spectroscopy (XPS) indicated the formation of a ReS2 film with a Re : S atomic ratio of 1 : 1.75, indicating a small amount of non-stoichiometric RexSy. Following the basic characterization studies, the ReS2 film was tested for resistive switching (RS) device application in which the effects of different metal electrodes (Pt/Au and Ag/Au) and different channel widths (200, 100, and 50 µm) were studied. The highest memory window equal to 108 was obtained for the Ag/Au electrode while Pt/Au showed a memory window of 102. RS for the former was ascribed to the formation of a conducting filament (CF) because of the migration of Ag+ ions, while defect mediated charge carrier transport led to switching in the Pt/Au electrode. Furthermore, the RHRS/RLRS ratio achieved in this work (108) is also of the highest magnitude reported thus far. Furthermore, a comparison of devices with Ag/Au electrodes but with different channel widths (50, 100 and 200 µm) gave insightful results on the existence of multiple resistance states, device endurance and retention. An inverse relationship between the retention time and the device's channel width was observed, where the device with a 50 µm channel width showed a retention time of 48 hours, and the one with a 200 µm width showed stability only up to 3000 s. Furthermore, low frequency noise measurements were performed to understand the effect of defects in the low resistance state (LRS) and the high resistance state (HRS). The HRS exhibited Lorentzian noise behaviour while the LRS exhibited Lorentzian only at low current bias which converged to 1/f noise at higher current bias.

Role ofin-situhydrogen plasma treatment on gate bias stability and performance of a-IGZO thin-film transistors.

This work investigates the effect of anin situhydrogen plasma treatment on gate bias stability and performance of amorphous InGaZnO thin-film transistors (TFTs) deposited by using atmospheric-pressure PECVD. The H2plasma-treateda-IGZO channel has shown significant improvement in bias stress induced instability with a minuscule threshold voltage shift (ΔVth) of 0.31 and -0.17 V under positive gate bias stress (PBS) and negative gate bias stress (NBS), respectively. With the aid of the energy band diagram, the proposed work demonstrates the formation of negative species O2-and positive species H2O+in the backchannel under PBS and NBS in addition to ionized oxygen vacancy (Vo) defects ata-IGZO/ZrO2interfaces are the reason for gate bias instability which could be effectively suppressed within situH2plasma treatment. From the experimental result, it is observed that the electrical performance such as field-effect mobility (µFE), on-off current ratio (Ion/Ioff), and subthreshold swing improved significantly byin situH2plasma treatment with passivation of interface trap density and bulk trap defects.