Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene-Direct-Write Kirigami Patterns.
Nanomaterials (Basel)
; 9(10)2019 Sep 30.
Article
em En
| MEDLINE
| ID: mdl-31574915
ABSTRACT
A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.
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1
Coleções:
01-internacional
Base de dados:
MEDLINE
Idioma:
En
Revista:
Nanomaterials (Basel)
Ano de publicação:
2019
Tipo de documento:
Article
País de afiliação:
Estados Unidos