RESUMO
We demonstrated the enhancement of the retention characteristics in solution-processed ferroelectric memory transistors. For enhanced retention characteristics, solution-processed Indium Gallium Zinc Oxide (InGaZnO) semiconductor is used as an active layer in a dual-gate structure to achieve high memory on-current and low memory off-current respectively. In our dual-gate oxide ferroelectric thin-film transistor (DG Ox-FeTFT), while conventional TFT characteristic is observed during bottom-gate sweeping, large hysteresis is exhibited during top-gate sweeping with high memory on-current due to the high mobility of the InGaZnO. The voltage applied to the counter bottom-gate electrode causes variations in the turn-on voltage position, which controlled the memory on- and off-current in retention characteristics. Specifically, due to the full depletion of semiconductor by the high negative counter gate bias, the memory off-current in reading operation is dramatically reduced by 104. The application of a high negative counter field to the dual-gate solution-processed ferroelectric memory gives a high memory on- and off-current ratio useful for the production of high performance multi-bit memory devices.
RESUMO
We demonstrated an organic and oxide hybrid CMOS inverter with the solution-processed semiconductor and source/drain electrodes. For the solution-processed n- and p-type semiconductor, InGaZnO solution and TIPS-pentacene/PαMS blend were spin-coated respectively while Silver ink and PEDOT:PSS solution were drop-casted with the help of the bank to serve as source/drain electrodes. The InGaZnO and the TIPS-pentacene transistors show typical n- and p-type transistor operations with low off-current. Based on the combination of the solution-processed n- and p-type transistors, full-swing characteristic curve with low static current of the hybrid CMOS were obtained.
