Synthesis and gas sensing properties of WS2 nanocrystallites assembled hierarchical WS2 fibers by electrospinning.

A gas sensor based on a hierarchical WS2 structure embedded with vertically aligned WS2 nanocrystallites was demonstrated. The three-dimensional (3D) hierarchical structure provides many edge sites of nanocrystallites and an extremely large gas contact volume, resulting in a high gas response. The decreased contact resistance between the 3D hierarchical WS2 fibers and sensor electrode resulted in improved NO2 response. We fabricated a one-dimensional (1D) conductive WS2 fiber using a two-step annealing process under sulfur flow (sulfurization). It delivers a continuous and conductive carrier path and lowers the potential barrier at the interface of the WS2 nanocrystallites (top) and electrospun WS2 fiber (bottom), resulting in an improved gas response. We developed 3D hierarchical WS2 fibers embedded with vertically aligned WS2 nanocrystallites to increase the gas adsorption site in comparison with that of 1D WS2 fibers without WS2 flakes. Vertically aligned WS2 nanocrystallites were formed after a two-step annealing treatment. Sensors based on the 3D hierarchical WS2 fibers embedded with WS2 flakes, showed higher response to NO2 gas in comparison to that of pure WS2 fibers without WS2 flakes.

High performance self-gating graphene/MoS2 diode enabled by asymmetric contacts.

A graphene-MoS2 (GM) heterostructure based diode is fabricated using asymmetric contacts to MoS2, as well as an asymmetric top gate (ATG). The GM diode exhibits a rectification ratio of 5 from asymmetric contacts, which is improved to 105 after the incorporation of an ATG. This improvement is attributed to the asymmetric modulation of carrier concentration and effective Schottky barrier height (SBH) by the ATG during forward and reverse bias. This is further confirmed from the temperature dependent measurement, where a difference of 0.22 eV is observed between the effective SBH for forward and reverse bias. Moreover, the rectification ratio also depends on carrier concentration in MoS2 and can be varied with the change in temperature as well as back gate voltage. Under laser light illumination, the device demonstrates strong opto-electric response with 100 times improvement in the relative photo current, as well as a responsivity of 1.9 A W-1 and a specific detectivity of 2.4 × 1010 Jones. These devices can also be implemented using other two dimensional (2D) materials and suggest a promising approach to incorporate diverse 2D materials for future nano-electronics and optoelectronics applications.

Tunable Electron and Hole Injection Enabled by Atomically Thin Tunneling Layer for Improved Contact Resistance and Dual Channel Transport in MoS2/WSe2 van der Waals Heterostructure.

Two-dimensional (2D) material-based heterostructures provide a unique platform where interactions between stacked 2D layers can enhance the electrical and opto-electrical properties as well as give rise to interesting new phenomena. Here, the operation of a van der Waals heterostructure device comprising of vertically stacked bilayer MoS2 and few layered WSe2 has been demonstrated in which an atomically thin MoS2 layer has been employed as a tunneling layer to the underlying WSe2 layer. In this way, simultaneous contacts to both MoS2 and WSe2 2D layers have been established by forming a direct metal-semiconductor to MoS2 and a tunneling-based metal-insulator-semiconductor contacts to WSe2, respectively. The use of MoS2 as a dielectric tunneling layer results in an improved contact resistance (80 kΩ µm) for WSe2 contact, which is attributed to reduction in the effective Schottky barrier height and is also confirmed from the temperature-dependent measurement. Furthermore, this unique contact engineering and type-II band alignment between MoS2 and WSe2 enables a selective and independent carrier transport across the respective layers. This contact engineered dual channel heterostructure exhibits an excellent gate control and both channel current and carrier types can be modulated by the vertical electric field of the gate electrode, which is also reflected in the on/off ratio of 104 for both electron (MoS2) and hole (WSe2) channels. Moreover, the charge transfer at the heterointerface is studied quantitatively from the shift in the threshold voltage of the pristine MoS2 and the heterostructure device, which agrees with the carrier recombination-induced optical quenching as observed in the Raman spectra of the pristine and heterostructure layers. This observation of dual channel ambipolar transport enabled by the hybrid tunneling contacts and strong interlayer coupling can be utilized for high-performance opto-electrical devices and applications.

Comparison of trapped charges and hysteresis behavior in hBN encapsulated single MoS2 flake based field effect transistors on SiO2 and hBN substrates.

Molybdenum disulfide (MoS2) based field effect transistors (FETs) are of considerable interest in electronic and opto-electronic applications but often have large hysteresis and threshold voltage instabilities. In this study, by using advanced transfer techniques, hexagonal boron nitride (hBN) encapsulated FETs based on a single, homogeneous and atomic-thin MoS2 flake are fabricated on hBN and SiO2 substrates. This allows for a better and a precise comparison between the charge traps at the semiconductor-dielectric interfaces at MoS2-SiO2 and hBN interfaces. The impact of ambient environment and entities on hysteresis is minimized by encapsulating the active MoS2 layer with a single hBN on both the devices. The device to device variations induced by different MoS2 layer is also eliminated by employing a single MoS2 layer for fabricating both devices. After eliminating these additional factors which induce variation in the device characteristics, it is found from the measurements that the trapped charge density is reduced to 1.9 × 1011 cm-2 on hBN substrate as compared to 1.1 × 1012 cm-2 on SiO2 substrate. Further, reduced hysteresis and stable threshold voltage are observed on hBN substrate and their dependence on gate sweep rate, sweep range, and gate stress is also studied. This precise comparison between encapsulated devices on SiO2 and hBN substrates further demonstrate the requirement of hBN substrate and encapsulation for improved and stable performance of MoS2 FETs.

Na-Cation-Assisted Exfoliation of MX2 (M = Mo, W; X = S, Se) Nanosheets in an Aqueous Medium with the Aid of a Polymeric Surfactant for Flexible Polymer-Nanocomposite Memory Applications.

2D nanosheets of transition metal dichalcogenides (TMDCs) have been attracting attention due to their sizable band gap. Facile and effective Na-cation-assisted exfoliation of TMDC (MX2 , M = Mo, W; X = S, Se) nanosheets in an aqueous medium and their application as a composite filler in a polyvinyl alcohol (PVA) matrix are explored in this work. The presence of Na cations is highly beneficial for exfoliating defect-free and few-layer MX2 nanosheets in water in the presence of small-sized micelles of polymeric surfactant, and significantly elevates the exfoliation yield by more than one order of magnitude compared to a conventional surfactant-assisted exfoliation. The strategy suggested in this work is very advantageous compared to both Li cation intercalation in organic solvents and conventional low-yield surfactant-assisted exfoliations. As an application of the exfoliated nanosheets, the fabrication of memory devices with the configuration of Ga-doped ZnO/MX2 -PVA/Ag is demonstrated, and they exhibit bistable and write-once-read-many-times resistive switching behavior with a high ON/OFF current ratio of 3 × 103 at -1.0 V (for WS2 ) and 2.0 V (for MoS2 ). Furthermore, MX2 -PVA nanocomposite fibrous films and mats are successfully fabricated using an electrospinning technique, which can expand the use of TMDC nanofillers in applications involving highly flexible polymer-based MX2 composites.

Hole dephasing caused by hole-hole interaction in a multilayered black phosphorus.

We study the magnetotransport of holes in a multilayered black phosphorus in a temperature range of 1.9 to 21.5 K. We observed a negative magnetoresistance at magnetic fields up to 1.5 T. This negative magetoresistance was analyzed by weak localization theory in diffusive regime. At the lowest temperature and the highest carrier density we found a phase coherence length of 48 nm. The linear temperature dependence of the dephasing rate shows that the hole-hole scattering processes with small energy transfer are the dominant contribution in breaking the carrier phase coherence.

Junctionless Diode Enabled by Self-Bias Effect of Ion Gel in Single-Layer MoS2 Device.

The self-biasing effects of ion gel from source and drain electrodes on electrical characteristics of single layer and few layer molybdenum disulfide (MoS2) field-effect transistor (FET) have been studied. The self-biasing effect of ion gel is tested for two different configurations, covered and open, where ion gel is in contact with either one or both, source and drain electrodes, respectively. In open configuration, the linear output characteristics of the pristine device becomes nonlinear and on-off ratio drops by 3 orders of magnitude due to the increase in "off" current for both single and few layer MoS2 FETs. However, the covered configuration results in a highly asymmetric output characteristics with a rectification of around 103 and an ideality factor of 1.9. This diode like behavior has been attributed to the reduction of Schottky barrier width by the electric field of self-biased ion gel, which enables an efficient injection of electrons by tunneling at metal-MoS2 interface. Finally, finite element method based simulations are carried out and the simulated results matches well in principle with the experimental analysis. These self-biased diodes can perform a crucial role in the development of high-frequency optoelectronic and valleytronic devices.

Tunable electrical properties of multilayer HfSe2 field effect transistors by oxygen plasma treatment.

HfSe2 field effect transistors are systematically studied in order to selectively tune their electrical properties by optimizing layer thickness and oxygen plasma treatment. The optimized plasma-treated HfSe2 field effect transistors showed a high on/off ratio improvement of four orders of magnitude, from 27 to 105, a field effect mobility increase from 2.16 to 3.04 cm2 V-1 s-1, a subthreshold swing improvement from 30.6 to 4.8 V dec-1, and a positive threshold voltage shift between depletion mode and enhancement mode, from -7.02 to 11.5 V. The plasma-treated HfSe2 photodetector also demonstrates a reasonable photoresponsivity from the visible to the near-infrared region of light.

Hopping conduction and random telegraph signal in an exfoliated multilayer MoS2 field-effect transistor.

We investigate the hopping conduction and random telegraph signal caused by various species of interface charge scatterers in a MoS2 multilayer field-effect transistor. The temperature dependence of the channel resistivity shows that at low temperatures and low carrier densities the carrier transport is via Mott variable range hopping with a hopping length changing from 41 to 80 nm. The hopping conduction was due to electron tunneling through localized band tail states formed by the scatterers located in the vicinity of the MoS2 layer. In the temperature range of 40-70 K, we observed random telegraph signal (RTS) that is caused by the capture and emission of a carrier by the interface traps that are located away from the layer. These traps form strong potential that interact with the layer and change the potential profile of the electron system. The characteristics of RTS depend strongly on gate bias and temperature, as well as the application of a magnetic field.

Gate-Tunable Hole and Electron Carrier Transport in Atomically Thin Dual-Channel WSe2 /MoS2 Heterostructure for Ambipolar Field-Effect Transistors.

An ambipolar dual-channel field-effect transistor (FET) with a WSe2 /MoS2 heterostructure formed by separately controlled individual channel layers is demonstrated. The FET shows a switchable ambipolar behavior with independent carrier transport of electrons and holes in the individual layers of MoS2 and WSe2 , respectively. Moreover, the photoresponse is studied at the heterointerface of the WSe2 /MoS2 dual-channel FET.

Flexible and transparent gas molecule sensor integrated with sensing and heating graphene layers.

Graphene leading to high surface-to-volume ratio and outstanding conductivity is applied for gas molecule sensing with fully utilizing its unique transparent and flexible functionalities which cannot be expected from solid-state gas sensors. In order to attain a fast response and rapid recovering time, the flexible sensors also require integrated flexible and transparent heaters. Here, large-scale flexible and transparent gas molecule sensor devices, integrated with a graphene sensing channel and a graphene transparent heater for fast recovering operation, are demonstrated. This combined all-graphene device structure enables an overall device optical transmittance that exceeds 90% and reliable sensing performance with a bending strain of less than 1.4%. In particular, it is possible to classify the fast (≈14 s) and slow (≈95 s) response due to sp(2) -carbon bonding and disorders on graphene and the self-integrated graphene heater leads to the rapid recovery (≈11 s) of a 2 cm × 2 cm sized sensor with reproducible sensing cycles, including full recovery steps without significant signal degradation under exposure to NO2 gas.

Graphene transparent electrode for enhanced optical power and thermal stability in GaN light-emitting diodes.

We report an improvement of the optical power and thermal stability of GaN LEDs using a chemically doped graphene transparent conducting layer (TCL) and a low-resistance contact structure. In order to obtain low contact resistance between the TCL and p-GaN surface, a patterned graphene TCL with Cr/Au electrodes is suggested. A bi-layer patterning method of a graphene TCL was utilized to prevent the graphene from peeling off the p-GaN surface. To improve the work function and the sheet resistance of graphene, CVD (chemical vapor deposition) graphene was doped by a chemical treatment using a HNO(3) solution. The effect of the contact resistance on the power degradation of LEDs at a high injection current level was investigated. In addition, the enhancement of the optical power via an increase in the current spreading and a decrease in the potential barrier of the graphene TCL was investigated.