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Polarization Pruning: Reliability Enhancement of Hafnia-Based Ferroelectric Devices for Memory and Neuromorphic Computing.
Koo, Ryun-Han; Shin, Wonjun; Kim, Jangsaeng; Yim, Jiyong; Ko, Jonghyun; Jung, Gyuweon; Im, Jiseong; Park, Sung-Ho; Kim, Jae-Joon; Cheema, Suraj S; Kwon, Daewoong; Lee, Jong-Ho.
Afiliação
  • Koo RH; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Shin W; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Kim J; Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA.
  • Yim J; Department of Semiconductor Convergence Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Ko J; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Jung G; Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA.
  • Im J; Department of Electrical Engineering, Hanyang University, Seoul, 04763, Republic of Korea.
  • Park SH; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Kim JJ; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Cheema SS; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Kwon D; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
  • Lee JH; Department of Electrical and Computer Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea.
Adv Sci (Weinh) ; : e2407729, 2024 Sep 26.
Article em En | MEDLINE | ID: mdl-39324607
ABSTRACT
Ferroelectric (FE) materials are key to advancing electronic devices owing to their non-volatile properties, rapid state-switching abilities, and low-energy consumption. FE-based devices are used in logic circuits, memory-storage devices, sensors, and in-memory computing. However, the primary challenge in advancing the practical applications of FE-based memory is its reliability. To address this problem, a novel polarization pruning (PP) method is proposed. The PP is designed to eliminate weakly polarized domains by applying an opposite-sign pulse immediately after a program or erase operation. Significant improvements in the reliability of ferroelectric devices are achieved by reducing the depolarization caused by weakly polarized domains and mitigating the fluctuations in the ferroelectric dipole. These enhancements include a 25% improvement in retention, a 50% reduction in read noise, a 45% decrease in threshold voltage variation, and a 72% improvement in linearity. The proposed PP method significantly improves the memory storage efficiency and performance of neuromorphic systems.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Sci (Weinh) Ano de publicação: 2024 Tipo de documento: Article País de publicação: Alemanha

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Sci (Weinh) Ano de publicação: 2024 Tipo de documento: Article País de publicação: Alemanha