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RBS Depth Profiling Analysis of (Ti, Al)N/MoN and CrN/MoN Multilayers.
Han, Bin; Wang, Zesong; Devi, Neena; Kondamareddy, K K; Wang, Zhenguo; Li, Na; Zuo, Wenbin; Fu, Dejun; Liu, Chuansheng.
Afiliação
  • Han B; Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Wang Z; Hubei Nuclear Solid Physics Key Laboratory at School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Devi N; Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Kondamareddy KK; Hubei Nuclear Solid Physics Key Laboratory at School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Wang Z; Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Li N; Hubei Nuclear Solid Physics Key Laboratory at School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Zuo W; Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Fu D; Hubei Nuclear Solid Physics Key Laboratory at School of Physics and Technology, Wuhan University, Wuhan, 430072, China.
  • Liu C; Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan, 430072, China. djfu@whu.edu.cn.
Nanoscale Res Lett ; 12(1): 161, 2017 Dec.
Article em En | MEDLINE | ID: mdl-28253563
ABSTRACT
(Ti, Al)N/MoN and CrN/MoN multilayered films were synthesized on Si (100) surface by multi-cathodic arc ion plating system with various bilayer periods. The elemental composition and depth profiling of the films were investigated by Rutherford backscattering spectroscopy (RBS) using 2.42 and 1.52 MeV Li2+ ion beams and different incident angles (0°, 15°, 37°, and 53°). The microstructures of (Ti, Al)N/MoN multilayered films were evaluated by X-ray diffraction. The multilayer periods and thickness of the multilayered films were characterized by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HR-TEM) and then compared with RBS results.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Res Lett Ano de publicação: 2017 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Res Lett Ano de publicação: 2017 Tipo de documento: Article País de afiliação: China