Photomask-Free, Direct Selective Electroless Deposition on Glass by Controlling Surface Hydrophilicity.
ACS Omega
; 4(4): 7706-7710, 2019 Apr 30.
Article
em En
| MEDLINE
| ID: mdl-31459860
ABSTRACT
This paper reports a new approach to realize direct selective electroless deposition (ELD) without the requirement of photolithography. This method involves sequential silane-compound modifications in which the first modification creates a hydrophobic surface on the TiO2-coated glass using a fluorine-rich alkoxysilane compound, followed by a laser ablation to create the pattern. Then, the entire substrate is immersed into an aqueous solution containing amino-silane equipped Pd nanoparticles for the second modification. Because most substrate surface is hydrophobic, the amino-silane-equipped Pd catalysts can only graft on the laser-ablated zone to accomplish selective ELD.
Texto completo:
1
Coleções:
01-internacional
Base de dados:
MEDLINE
Idioma:
En
Revista:
ACS Omega
Ano de publicação:
2019
Tipo de documento:
Article
País de afiliação:
Taiwan