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Graphene nanoribbons grown in hBN stacks for high-performance electronics.
Lyu, Bosai; Chen, Jiajun; Wang, Sen; Lou, Shuo; Shen, Peiyue; Xie, Jingxu; Qiu, Lu; Mitchell, Izaac; Li, Can; Hu, Cheng; Zhou, Xianliang; Watanabe, Kenji; Taniguchi, Takashi; Wang, Xiaoqun; Jia, Jinfeng; Liang, Qi; Chen, Guorui; Li, Tingxin; Wang, Shiyong; Ouyang, Wengen; Hod, Oded; Ding, Feng; Urbakh, Michael; Shi, Zhiwen.
Afiliação
  • Lyu B; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Chen J; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Wang S; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Lou S; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Shen P; Department of Engineering Mechanics, School of Civil Engineering, Wuhan University, Wuhan, China.
  • Xie J; State Key Laboratory of Water Resources and Hydropower Engineering Science, Wuhan University, Wuhan, China.
  • Qiu L; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Mitchell I; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Li C; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Hu C; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Zhou X; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Watanabe K; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Taniguchi T; Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, South Korea.
  • Wang X; Graduate School of Carbon Neutrality, Ulsan National Institute of Science and Technology, Ulsan, South Korea.
  • Jia J; Department of Mechanical Engineering, Ulsan National Institute of Science and Technology, Ulsan, South Korea.
  • Liang Q; Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, South Korea.
  • Chen G; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Li T; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Wang S; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Ouyang W; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Hod O; Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
  • Ding F; Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
  • Urbakh M; Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan.
  • Shi Z; International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan.
Nature ; 628(8009): 758-764, 2024 Apr.
Article em En | MEDLINE | ID: mdl-38538800
ABSTRACT
Van der Waals encapsulation of two-dimensional materials in hexagonal boron nitride (hBN) stacks is a promising way to create ultrahigh-performance electronic devices1-4. However, contemporary approaches for achieving van der Waals encapsulation, which involve artificial layer stacking using mechanical transfer techniques, are difficult to control, prone to contamination and unscalable. Here we report the transfer-free direct growth of high-quality graphene nanoribbons (GNRs) in hBN stacks. The as-grown embedded GNRs exhibit highly desirable features being ultralong (up to 0.25 mm), ultranarrow (<5 nm) and homochiral with zigzag edges. Our atomistic simulations show that the mechanism underlying the embedded growth involves ultralow GNR friction when sliding between AA'-stacked hBN layers. Using the grown structures, we demonstrate the transfer-free fabrication of embedded GNR field-effect devices that exhibit excellent performance at room temperature with mobilities of up to 4,600 cm2 V-1 s-1 and on-off ratios of up to 106. This paves the way for the bottom-up fabrication of high-performance electronic devices based on embedded layered materials.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nature Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China País de publicação: ENGLAND / ESCOCIA / GB / GREAT BRITAIN / INGLATERRA / REINO UNIDO / SCOTLAND / UK / UNITED KINGDOM

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nature Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China País de publicação: ENGLAND / ESCOCIA / GB / GREAT BRITAIN / INGLATERRA / REINO UNIDO / SCOTLAND / UK / UNITED KINGDOM