Method for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method.

Maskless lithography based on a digital micromirror device (DMD) has the advantages of high process flexibility and a low production cost. However, due to the trade-off relationship between the pixel size and exposure area, it is challenging to achieve high resolutions and high patterning speeds at the same time, which hinders the wider application of this technology in micro- and nano-fabrication processes. In addition, micromirrors in DMDs create pixelated edges that limit the pattern quality. In this paper, we propose a novel DMD maskless lithography method to improve the pattern quality during high-speed continuous patterning by means of pulse exposure and oblique scanning processes. A unique criterion, the pixel occupancy, was devised to determine the parameters related to the pulse exposure and oblique scanning optimally. We also studied how the duty cycle of the pulse exposure affects the pattern quality. As a result, we were able to increase the scanning speed up to the speed limit considering the damage threshold of the DMD and improve the pattern quality by resolving the pixelation problem. We anticipate that this method can be used in various microfabrication fields with short product life cycles or in those that require custom designs, such as the manufacturing of PCBs, MEMS devices, and micro-optics devices, among others.

Developing centrifugal force real-time digital PCR for detecting extremely low DNA concentration.

Digital PCR (dPCR) is a technique for absolute quantification of nucleic acid molecules. To develop a dPCR technique that enables more accurate nucleic acid detection and quantification, we established a novel dPCR apparatus known as centrifugal force real-time dPCR (crdPCR). This system is efficient than other systems with only 2.14% liquid loss by dispensing samples using centrifugal force. Moreover, we applied a technique for analyzing the real-time graph of the each micro-wells and distinguishing true/false positives using artificial intelligence to mitigate the rain, a persistent issue with dPCR. The limits of detection and quantification were 1.38 and 4.19 copies/µL, respectively, showing a two-fold higher sensitivity than that of other comparable devices. With the integration of this new technology, crdPCR will significantly contribute to research on next-generation PCR targeting absolute micro-analysis.

A new mold structure to replicate patterns over 1 microm in depth for substrate conformal imprint lithography.

This paper shows an improved mold replication process that uses polyurethane acrylate (PUA) and polyethylene terephthalate (PET) for the fabrication of an ultraviolet (UV) imprinting mold used in substrate conformal imprint lithography (SCIL). With the conventional replication process, which uses hard polydimethylsiloxane (h-PDMS) as a pattern layer, it is difficult to detach the mold from a silicon master for metal oxide semiconductor field effect transistor (MOSFET) that has patterns with over 1-micron depth. However, the method proposed in this paper allows us to easily replicate patterns that have more than 1-micron depth. The key idea of this method is to use PET film as a bonding layer to attach the PUA layer to the polydimethylsiloxane (PDMS) cushion layer to overcome the weak the adhesion force between the PUA and PDMS layer. We demonstrate how to make the modified replica mold and present imprinting results obtained using this replica mold in the SCIL process.

Real-time and label-free biosensing using moiré pattern generated by bioresponsive hydrogel.

Bioresponsive hydrogels are smart materials that respond to various external stimuli and exhibit great potential as biosensors owing to their capability of real-time and label-free detection. Here, we propose a sensing platform based on bioresponsive hydrogels, employing the concept of moiré patterns. Two sets of line patterns with different pitch sizes are prepared; a hydrogel grating whose pitch size changes according to external stimuli and a reference grating with constant pitch size. The volume changes of the hydrogel caused by external stimuli changes the pitch size of the hydrogel grating, and subsequently, the pitch sizes of the moiré patterns (moiré signal), whose values can be obtained in a real-time and label-free manner through customized moiré microscopy and signal processing. After confirming that the pH-induced swelling of hydrogel could be monitored using moiré patterns, we performed moiré pattern-based detection of specific proteins using protein-responsive hydrogel that underwent shrinking via interaction with target proteins. Brain-derived neurotrophic factor and platelet-derived growth factor were selected as the model proteins, and our proposed system successfully detected both proteins at nanomolar levels. In both cases, the pitch size change of hydrogel grating was monitored much more sensitively using moiré patterns than through direct measurements. The changes in the moiré signals caused by target proteins were detected in ex-vivo environments using a custom-made intraocular lens incorporating the hydrogel grating, demonstrating the capability of the proposed system to detect various markers in intraocular aqueous humor, when implanted in the eye.

Pattern uniformity in large-area ultraviolet nano-imprinting by a cylindrically inflated flexible mold under low pressure.

This paper shows a novel nano-imprint method with a polydimethylsiloxane (PDMS) replica mold that was bonded on a cylindrically inflated polycarbonate (PC) film via a low air pressure. The PDMS mold, which was deformed in terms of its cylindrical shape, made a line contact with a substrate from the center region and the contact region, then expanded gradually to the outside of the substrate when the contact force increased. This contact procedure squeezed the resin that was dropped on the substrate from the center to the outside, which prevented the trapping of air bubbles while the cavities were filled with the patterns on the PDMS mold. The main characteristic of the proposed process was that the nano-imprint can be realized under a low pressure, compared to conventional processes. We will show the system that was implemented under the proposed process concept and the patterns that were transferred in an ultraviolet curable resin under pressure conditions of less than 5 kPa.

Hierarchically Porous, Laser-Pyrolyzed Carbon Electrode from Black Photoresist for On-Chip Microsupercapacitors.

We report a laser-pyrolyzed carbon (LPC) electrode prepared from a black photoresist for an on-chip microsupercapacitor (MSC). An interdigitated LPC electrode was fabricated by direct laser writing using a high-power carbon dioxide (CO2) laser to simultaneously carbonize and pattern a spin-coated black SU-8 film. Due to the high absorption of carbon blacks in black SU-8, the laser-irradiated SU-8 surface was directly exfoliated and carbonized by a fast photo-thermal reaction. Facile laser pyrolysis of black SU-8 provides a hierarchically macroporous, graphitic carbon structure with fewer defects (ID/IG = 0.19). The experimental conditions of CO2 direct laser writing were optimized to fabricate high-quality LPCs for MSC electrodes with low sheet resistance and good porosity. A typical MSC based on an LPC electrode showed a large areal capacitance of 1.26 mF cm-2 at a scan rate of 5 mV/s, outperforming most MSCs based on thermally pyrolyzed carbon. In addition, the results revealed that the high-resolution electrode pattern in the same footprint as that of the LPC-MSCs significantly affected the rate performance of the MSCs. Consequently, the proposed laser pyrolysis technique using black SU-8 provided simple and facile fabrication of porous, graphitic carbon electrodes for high-performance on-chip MSCs without high-temperature thermal pyrolysis.

System for Fabrication of Large-Area Roll Molds by Step-and-Repeat Liquid Transfer Imprint Lithography.

The effective production of nanopatterned films generally requires a nanopatterned roll mold with a large area. We report on a novel system to fabricate large-area roll molds by recombination of smaller patterned areas in a step-and-repeat imprint lithography process. The process is accomplished in a method similar to liquid transfer imprint lithography (LTIL). The stamp roll with a smaller area takes up the liquid resist by splitting from a donor substrate or a donor roll. The resist is then transferred from a stamp roll to an acceptor roll and stitched together in a longitudinal and, if necessary, in a circumferential direction. During transfer, the nanostructured resist is UV-exposed and crosslinked directly on the acceptor roll. The acceptor roll with the stitched and recombined stamp patterns is ready to be used as a large-area roll mold for roll-based imprinting. A system for this purpose was designed, and its operation was demonstrated taking the example of an acceptor roll of 1 m length and 250 mm diameter, which was covered by 56 patterned areas. Such a system represents an elegant and efficient tool to recombine small patterned areas directly on a large roll mold and opens the way for large-area roll-based processing.

3D visualization of mold filling stages in thermal nanoimprint by white light interferometry and atomic force microscopy.

A method for continuous 3D visualization of the mold filling at a microscopic level during a thermoplastic nanoimprint process was developed. It is based on superposition of micrographs of a series of different stages of imprint. It was applied to two common 3D microscopies with different resolution limitations. Due to advanced image processing, the animated movie sequence, available as supplementary multimedia information in the online version of this journal, gives an unprecedented insight into the complex polymer flow and shows how voids are forming and vanishing during the imprint process around micropillars. The method has advantages over current real-time methods and can be used as an analytical tool for optimization of processes and improvement of stamp design down to the sub-10 nm nanometer range.

Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds.

We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior.