Enhancing the electrochemical performance of TiO2 based material using microwave air plasma treatment with an ECR cavity.

The microwave-based plasma treatment facility at the Central University of Punjab Bathinda (CUPB) based on 2.45 GHz has been used to investigate the impact on the electrochemical performance of TiO2. This was accomplished by treating a number of pellets of TiO2 sample material with microwave plasma at an input power of 80 W. The palette is subjected to microwave plasma treatment at 30-, 60-, 80-, and 100-s intervals. Many such characterization methods, including UV-visible spectroscopy, FTIR, XRD, and FESEM, have been applied to the study of the impact of plasma treatment on other physical and chemical properties in the context of untreated pellets. In the 80-s plasma treatment, the FTIR study showed that the (O-Ti-O) vibration band at 500-900 cm-1 was wider than other bands. The UV results showed that an 80-s plasma treatment decreased the sample's band gap by 37% and increased the amount of disordered, amorphous material in the sample that had not been treated. XRD studies show that a sample that was treated with plasma for 80 s has low crystallinity and a high disorder (amorphous) factor. The Nyquist plot showed that the electrochemical charge transfer resistance drops from 7 (not treated) to 4 after 80 s of plasma treatment. In a study of electrochemical performance, a sample that was treated with plasma for 80 s has a capacitance that is 35% higher than a sample that was not treated.

Design and development of a compact ion implanter and plasma diagnosis facility based on a 2.45 GHz microwave ion source.

A project on developing a 2.45 GHz microwave ion source based compact ion implanter and plasma diagnostic facility has been taken up by the Central University of Punjab, Bathinda. It consists of a double-wall ECR plasma cavity, a four-step ridge waveguide, an extraction system, and an experimental beam chamber. The mechanical design has been carried out in such a way that both types of experiments, plasma diagnosis and ion implantation, can be easily accommodated simultaneously and separately. To optimize microwave coupling to the ECR plasma cavity, a four-step ridge waveguide is designed. Microwave coupling simulation for the ECR plasma cavity has been performed at different power inputs using COMSOL Multiphysics. An enhanced electric field profile has been obtained at the center of the ECR plasma cavity with the help of a four-step ridge waveguide compared to the WR284 waveguide. The magnetic field distribution for two magnetic rings and the extraction system's focusing properties have been simulated using the computer simulation technique. A tunable axial magnetic field profile has been obtained with a two permanent magnetic ring arrangement. The dependency of the beam emittance and beam current on accelerating voltages up to 50 kV has been simulated with different ions. It shows that ion masses have a great impact on the beam emittance and output current. This facility has provision for in situ plasma diagnosis using a Langmuir probe and optical emission spectroscopy setups. This system will be used for ion implantation, surface patterning, and studies of basic plasma sciences.