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K-shell spectroscopy of silicon ions as diagnostic for high electric fields.
Loetzsch, R; Jäckel, O; Höfer, S; Kämpfer, T; Polz, J; Uschmann, I; Kaluza, M C; Förster, E; Stambulchik, E; Kroupp, E; Maron, Y.
Afiliação
  • Loetzsch R; Helmholtz-Institut Jena, Helmholtzweg 4, D-07743 Jena, Germany. robert.loetzsch@uni-jena.de
Rev Sci Instrum ; 83(11): 113507, 2012 Nov.
Article em En | MEDLINE | ID: mdl-23206062
ABSTRACT
We developed a detection scheme, capable of measuring X-ray line shape of tracer ions in µm thick layers at the rear side of a target foil irradiated by ultra intense laser pulses. We performed simulations of the effect of strong electric fields on the K-shell emission of silicon and developed a spectrometer dedicated to record this emission. The combination of a cylindrically bent crystal in von Hámos geometry and a CCD camera with its single photon counting capability allows for a high dynamic range of the instrument and background free spectra. This approach will be used in future experiments to study electric fields of the order of TV/m at high density plasmas close to solid density.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Diagnostic_studies Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2012 Tipo de documento: Article País de afiliação: Alemanha

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Diagnostic_studies Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2012 Tipo de documento: Article País de afiliação: Alemanha
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