Thick tellurium electrodeposition on nickel-coated copper substrate for 124I production.
Appl Radiat Isot
; 66(10): 1281-6, 2008 Oct.
Article
em En
| MEDLINE
| ID: mdl-18387805
ABSTRACT
Tellurium electrodeposition on a nickel-coated copper substrate was investigated for production of iodine-124. The electrodeposition experiments were carried out by the alkali plating baths. The optimum conditions of the electrodeposition of tellurium were as follows 6 g l(-1) tellurium, pH=10, DC current density of ca. 8.55 mA cm(-2) and room temperature.
Texto completo:
1
Coleções:
01-internacional
Base de dados:
MEDLINE
Assunto principal:
Telúrio
/
Compostos Radiofarmacêuticos
/
Cobre
/
Galvanoplastia
/
Radioisótopos do Iodo
/
Níquel
Idioma:
En
Revista:
Appl Radiat Isot
Assunto da revista:
MEDICINA NUCLEAR
/
SAUDE AMBIENTAL
Ano de publicação:
2008
Tipo de documento:
Article
País de afiliação:
Irã
País de publicação:
ENGLAND
/
ESCOCIA
/
GB
/
GREAT BRITAIN
/
INGLATERRA
/
REINO UNIDO
/
SCOTLAND
/
UK
/
UNITED KINGDOM