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Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag.
Bronsgeest, Merijntje S; Bendiab, Nedjma; Mathur, Shashank; Kimouche, Amina; Johnson, Harley T; Coraux, Johann; Pochet, Pascal.
Afiliação
  • Bronsgeest MS; †Université Grenoble Alpes, F-38000, Grenoble, France.
  • Bendiab N; ‡CEA, INAC-SP2M, F-38054, Grenoble, France.
  • Mathur S; †Université Grenoble Alpes, F-38000, Grenoble, France.
  • Kimouche A; §CNRS, Inst NEEL, F-38042, Grenoble, France.
  • Johnson HT; †Université Grenoble Alpes, F-38000, Grenoble, France.
  • Coraux J; ‡CEA, INAC-SP2M, F-38054, Grenoble, France.
  • Pochet P; §CNRS, Inst NEEL, F-38042, Grenoble, France.
Nano Lett ; 15(8): 5098-104, 2015 Aug 12.
Article em En | MEDLINE | ID: mdl-26171667
ABSTRACT
We measure uniaxial strain fields in the vicinity of edges and wrinkles in graphene prepared by chemical vapor deposition (CVD), by combining microscopy techniques and local vibrational characterization. These strain fields have magnitudes of several tenths of a percent and extend across micrometer distances. The nonlinear shear-lag model remarkably captures these strain fields in terms of the graphene-substrate interaction and provides a complete understanding of strain-relieving wrinkles in graphene for any level of graphene-substrate coherency.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2015 Tipo de documento: Article País de afiliação: França

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2015 Tipo de documento: Article País de afiliação: França