Effect of thickness and reaction media on properties of ZnO thin films by SILAR.

Yergaliuly, Gani; Soltabayev, Baktiyar; Kalybekkyzy, Sandugash; Bakenov, Zhumabay; Mentbayeva, Almagul

Yergaliuly, Gani; Soltabayev, Baktiyar; Kalybekkyzy, Sandugash; Bakenov, Zhumabay; Mentbayeva, Almagul.

Afiliação

Yergaliuly G; Department of Chemical and Material Engineering, School of Engineering and Digital Sciences, Nazarbayev University, Nur-Sultan, 010000, Kazakhstan.
Soltabayev B; L.N. Gumilyov Eurasian National University, Nur-Sultan, 010000, Kazakhstan.
Kalybekkyzy S; Department of Chemical and Material Engineering, School of Engineering and Digital Sciences, Nazarbayev University, Nur-Sultan, 010000, Kazakhstan. baktiyar.soltabayev@nu.edu.kz.
Bakenov Z; National Laboratory Astana, Nazarbayev University, Nur-Sultan, 010000, Kazakhstan. baktiyar.soltabayev@nu.edu.kz.
Mentbayeva A; Department of Chemical and Material Engineering, School of Engineering and Digital Sciences, Nazarbayev University, Nur-Sultan, 010000, Kazakhstan.

Sci Rep ; 12(1): 851, 2022 Jan 17.

Article em En | MEDLINE | ID: mdl-35039553

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Cazaquistão País de publicação: Reino Unido

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