Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition.

Rafie Borujeny, Elham; Sendetskyi, Oles; Fleischauer, Michael D; Cadien, Kenneth C

Rafie Borujeny, Elham; Sendetskyi, Oles; Fleischauer, Michael D; Cadien, Kenneth C.

Afiliação

Rafie Borujeny E; Department of Chemical and Materials Engineering, University of Alberta, 12th Floor - Donadeo Innovation Centre for Engineering (ICE), 9211-116 Street NW, Edmonton, Alberta, Canada T6G 1H9.
Sendetskyi O; National Research Council-Nanotechnology Research Centre, 11421 Saskatchewan Dr., Edmonton, Alberta, Canada T6G 2M9.
Fleischauer MD; Department of Physics, University of Alberta, Edmonton, Alberta, Canada T6G 2E1.
Cadien KC; National Research Council-Nanotechnology Research Centre, 11421 Saskatchewan Dr., Edmonton, Alberta, Canada T6G 2M9.

ACS Appl Mater Interfaces ; 12(39): 44225-44237, 2020 Sep 30.

Article em En | MEDLINE | ID: mdl-32865966

Palavras-chave

epitaxy; gallium oxide; low temperature; plasma-enhanced ALD; preferred orientation; thermal budget; triethylgallium; wide bandgap

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Health_economic_evaluation Idioma: En Revista: ACS Appl Mater Interfaces Assunto da revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Ano de publicação: 2020 Tipo de documento: Article

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