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Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition.
Hämäläinen, Jani; Mizohata, Kenichiro; Meinander, Kristoffer; Mattinen, Miika; Vehkamäki, Marko; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku.
Afiliação
  • Hämäläinen J; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-, 00014, Helsinki, Finland.
  • Mizohata K; Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 64, FI-00014, Helsinki, Finland.
  • Meinander K; Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 64, FI-00014, Helsinki, Finland.
  • Mattinen M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-, 00014, Helsinki, Finland.
  • Vehkamäki M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-, 00014, Helsinki, Finland.
  • Räisänen J; Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 64, FI-00014, Helsinki, Finland.
  • Ritala M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-, 00014, Helsinki, Finland.
  • Leskelä M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-, 00014, Helsinki, Finland.
Angew Chem Int Ed Engl ; 57(44): 14538-14542, 2018 Oct 26.
Artigo em Inglês | MEDLINE | ID: mdl-30048031
ABSTRACT
Rhenium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium nitride thin films by the technologically important atomic layer deposition (ALD) method over a wide deposition temperature range using fast, simple, and robust surface reactions between rhenium pentachloride and ammonia. Films are grown and characterized for compositions, surface morphologies and roughnesses, crystallinities, and resistivities. Conductive rhenium subnitride films of tunable composition are obtained at deposition temperatures between 275 and 375 °C, whereas pure rhenium metal films grow at 400 °C and above. Even a just 3 nm thick rhenium film is continuous and has a low resistivity of about 90 µΩ cm showing potential for applications for which also other noble metals and refractory metals have been considered.

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Texto completo: Disponível Coleções: Bases de dados internacionais Base de dados: MEDLINE Idioma: Inglês Revista: Angew Chem Int Ed Engl Ano de publicação: 2018 Tipo de documento: Artigo País de afiliação: Finlândia