Integration of self-assembled vertically aligned nanocomposite (La0.7Sr0.3MnO3)(1-x):(ZnO)x thin films on silicon substrates.

Epitaxial (La0.7Sr0.3MnO3)(1-x):(ZnO)x (LSMO:ZnO) in vertically aligned nanocomposite (VAN) form was integrated on STO/TiN-buffered silicon substrates by pulsed-laser deposition. Their magnetotransport properties have been investigated and are systematically tuned through controlling the ZnO concentration. The composite film with 70% ZnO molar ratio exhibits a maximum magnetoresistance (MR) value of 55% at 70 K and 1 T. The enhanced tunable low-field MR properties are attributed to structural and magnetic disorders and spin-polarized tunneling through the secondary ZnO phase. The integration of LSMO:ZnO VAN films on silicon substrates is a critical step enabling the application of VAN films in future spintronic devices.

Extremely high tunability and low loss in nanoscaffold ferroelectric films.

There are numerous radio frequency and microwave device applications which require materials with high electrical tunability and low dielectric loss. For phased array antenna applications there is also a need for materials which can operate above room temperature and which have a low temperature coefficient of capacitance. We have created a nanoscaffold composite ferroelectric material containing Ba(0.6)Sr(0.4)TiO(3) and Sm(2)O(3) which has a very high tunability which scales inversely with loss. This behavior is opposite to what has been demonstrated in any previous report. Furthermore, the materials operate from room temperature to above 150 °C, while maintaining high tunability and low temperature coefficient of tunability. This new paradigm in dielectric property control comes about because of a vertical strain control mechanism which leads to high tetragonality (c/a ratio of 1.0126) in the BSTO. Tunability values of 75% (200 kV/cm field) were achieved at room temperature in micrometer thick films, the value remaining to >50% at 160 °C. Low dielectric loss values of <0.01 were also achieved, significantly lower than reference pure films.

Growth-controlled surface roughness in Al-doped ZnO as transparent conducting oxide.

The surface morphology of Al(2)O(3)-doped ZnO (AZO, 2 wt%) thin films varies from a uniform layer to nanorod structure by simply controlling oxygen pressure during growth. All AZO films were deposited on sapphire(0001) substrates using a pulsed laser deposition (PLD) technique. In the low oxygen pressure regime (vacuum approximately 50 mTorr), AZO films grow as a smooth and uniform layer. In the high oxygen pressure regime (100-250 mTorr) AZO thin films with nanorods have formed. Detailed cross-sectional transmission electron microscopy (TEM) and x-ray diffraction (XRD) studies reveal that, besides the obvious variation in the film morphology, the in-plane d spacing of AZO film increases and the out-of-plane d spacing decreases, as oxygen pressure increases. A bilayer AZO film with a nanorod structure on top of a uniform layer was demonstrated by controlling the oxygen pressure for the two layers. Electrical resistivity and optical transmittance measurements were carried out to correlate with the microstructures obtained under different oxygen pressures. The bilayer AZO films could find applications as a transparent conducting oxide (TCO) with a unique light trapping function in thin film solar cells.