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Prediction of Surface Roughness as a Function of Temperature for SiO2 Thin-Film in PECVD Process.
Amirzada, Muhammad Rizwan; Khan, Yousuf; Ehsan, Muhammad Khurram; Rehman, Atiq Ur; Jamali, Abdul Aleem; Khatri, Abdul Rafay.
Afiliação
  • Amirzada MR; Faculty of Engineering and Computer Sciences, National University of Modern Languages, Islamabad 44000, Pakistan.
  • Khan Y; Department of Electronic Engineering, Balochistan University of Information Technology, Engineering and Management Sciences, Quetta 87300, Pakistan.
  • Ehsan MK; Faculty of Engineering Sciences, Bahria University, Lahore Campus, 47-C, Civic Center, Johar Town, Lahore 54000, Pakistan.
  • Rehman AU; Department of Electronic Engineering, Balochistan University of Information Technology, Engineering and Management Sciences, Quetta 87300, Pakistan.
  • Jamali AA; Department of Electronic Engineering, Quaid-e-Awam University of Engineering, Science and Technology, Nawabshah 67480, Pakistan.
  • Khatri AR; Department of Electronic Engineering, Quaid-e-Awam University of Engineering, Science and Technology, Nawabshah 67480, Pakistan.
Micromachines (Basel) ; 13(2)2022 Feb 17.
Article em En | MEDLINE | ID: mdl-35208438
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies / Risk_factors_studies Idioma: En Revista: Micromachines (Basel) Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Paquistão
Texto completo
Adicionar na Minha BVS
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies / Risk_factors_studies Idioma: En Revista: Micromachines (Basel) Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Paquistão